RU2486280C2 - Вакуумная pvd-установка нанесения покрытий - Google Patents
Вакуумная pvd-установка нанесения покрытий Download PDFInfo
- Publication number
- RU2486280C2 RU2486280C2 RU2010127857/02A RU2010127857A RU2486280C2 RU 2486280 C2 RU2486280 C2 RU 2486280C2 RU 2010127857/02 A RU2010127857/02 A RU 2010127857/02A RU 2010127857 A RU2010127857 A RU 2010127857A RU 2486280 C2 RU2486280 C2 RU 2486280C2
- Authority
- RU
- Russia
- Prior art keywords
- coating
- substrate holder
- substrates
- substrate
- sources
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 148
- 239000000758 substrate Substances 0.000 claims abstract description 244
- 238000005520 cutting process Methods 0.000 claims abstract description 148
- 239000011248 coating agent Substances 0.000 claims abstract description 137
- 230000000694 effects Effects 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 60
- 238000000034 method Methods 0.000 claims description 47
- 238000009434 installation Methods 0.000 claims description 38
- 239000007789 gas Substances 0.000 claims description 25
- 230000033001 locomotion Effects 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 16
- 238000011068 loading method Methods 0.000 claims description 11
- 238000012546 transfer Methods 0.000 claims description 9
- 230000000737 periodic effect Effects 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 4
- 239000011343 solid material Substances 0.000 claims description 4
- 238000005240 physical vapour deposition Methods 0.000 abstract description 58
- 238000001771 vacuum deposition Methods 0.000 abstract description 4
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 72
- 238000005516 engineering process Methods 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 18
- 238000013459 approach Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 9
- 230000008021 deposition Effects 0.000 description 9
- 230000008901 benefit Effects 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000002243 precursor Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000002203 pretreatment Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 229910010037 TiAlN Inorganic materials 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 238000007514 turning Methods 0.000 description 3
- 238000009827 uniform distribution Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000265 homogenisation Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 229910010052 TiAlO Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 108010074506 Transfer Factor Proteins 0.000 description 1
- 229910007875 ZrAlO Inorganic materials 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- -1 argon Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000009494 specialized coating Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1890/07 | 2007-12-06 | ||
| CH18902007 | 2007-12-06 | ||
| PCT/CH2008/000485 WO2009070903A1 (de) | 2007-12-06 | 2008-11-17 | Pvd - vakuumbeschichtungsanlage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2010127857A RU2010127857A (ru) | 2012-01-20 |
| RU2486280C2 true RU2486280C2 (ru) | 2013-06-27 |
Family
ID=39186114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2010127857/02A RU2486280C2 (ru) | 2007-12-06 | 2008-11-17 | Вакуумная pvd-установка нанесения покрытий |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US8968830B2 (https=) |
| EP (1) | EP2220265A1 (https=) |
| JP (1) | JP5449185B2 (https=) |
| KR (1) | KR20100094558A (https=) |
| CN (1) | CN101889102B (https=) |
| BR (1) | BRPI0820014A2 (https=) |
| CA (1) | CA2707581A1 (https=) |
| MX (1) | MX2010006214A (https=) |
| RU (1) | RU2486280C2 (https=) |
| SG (2) | SG186624A1 (https=) |
| TW (1) | TWI498442B (https=) |
| WO (1) | WO2009070903A1 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2454393B1 (de) * | 2009-07-14 | 2016-09-28 | MSM Krystall GBR | Verfahren zur herstellung von wendeschneidplatten |
| CZ304905B6 (cs) * | 2009-11-23 | 2015-01-14 | Shm, S.R.O. | Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu |
| DE102010038077B4 (de) | 2010-10-08 | 2018-05-30 | Msm Krystall Gbr (Vertretungsberechtigte Gesellschafter: Dr. Rainer Schneider, 12165 Berlin; Arno Mecklenburg, 10999 Berlin) | Wendeschneidplatte und Verfahren zu deren Herstellung |
| ES2532898T3 (es) * | 2011-06-30 | 2015-04-01 | Lamina Technologies Sa | Deposición por arco catódico |
| CN104004993B (zh) * | 2013-02-25 | 2018-01-12 | 北京中科三环高技术股份有限公司 | 一种表面处理装置 |
| DE102015004856A1 (de) * | 2015-04-15 | 2016-10-20 | Oerlikon Metaplas Gmbh | Bipolares Arc-Beschichtungsverfahren |
| CN108368605B (zh) | 2015-12-17 | 2020-06-19 | 株式会社爱发科 | 真空处理装置 |
| US11322338B2 (en) * | 2017-08-31 | 2022-05-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Sputter target magnet |
| DE102018004086A1 (de) * | 2018-05-18 | 2019-11-21 | Singulus Technologies Ag | Durchlaufanlage und Verfahren zum Beschichten von Substraten |
| KR102833369B1 (ko) * | 2018-12-17 | 2025-07-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 캡슐화를 위한 pvd 방향성 증착 |
| US20200255941A1 (en) * | 2019-02-11 | 2020-08-13 | Kennametal Inc. | Supports for chemical vapor deposition coating applications |
| CN112204731B (zh) * | 2019-05-07 | 2024-07-05 | 莱特美美国股份有限公司 | 接合半导体器件和散热安装座的银铟瞬态液相方法及有银铟瞬态液相接合接头的半导体结构 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0293229A2 (en) * | 1987-05-29 | 1988-11-30 | Inco Limited | Apparatus and process for coloring objects by plasma coating |
| RU2058427C1 (ru) * | 1993-06-01 | 1996-04-20 | Александр Иванович Дерюгин | Вакуумная установка для нанесения покрытий |
| RU2099439C1 (ru) * | 1995-05-06 | 1997-12-20 | Самарская государственная архитектурно-строительная академия | Устройство для нанесения покрытий (варианты) |
| EP0928977A1 (en) * | 1997-05-16 | 1999-07-14 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| RU2161075C2 (ru) * | 1997-01-13 | 2000-12-27 | Юнайтед Технолоджиз Корпорейшн | Приспособление для использования в установке для нанесения на детали покрытий, приспособление модульного типа, установка для нанесения покрытий на детали и способ нанесения покрытий |
| US6328857B1 (en) * | 1999-08-05 | 2001-12-11 | Nippon Sheet Glass Co., Ltd. | Method for forming coating on substrate and sputtering apparatus used for the method |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4209384C1 (https=) | 1992-03-23 | 1993-04-22 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | |
| DE29615190U1 (de) | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz GmbH, 55411 Bingen | Anlage zur Beschichtung von Werkstücken |
| CN1169477A (zh) * | 1996-05-10 | 1998-01-07 | 萨蒂斯真空工业销售股份公司 | 在光学基片上蒸镀镀膜的方法 |
| JP4345869B2 (ja) | 1997-05-16 | 2009-10-14 | Ｈｏｙａ株式会社 | スパッタ成膜用の膜厚補正機構 |
| SE517046C2 (sv) | 1997-11-26 | 2002-04-09 | Sandvik Ab | Plasmaaktiverad CVD-metod för beläggning av skärverktyg med finkornig aluminiumoxid |
| JP2000141108A (ja) | 1999-01-01 | 2000-05-23 | Hitachi Tool Engineering Ltd | 被覆スロ―アウェイチップの製造方法 |
| DE50115410D1 (de) | 2000-09-05 | 2010-05-12 | Oerlikon Trading Ag | Vakuumanlage mit koppelbarem Werkstückträger |
| US20020160620A1 (en) * | 2001-02-26 | 2002-10-31 | Rudolf Wagner | Method for producing coated workpieces, uses and installation for the method |
| DE202004011179U1 (de) * | 2003-07-21 | 2004-12-02 | Unaxis Balzers Ag | Trog zum Stapeln, Aufnehmen und Transportieren von kleinen Teilen, insbesondere Werkzeugen |
| EP1741505B8 (en) * | 2004-04-30 | 2013-07-10 | Sumitomo Electric Hardmetal Corp. | Tool of surface-coated cubic boron nitride sintered compact and process for producing the same |
| PL1863947T3 (pl) | 2005-03-24 | 2012-06-29 | Oerlikon Trading Ag | Warstwa z twardego materiału |
-
2008
- 2008-11-13 US US12/270,415 patent/US8968830B2/en not_active Expired - Fee Related
- 2008-11-17 SG SG2012089439A patent/SG186624A1/en unknown
- 2008-11-17 WO PCT/CH2008/000485 patent/WO2009070903A1/de not_active Ceased
- 2008-11-17 EP EP08856536A patent/EP2220265A1/de not_active Withdrawn
- 2008-11-17 SG SG10201604607PA patent/SG10201604607PA/en unknown
- 2008-11-17 RU RU2010127857/02A patent/RU2486280C2/ru not_active IP Right Cessation
- 2008-11-17 BR BRPI0820014-9A patent/BRPI0820014A2/pt not_active IP Right Cessation
- 2008-11-17 KR KR1020107014904A patent/KR20100094558A/ko not_active Ceased
- 2008-11-17 MX MX2010006214A patent/MX2010006214A/es unknown
- 2008-11-17 CN CN200880119186.5A patent/CN101889102B/zh not_active Expired - Fee Related
- 2008-11-17 JP JP2010536303A patent/JP5449185B2/ja not_active Expired - Fee Related
- 2008-11-17 CA CA2707581A patent/CA2707581A1/en not_active Abandoned
- 2008-12-04 TW TW097147045A patent/TWI498442B/zh not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0293229A2 (en) * | 1987-05-29 | 1988-11-30 | Inco Limited | Apparatus and process for coloring objects by plasma coating |
| RU2058427C1 (ru) * | 1993-06-01 | 1996-04-20 | Александр Иванович Дерюгин | Вакуумная установка для нанесения покрытий |
| RU2099439C1 (ru) * | 1995-05-06 | 1997-12-20 | Самарская государственная архитектурно-строительная академия | Устройство для нанесения покрытий (варианты) |
| RU2161075C2 (ru) * | 1997-01-13 | 2000-12-27 | Юнайтед Технолоджиз Корпорейшн | Приспособление для использования в установке для нанесения на детали покрытий, приспособление модульного типа, установка для нанесения покрытий на детали и способ нанесения покрытий |
| EP0928977A1 (en) * | 1997-05-16 | 1999-07-14 | Hoya Kabushiki Kaisha | Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform |
| US6328857B1 (en) * | 1999-08-05 | 2001-12-11 | Nippon Sheet Glass Co., Ltd. | Method for forming coating on substrate and sputtering apparatus used for the method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011505262A (ja) | 2011-02-24 |
| EP2220265A1 (de) | 2010-08-25 |
| RU2010127857A (ru) | 2012-01-20 |
| BRPI0820014A2 (pt) | 2015-05-19 |
| SG10201604607PA (en) | 2016-07-28 |
| WO2009070903A1 (de) | 2009-06-11 |
| TWI498442B (zh) | 2015-09-01 |
| US20090148599A1 (en) | 2009-06-11 |
| KR20100094558A (ko) | 2010-08-26 |
| CA2707581A1 (en) | 2009-06-11 |
| SG186624A1 (en) | 2013-01-30 |
| CN101889102A (zh) | 2010-11-17 |
| US8968830B2 (en) | 2015-03-03 |
| MX2010006214A (es) | 2010-06-23 |
| JP5449185B2 (ja) | 2014-03-19 |
| CN101889102B (zh) | 2013-04-10 |
| TW200936795A (en) | 2009-09-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | The patent is invalid due to non-payment of fees |
Effective date: 20141118 |