SG186624A1 - Pvd vacuum coating unit - Google Patents

Pvd vacuum coating unit Download PDF

Info

Publication number
SG186624A1
SG186624A1 SG2012089439A SG2012089439A SG186624A1 SG 186624 A1 SG186624 A1 SG 186624A1 SG 2012089439 A SG2012089439 A SG 2012089439A SG 2012089439 A SG2012089439 A SG 2012089439A SG 186624 A1 SG186624 A1 SG 186624A1
Authority
SG
Singapore
Prior art keywords
sources
coating
substrate carrier
substrates
substrate
Prior art date
Application number
SG2012089439A
Other languages
English (en)
Inventor
Juergen Ramm
Christian Wohlrab
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of SG186624A1 publication Critical patent/SG186624A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Battery Electrode And Active Subsutance (AREA)
SG2012089439A 2007-12-06 2008-11-17 Pvd vacuum coating unit SG186624A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH18902007 2007-12-06

Publications (1)

Publication Number Publication Date
SG186624A1 true SG186624A1 (en) 2013-01-30

Family

ID=39186114

Family Applications (2)

Application Number Title Priority Date Filing Date
SG2012089439A SG186624A1 (en) 2007-12-06 2008-11-17 Pvd vacuum coating unit
SG10201604607PA SG10201604607PA (en) 2007-12-06 2008-11-17 PVD Vacuum Coating Unit

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10201604607PA SG10201604607PA (en) 2007-12-06 2008-11-17 PVD Vacuum Coating Unit

Country Status (12)

Country Link
US (1) US8968830B2 (https=)
EP (1) EP2220265A1 (https=)
JP (1) JP5449185B2 (https=)
KR (1) KR20100094558A (https=)
CN (1) CN101889102B (https=)
BR (1) BRPI0820014A2 (https=)
CA (1) CA2707581A1 (https=)
MX (1) MX2010006214A (https=)
RU (1) RU2486280C2 (https=)
SG (2) SG186624A1 (https=)
TW (1) TWI498442B (https=)
WO (1) WO2009070903A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2454393B1 (de) * 2009-07-14 2016-09-28 MSM Krystall GBR Verfahren zur herstellung von wendeschneidplatten
CZ304905B6 (cs) * 2009-11-23 2015-01-14 Shm, S.R.O. Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu
DE102010038077B4 (de) 2010-10-08 2018-05-30 Msm Krystall Gbr (Vertretungsberechtigte Gesellschafter: Dr. Rainer Schneider, 12165 Berlin; Arno Mecklenburg, 10999 Berlin) Wendeschneidplatte und Verfahren zu deren Herstellung
ES2532898T3 (es) * 2011-06-30 2015-04-01 Lamina Technologies Sa Deposición por arco catódico
CN104004993B (zh) * 2013-02-25 2018-01-12 北京中科三环高技术股份有限公司 一种表面处理装置
DE102015004856A1 (de) * 2015-04-15 2016-10-20 Oerlikon Metaplas Gmbh Bipolares Arc-Beschichtungsverfahren
CN108368605B (zh) 2015-12-17 2020-06-19 株式会社爱发科 真空处理装置
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet
DE102018004086A1 (de) * 2018-05-18 2019-11-21 Singulus Technologies Ag Durchlaufanlage und Verfahren zum Beschichten von Substraten
KR102833369B1 (ko) * 2018-12-17 2025-07-10 어플라이드 머티어리얼스, 인코포레이티드 캡슐화를 위한 pvd 방향성 증착
US20200255941A1 (en) * 2019-02-11 2020-08-13 Kennametal Inc. Supports for chemical vapor deposition coating applications
CN112204731B (zh) * 2019-05-07 2024-07-05 莱特美美国股份有限公司 接合半导体器件和散热安装座的银铟瞬态液相方法及有银铟瞬态液相接合接头的半导体结构

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1264025A (en) 1987-05-29 1989-12-27 James A.E. Bell Apparatus and process for coloring objects by plasma coating
DE4209384C1 (https=) 1992-03-23 1993-04-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
RU2058427C1 (ru) * 1993-06-01 1996-04-20 Александр Иванович Дерюгин Вакуумная установка для нанесения покрытий
RU2099439C1 (ru) * 1995-05-06 1997-12-20 Самарская государственная архитектурно-строительная академия Устройство для нанесения покрытий (варианты)
DE29615190U1 (de) 1996-03-11 1996-11-28 Balzers Verschleissschutz GmbH, 55411 Bingen Anlage zur Beschichtung von Werkstücken
CN1169477A (zh) * 1996-05-10 1998-01-07 萨蒂斯真空工业销售股份公司 在光学基片上蒸镀镀膜的方法
US5803971A (en) * 1997-01-13 1998-09-08 United Technologies Corporation Modular coating fixture
JP4345869B2 (ja) 1997-05-16 2009-10-14 Hoya株式会社 スパッタ成膜用の膜厚補正機構
CN1130575C (zh) 1997-05-16 2003-12-10 保谷株式会社 具有抗反射膜的塑料光学器件以及用来使抗反射膜的厚度均一的机构
SE517046C2 (sv) 1997-11-26 2002-04-09 Sandvik Ab Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid
JP2000141108A (ja) 1999-01-01 2000-05-23 Hitachi Tool Engineering Ltd 被覆スロ―アウェイチップの製造方法
JP2001049428A (ja) * 1999-08-05 2001-02-20 Nippon Sheet Glass Co Ltd 基体に被膜を被覆する方法およびその方法に用いるスパッタリング装置
DE50115410D1 (de) 2000-09-05 2010-05-12 Oerlikon Trading Ag Vakuumanlage mit koppelbarem Werkstückträger
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
DE202004011179U1 (de) * 2003-07-21 2004-12-02 Unaxis Balzers Ag Trog zum Stapeln, Aufnehmen und Transportieren von kleinen Teilen, insbesondere Werkzeugen
EP1741505B8 (en) * 2004-04-30 2013-07-10 Sumitomo Electric Hardmetal Corp. Tool of surface-coated cubic boron nitride sintered compact and process for producing the same
PL1863947T3 (pl) 2005-03-24 2012-06-29 Oerlikon Trading Ag Warstwa z twardego materiału

Also Published As

Publication number Publication date
JP2011505262A (ja) 2011-02-24
EP2220265A1 (de) 2010-08-25
RU2010127857A (ru) 2012-01-20
BRPI0820014A2 (pt) 2015-05-19
SG10201604607PA (en) 2016-07-28
WO2009070903A1 (de) 2009-06-11
TWI498442B (zh) 2015-09-01
US20090148599A1 (en) 2009-06-11
KR20100094558A (ko) 2010-08-26
CA2707581A1 (en) 2009-06-11
CN101889102A (zh) 2010-11-17
US8968830B2 (en) 2015-03-03
MX2010006214A (es) 2010-06-23
JP5449185B2 (ja) 2014-03-19
RU2486280C2 (ru) 2013-06-27
CN101889102B (zh) 2013-04-10
TW200936795A (en) 2009-09-01

Similar Documents

Publication Publication Date Title
SG186624A1 (en) Pvd vacuum coating unit
CN102245799B (zh) 用于基片组件的表面处理和/或表面涂敷的设备
ES2252092T3 (es) Sistema de capas de dlc y procedimiento para la fabricacion de un sistema de capas de este tipo.
CN104213076A (zh) Pvd与hipims制备超硬dlc涂层方法及设备
EP1116801B1 (en) Method of applying a coating by physical vapour deposition
JP2009133008A (ja) 多層構造体
KR20140025550A (ko) 진공 성막 장치
US6703081B2 (en) Installation and method for vacuum treatment or powder production
EP2616566B1 (en) Improved method of co-sputtering alloys and compounds using a dual c-mag cathode arrangement and corresponding apparatus
CN101403101A (zh) 一种快速硬质陶瓷涂层离子镀装置
CN208008883U (zh) 带有复合磁场的类金刚石涂层制备装置
KR100505003B1 (ko) 티아이 에이엘 에스아이 엔계 경질코팅막의 증착방법
CN104011254A (zh) 贵金属膜的连续成膜方法和电子零件的连续制造方法
KR102005540B1 (ko) Pvd 어레이 코팅기들에서의 에지 균일성 개선
KR20140085762A (ko) 경질피막의 제조방법
KR20150076467A (ko) 조직제어가 가능한 알루미늄 코팅층 및 그 제조방법
WO2009061067A1 (en) Apparatus for reactive sputtering deposition
CN112746246A (zh) 一种基于电弧离子镀高通量制备氮化物复合涂层的方法
CN114855270B (zh) 一种类分子束外延设备及薄膜制备方法
Bose et al. An Overview of Thin-Film Coating Technologies
US20080023319A1 (en) Magnetron assembly
KR20060020415A (ko) 씨알-에스아이-엔계 경질코팅막의 증착방법
EP0634779A1 (en) Collimation chamber with rotatable pedestal
CN204198841U (zh) 一种pvd与hipims制备超硬dlc涂层设备
KR100461980B1 (ko) Ti-Si-N계 경질코팅막의 증착방법