SG151198A1 - Methods relating to immersion lithography and an immersion lithographic apparatus - Google Patents
Methods relating to immersion lithography and an immersion lithographic apparatusInfo
- Publication number
- SG151198A1 SG151198A1 SG200806669-8A SG2008066698A SG151198A1 SG 151198 A1 SG151198 A1 SG 151198A1 SG 2008066698 A SG2008066698 A SG 2008066698A SG 151198 A1 SG151198 A1 SG 151198A1
- Authority
- SG
- Singapore
- Prior art keywords
- immersion
- lithographic apparatus
- methods relating
- lithography
- immersion lithographic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US96038607P | 2007-09-27 | 2007-09-27 | |
US7133508P | 2008-04-22 | 2008-04-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG151198A1 true SG151198A1 (en) | 2009-04-30 |
Family
ID=40219384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200806669-8A SG151198A1 (en) | 2007-09-27 | 2008-09-10 | Methods relating to immersion lithography and an immersion lithographic apparatus |
Country Status (7)
Country | Link |
---|---|
US (1) | US8587762B2 (fr) |
EP (1) | EP2042930B1 (fr) |
JP (1) | JP5064340B2 (fr) |
KR (2) | KR101010297B1 (fr) |
CN (2) | CN102156390B (fr) |
SG (1) | SG151198A1 (fr) |
TW (1) | TWI392974B (fr) |
Families Citing this family (29)
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US8011377B2 (en) | 2007-05-04 | 2011-09-06 | Asml Netherlands B.V. | Cleaning device and a lithographic apparatus cleaning method |
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US7916269B2 (en) | 2007-07-24 | 2011-03-29 | Asml Netherlands B.V. | Lithographic apparatus and contamination removal or prevention method |
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NL1036306A1 (nl) | 2007-12-20 | 2009-06-23 | Asml Netherlands Bv | Lithographic apparatus and in-line cleaning apparatus. |
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CN104570617B (zh) * | 2014-12-25 | 2016-08-17 | 浙江大学 | 基于动态压力检测的浸没流场自适应密封方法 |
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KR102446678B1 (ko) | 2017-12-15 | 2022-09-23 | 에이에스엠엘 네델란즈 비.브이. | 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법 |
EP4268020A1 (fr) * | 2020-12-23 | 2023-11-01 | ASML Netherlands B.V. | Système de manipulation de fluide, procédé et appareil lithographique |
CN112782051A (zh) * | 2020-12-29 | 2021-05-11 | 浙江启尔机电技术有限公司 | 一种浸没控制单元的洁净度检测系统及其洁净度检测方法 |
CN113504707B (zh) * | 2021-06-17 | 2023-12-05 | 华虹半导体(无锡)有限公司 | 浸没装置上孔洞堵塞的检测方法 |
EP4359866A1 (fr) * | 2021-06-25 | 2024-05-01 | ASML Netherlands B.V. | Outil d'inspection, procédé et appareil lithographique |
WO2024037801A1 (fr) * | 2022-08-19 | 2024-02-22 | Asml Netherlands B.V. | Système, agencement et procédé de conditionnement |
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US7969548B2 (en) | 2006-05-22 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and lithographic apparatus cleaning method |
KR20090023331A (ko) | 2006-05-23 | 2009-03-04 | 가부시키가이샤 니콘 | 메인터넌스 방법, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
JP2007317987A (ja) | 2006-05-29 | 2007-12-06 | Sokudo:Kk | 基板処理装置および基板処理方法 |
WO2008001871A1 (fr) | 2006-06-30 | 2008-01-03 | Nikon Corporation | Procédé de maintenance, procédé d'exposition et procédé de fabrication d'appareil et de dispositif |
JP2008041822A (ja) * | 2006-08-03 | 2008-02-21 | Nikon Corp | 露光装置及びデバイス製造方法、並びに環境制御装置 |
US7900641B2 (en) | 2007-05-04 | 2011-03-08 | Asml Netherlands B.V. | Cleaning device and a lithographic apparatus cleaning method |
US8947629B2 (en) | 2007-05-04 | 2015-02-03 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US20090025753A1 (en) | 2007-07-24 | 2009-01-29 | Asml Netherlands B.V. | Lithographic Apparatus And Contamination Removal Or Prevention Method |
US7916269B2 (en) | 2007-07-24 | 2011-03-29 | Asml Netherlands B.V. | Lithographic apparatus and contamination removal or prevention method |
-
2008
- 2008-09-10 SG SG200806669-8A patent/SG151198A1/en unknown
- 2008-09-17 EP EP08253055.1A patent/EP2042930B1/fr not_active Expired - Fee Related
- 2008-09-18 JP JP2008239006A patent/JP5064340B2/ja active Active
- 2008-09-19 TW TW097136168A patent/TWI392974B/zh active
- 2008-09-25 US US12/237,557 patent/US8587762B2/en active Active
- 2008-09-26 KR KR1020080094779A patent/KR101010297B1/ko active IP Right Grant
- 2008-09-27 CN CN201110086003.8A patent/CN102156390B/zh active Active
- 2008-09-27 CN CN200810168934.0A patent/CN101408733B/zh active Active
-
2010
- 2010-12-03 KR KR1020100122550A patent/KR20110004809A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
CN102156390A (zh) | 2011-08-17 |
KR20090033128A (ko) | 2009-04-01 |
JP2009088508A (ja) | 2009-04-23 |
EP2042930B1 (fr) | 2014-02-12 |
JP5064340B2 (ja) | 2012-10-31 |
TW200921294A (en) | 2009-05-16 |
KR101010297B1 (ko) | 2011-01-24 |
TWI392974B (zh) | 2013-04-11 |
KR20110004809A (ko) | 2011-01-14 |
CN101408733B (zh) | 2013-02-27 |
EP2042930A2 (fr) | 2009-04-01 |
US8587762B2 (en) | 2013-11-19 |
EP2042930A3 (fr) | 2009-06-24 |
US20090086175A1 (en) | 2009-04-02 |
CN101408733A (zh) | 2009-04-15 |
CN102156390B (zh) | 2017-03-01 |
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