SG152231A1 - Plasma confinement ring assemblies having reduced polymer deposition characteristics - Google Patents

Plasma confinement ring assemblies having reduced polymer deposition characteristics

Info

Publication number
SG152231A1
SG152231A1 SG200902494-4A SG2009024944A SG152231A1 SG 152231 A1 SG152231 A1 SG 152231A1 SG 2009024944 A SG2009024944 A SG 2009024944A SG 152231 A1 SG152231 A1 SG 152231A1
Authority
SG
Singapore
Prior art keywords
rings
plasma
ring assemblies
polymer deposition
plasma confinement
Prior art date
Application number
SG200902494-4A
Other languages
English (en)
Inventor
Rajinder Dhindsa
Felix Kozakevich
James H Rogers
David Trussell
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG152231A1 publication Critical patent/SG152231A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32642—Focus rings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/914—Differential etching apparatus including particular materials of construction
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/915—Differential etching apparatus including focus ring surrounding a wafer for plasma apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Coating By Spraying Or Casting (AREA)
SG200902494-4A 2005-03-18 2006-03-15 Plasma confinement ring assemblies having reduced polymer deposition characteristics SG152231A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/083,241 US7430986B2 (en) 2005-03-18 2005-03-18 Plasma confinement ring assemblies having reduced polymer deposition characteristics

Publications (1)

Publication Number Publication Date
SG152231A1 true SG152231A1 (en) 2009-05-29

Family

ID=37008986

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200902494-4A SG152231A1 (en) 2005-03-18 2006-03-15 Plasma confinement ring assemblies having reduced polymer deposition characteristics

Country Status (9)

Country Link
US (3) US7430986B2 (ja)
EP (1) EP1869228B1 (ja)
JP (2) JP4960340B2 (ja)
KR (1) KR101355729B1 (ja)
CN (2) CN102867726B (ja)
IL (1) IL185670A0 (ja)
SG (1) SG152231A1 (ja)
TW (1) TWI404137B (ja)
WO (1) WO2006101889A2 (ja)

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Also Published As

Publication number Publication date
EP1869228B1 (en) 2018-11-28
IL185670A0 (en) 2008-01-06
WO2006101889A2 (en) 2006-09-28
US20120325407A1 (en) 2012-12-27
CN101495670B (zh) 2012-10-03
US7430986B2 (en) 2008-10-07
JP2012104847A (ja) 2012-05-31
US20080318433A1 (en) 2008-12-25
US8262922B2 (en) 2012-09-11
EP1869228A2 (en) 2007-12-26
JP2008533741A (ja) 2008-08-21
WO2006101889A3 (en) 2009-04-16
US20060207502A1 (en) 2006-09-21
TW200644114A (en) 2006-12-16
TWI404137B (zh) 2013-08-01
US8500952B2 (en) 2013-08-06
CN102867726A (zh) 2013-01-09
CN101495670A (zh) 2009-07-29
EP1869228A4 (en) 2010-11-03
KR20070114392A (ko) 2007-12-03
JP4960340B2 (ja) 2012-06-27
KR101355729B1 (ko) 2014-01-27
CN102867726B (zh) 2015-07-08

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