SG47858A1 - Composition for treating copper or copper alloys - Google Patents

Composition for treating copper or copper alloys

Info

Publication number
SG47858A1
SG47858A1 SG1996004756A SG1996004756A SG47858A1 SG 47858 A1 SG47858 A1 SG 47858A1 SG 1996004756 A SG1996004756 A SG 1996004756A SG 1996004756 A SG1996004756 A SG 1996004756A SG 47858 A1 SG47858 A1 SG 47858A1
Authority
SG
Singapore
Prior art keywords
copper
composition
treating
alloys
copper alloys
Prior art date
Application number
SG1996004756A
Other languages
English (en)
Inventor
Daisaku Akiyama
Yoshiro Maki
Original Assignee
Mec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mec Co Ltd filed Critical Mec Co Ltd
Publication of SG47858A1 publication Critical patent/SG47858A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
    • B23K35/3618—Carboxylic acids or salts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/383—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/121—Metallo-organic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SG1996004756A 1993-04-05 1994-03-30 Composition for treating copper or copper alloys SG47858A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5100121A JPH06287774A (ja) 1993-04-05 1993-04-05 銅および銅合金の表面処理剤

Publications (1)

Publication Number Publication Date
SG47858A1 true SG47858A1 (en) 1998-04-17

Family

ID=14265513

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996004756A SG47858A1 (en) 1993-04-05 1994-03-30 Composition for treating copper or copper alloys

Country Status (7)

Country Link
US (1) US5439783A (zh)
EP (1) EP0620293B1 (zh)
JP (1) JPH06287774A (zh)
CN (1) CN1053233C (zh)
DE (1) DE69401453T2 (zh)
SG (1) SG47858A1 (zh)
TW (1) TW256856B (zh)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2923524B2 (ja) * 1995-08-01 1999-07-26 メック株式会社 銅および銅合金のマイクロエッチング剤並びにマイクロエッチング方法
TW374802B (en) 1996-07-29 1999-11-21 Ebara Densan Ltd Etching composition, method for roughening copper surface and method for producing printed wiring board
CA2278580A1 (en) * 1997-01-31 1998-08-06 James M. Taylor Composition and method for priming substrate materials
US6284309B1 (en) 1997-12-19 2001-09-04 Atotech Deutschland Gmbh Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom
JP2000064067A (ja) 1998-06-09 2000-02-29 Ebara Densan Ltd エッチング液および銅表面の粗化処理方法
US6524644B1 (en) 1999-08-26 2003-02-25 Enthone Inc. Process for selective deposition of OSP coating on copper, excluding deposition on gold
US6432826B1 (en) 1999-11-29 2002-08-13 Applied Materials, Inc. Planarized Cu cleaning for reduced defects
US7220322B1 (en) 2000-08-24 2007-05-22 Applied Materials, Inc. Cu CMP polishing pad cleaning
JP2004526308A (ja) * 2001-01-16 2004-08-26 キャボット マイクロエレクトロニクス コーポレイション シュウ酸アンモニウムを含有する研磨系及び方法
JP4309602B2 (ja) 2001-04-25 2009-08-05 メック株式会社 銅または銅合金と樹脂との接着性を向上させる方法、ならびに積層体
US6783432B2 (en) 2001-06-04 2004-08-31 Applied Materials Inc. Additives for pressure sensitive polishing compositions
US20030221748A1 (en) * 2002-05-30 2003-12-04 Fry's Metals, Inc. Solder paste flux system
JP4018559B2 (ja) * 2003-02-27 2007-12-05 メック株式会社 電子基板の製造方法
US7232478B2 (en) 2003-07-14 2007-06-19 Enthone Inc. Adhesion promotion in printed circuit boards
US7210988B2 (en) 2004-08-24 2007-05-01 Applied Materials, Inc. Method and apparatus for reduced wear polishing pad conditioning
WO2007094869A2 (en) 2005-10-31 2007-08-23 Applied Materials, Inc. Electrochemical method for ecmp polishing pad conditioning
US7794531B2 (en) * 2007-01-08 2010-09-14 Enthone Inc. Organic solderability preservative comprising high boiling temperature alcohol
JP2011501874A (ja) * 2007-09-14 2011-01-13 クォルコム・メムズ・テクノロジーズ・インコーポレーテッド Ｍｅｍｓ製造において使用されるエッチングプロセス
JP5363377B2 (ja) * 2010-02-19 2013-12-11 新光電気工業株式会社 配線基板及びその製造方法
CN102717161B (zh) * 2011-05-10 2014-09-03 中国科学院金属研究所 一种通过表面多孔结构实现钎焊性可调的工艺
CN103649373B (zh) * 2011-07-04 2017-04-12 三菱瓦斯化学株式会社 铜或以铜为主要成分的化合物的蚀刻液
JP5382892B2 (ja) * 2012-12-27 2014-01-08 メック株式会社 エッチング方法
KR101318733B1 (ko) * 2013-06-13 2013-10-18 주식회사 에이씨엠 구리 유기 착물을 이용한 에칭제 조성물
CN103441129A (zh) * 2013-08-23 2013-12-11 京东方科技集团股份有限公司 阵列基板及其制作方法和显示装置
US9735177B2 (en) 2013-08-23 2017-08-15 Boe Technology Group Co., Ltd. Array substrate, method for manufacturing the same and display device
JP6218000B2 (ja) 2016-02-19 2017-10-25 メック株式会社 銅のマイクロエッチング剤および配線基板の製造方法
US20200325583A1 (en) * 2017-10-23 2020-10-15 Mec Company., Ltd. Method for Producing Film Formation Substrate, Film Formation Substrate, and Surface Treatment Agent
CN109487257A (zh) * 2018-11-13 2019-03-19 南通赛可特电子有限公司 一种osp铜面抗氧化剂及其制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221460B1 (zh) * 1971-04-26 1977-06-10
JPS5120972B1 (zh) * 1971-05-13 1976-06-29
JPS5332341B2 (zh) * 1973-03-27 1978-09-07
US4264418A (en) * 1978-09-19 1981-04-28 Kilene Corp. Method for detersifying and oxide coating removal
US4319955A (en) * 1980-11-05 1982-03-16 Philip A. Hunt Chemical Corp. Ammoniacal alkaline cupric etchant solution for and method of reducing etchant undercut
JPH0249393B2 (ja) * 1983-05-31 1990-10-30 Yamatoya Shokai Dooyobidogokinnoetsuchingueki
JPS6190492A (ja) * 1984-10-11 1986-05-08 四国化成工業株式会社 銅スル−ホ−ルプリント配線板の製造方法
US4859281A (en) * 1987-06-04 1989-08-22 Pennwalt Corporation Etching of copper and copper bearing alloys
US5219484A (en) * 1991-04-25 1993-06-15 Applied Electroless Concepts Inc. Solder and tin stripper compositions

Also Published As

Publication number Publication date
JPH06287774A (ja) 1994-10-11
EP0620293A1 (en) 1994-10-19
DE69401453T2 (de) 1997-04-30
EP0620293B1 (en) 1997-01-15
CN1120077A (zh) 1996-04-10
US5439783A (en) 1995-08-08
CN1053233C (zh) 2000-06-07
TW256856B (zh) 1995-09-11
DE69401453D1 (de) 1997-02-27

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