SG40484G - Projection aligner - Google Patents

Projection aligner

Info

Publication number
SG40484G
SG40484G SG404/84A SG40484A SG40484G SG 40484 G SG40484 G SG 40484G SG 404/84 A SG404/84 A SG 404/84A SG 40484 A SG40484 A SG 40484A SG 40484 G SG40484 G SG 40484G
Authority
SG
Singapore
Prior art keywords
projection aligner
aligner
projection
Prior art date
Application number
SG404/84A
Other languages
English (en)
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP12836778A external-priority patent/JPS5555529A/ja
Priority claimed from JP7821379A external-priority patent/JPS562630A/ja
Priority claimed from JP8692679A external-priority patent/JPS5612725A/ja
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of SG40484G publication Critical patent/SG40484G/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG404/84A 1978-10-20 1984-06-04 Projection aligner SG40484G (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP12836778A JPS5555529A (en) 1978-10-20 1978-10-20 Method of positioning wafer
JP7821379A JPS562630A (en) 1979-06-22 1979-06-22 Installing of wafer position in projection aligner
JP8692679A JPS5612725A (en) 1979-07-11 1979-07-11 Method and apparatus for setting position of wafer in projection aligner

Publications (1)

Publication Number Publication Date
SG40484G true SG40484G (en) 1985-03-08

Family

ID=27302642

Family Applications (1)

Application Number Title Priority Date Filing Date
SG404/84A SG40484G (en) 1978-10-20 1984-06-04 Projection aligner

Country Status (6)

Country Link
US (1) US4298273A (de)
DE (1) DE2942388A1 (de)
GB (3) GB2063524B (de)
HK (3) HK35685A (de)
MY (3) MY8500663A (de)
SG (1) SG40484G (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8220224A (nl) * 1981-05-15 1983-04-05 Gen Signal Corp Inrichting voor het projecteren van een reeks beelden op vormplaatsen van een halfgeleiderwafel.
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5885338U (ja) * 1981-12-07 1983-06-09 株式会社日立製作所 自動焦点装置
JPS58166647U (ja) * 1982-04-28 1983-11-07 株式会社オ−ク製作所 露光装置
US4444492A (en) * 1982-05-15 1984-04-24 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4441808A (en) * 1982-11-15 1984-04-10 Tre Semiconductor Equipment Corp. Focusing device for photo-exposure system
US4600282A (en) * 1983-11-14 1986-07-15 Canon Kabushiki Kaisha Alignment apparatus
DE3401856C2 (de) * 1984-01-20 1986-04-24 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Kontaktkopiereinrichtung
JPS60188955A (ja) * 1984-03-08 1985-09-26 Canon Inc 露光装置
US4737824A (en) * 1984-10-16 1988-04-12 Canon Kabushiki Kaisha Surface shape controlling device
KR900001241B1 (ko) * 1985-04-17 1990-03-05 가부시기가이샤 히다찌세이사꾸쇼 광 노출 장치
JPS61278141A (ja) * 1985-05-31 1986-12-09 Canon Inc 投影倍率調整方法
JPS63172148A (ja) * 1987-01-12 1988-07-15 Hitachi Ltd 基板表面変形装置
DE3712064A1 (de) * 1987-04-09 1988-10-27 Prettl Laminar Flow & Prozesst Einrichtung zum bearbeiten von werkstuecken, insbesondere von wafern in einem reinraum einer halbleiterfertigung
DE3879471T2 (de) * 1988-04-21 1993-09-16 Ibm Verfahren zur herstellung eines photoresistmusters und apparat dafuer.
US4931962A (en) * 1988-05-13 1990-06-05 Ade Corporation Fixture and nonrepeatable error compensation system
GB2241594B (en) * 1990-03-02 1993-09-01 Rolls Royce Plc Improvements in or relating to laser drilling of components
JP3445374B2 (ja) * 1994-09-06 2003-09-08 富士写真フイルム株式会社 写真プリンタの可変マスク機構および可変マスク機構のマスク位置決め方法
US5563684A (en) * 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
JP2001144168A (ja) * 1999-11-16 2001-05-25 Nikon Corp 静電チャック、それを有する荷電粒子線露光装置、ウエハ保持方法及びそれを用いたデバイス製造方法
KR100387524B1 (ko) * 2001-01-26 2003-06-18 삼성전자주식회사 반도체 웨이퍼 위치 상태 감지 시스템과 이를 이용하는 반도체장치 제조 설비 및 그에 따른 웨이퍼 위치 상태 감지방법
US6920796B2 (en) * 2003-11-13 2005-07-26 Nan Ya Technology Corporation Device used for detecting clamping force of processed object and method thereof
EP2752870A1 (de) * 2013-01-04 2014-07-09 Süss Microtec Lithography GmbH Aufnahmevorrichtung, insbesondere zur Verwendung in einer Vorrichtung zum Ausrichten von Masken
JP6155767B2 (ja) * 2013-03-29 2017-07-05 大日本印刷株式会社 パターン位相差フィルムの製造方法及びパターン位相差フィルムの露光装置
US9837291B2 (en) 2014-01-24 2017-12-05 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer processing method and apparatus
US9576827B2 (en) 2014-06-06 2017-02-21 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for wafer level bonding
US9490158B2 (en) 2015-01-08 2016-11-08 Taiwan Semiconductor Manufacturing Company, Ltd. Bond chuck, methods of bonding, and tool including bond chuck
CN117369223B (zh) * 2023-12-08 2024-02-27 上海隐冠半导体技术有限公司 一种调平装置及光刻机

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3260153A (en) * 1963-03-19 1966-07-12 Ncr Co Reducing camera
US3704657A (en) * 1971-05-05 1972-12-05 Computervision Corp Adaptive optical focusing system
US4179110A (en) * 1974-05-28 1979-12-18 Canon Kabushiki Kaisha Method for opposing a sheet-like material to a standard plane with predetermined space therebetween
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
US4093378A (en) * 1976-11-01 1978-06-06 International Business Machines Corporation Alignment apparatus
FR2371716A1 (fr) * 1976-11-19 1978-06-16 Thomson Csf Appareil photorepeteur de masques
FR2388300A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant
FR2429447A1 (fr) * 1978-06-23 1980-01-18 Thomson Csf Systeme optique de projection muni d'un positionneur de plaque
US4198159A (en) * 1978-12-29 1980-04-15 International Business Machines Corporation Optical alignment system in projection printing

Also Published As

Publication number Publication date
GB2063524A (en) 1981-06-03
MY8500670A (en) 1985-12-31
HK68485A (en) 1985-09-20
HK36185A (en) 1985-05-17
HK35685A (en) 1985-05-17
MY8500669A (en) 1985-12-31
DE2942388A1 (de) 1980-05-08
GB2063523A (en) 1981-06-03
MY8500663A (en) 1985-12-31
GB2035610B (en) 1983-03-23
GB2063523B (en) 1982-12-15
US4298273A (en) 1981-11-03
GB2035610A (en) 1980-06-18
GB2063524B (en) 1982-12-22

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