SG119305A1 - Radiation sensitive composition and method for thepreparation of the same - Google Patents
Radiation sensitive composition and method for thepreparation of the sameInfo
- Publication number
- SG119305A1 SG119305A1 SG200504360A SG200504360A SG119305A1 SG 119305 A1 SG119305 A1 SG 119305A1 SG 200504360 A SG200504360 A SG 200504360A SG 200504360 A SG200504360 A SG 200504360A SG 119305 A1 SG119305 A1 SG 119305A1
- Authority
- SG
- Singapore
- Prior art keywords
- thepreparation
- same
- radiation sensitive
- sensitive composition
- composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004208620A JP4407410B2 (ja) | 2004-07-15 | 2004-07-15 | カラーフィルタ用感放射線性組成物およびその調製法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG119305A1 true SG119305A1 (en) | 2006-02-28 |
Family
ID=35896980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200504360A SG119305A1 (en) | 2004-07-15 | 2005-07-11 | Radiation sensitive composition and method for thepreparation of the same |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4407410B2 (ko) |
KR (1) | KR101134278B1 (ko) |
CN (1) | CN100443931C (ko) |
SG (1) | SG119305A1 (ko) |
TW (1) | TW200615692A (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI428691B (zh) | 2006-09-25 | 2014-03-01 | Fujifilm Corp | 硬化組成物、彩色濾光片及其製法 |
JP5344790B2 (ja) | 2006-12-28 | 2013-11-20 | 富士フイルム株式会社 | 硬化性組成物、カラーフィルタ及びその製造方法 |
US8778575B2 (en) | 2007-01-15 | 2014-07-15 | Fujifilm Corporation | Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element |
JP5030638B2 (ja) | 2007-03-29 | 2012-09-19 | 富士フイルム株式会社 | カラーフィルタ及びその製造方法 |
JP5213375B2 (ja) | 2007-07-13 | 2013-06-19 | 富士フイルム株式会社 | 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子 |
JP4990085B2 (ja) | 2007-09-28 | 2012-08-01 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子 |
JP5371449B2 (ja) | 2008-01-31 | 2013-12-18 | 富士フイルム株式会社 | 樹脂、顔料分散液、着色硬化性組成物、これを用いたカラーフィルタ及びその製造方法 |
JP2009204816A (ja) * | 2008-02-27 | 2009-09-10 | Fujifilm Corp | 着色硬化性組成物、カラーフィルタ、及び液晶表示装置 |
JP5448352B2 (ja) | 2008-03-10 | 2014-03-19 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子 |
JP5334624B2 (ja) | 2008-03-17 | 2013-11-06 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
JP5137662B2 (ja) | 2008-03-31 | 2013-02-06 | 富士フイルム株式会社 | 硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP2010002886A (ja) * | 2008-05-21 | 2010-01-07 | Sumitomo Chemical Co Ltd | 着色感光性樹脂組成物 |
JP5171514B2 (ja) | 2008-09-29 | 2013-03-27 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
JP5602448B2 (ja) | 2009-03-26 | 2014-10-08 | 富士フイルム株式会社 | 顔料分散液、着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
JP5479163B2 (ja) | 2009-03-31 | 2014-04-23 | 富士フイルム株式会社 | カラーフィルタ用着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP6008760B2 (ja) | 2013-03-05 | 2016-10-19 | 富士フイルム株式会社 | 着色感光性組成物、カラーフィルタ及びカラーフィルタの製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000155209A (ja) * | 1998-11-20 | 2000-06-06 | Jsr Corp | カラーフィルタ用感放射線性組成物 |
JP2002022925A (ja) * | 2000-07-11 | 2002-01-23 | Nippon Steel Chem Co Ltd | カラーフィルターの製造方法及び着色感光性樹脂組成物 |
TWI230321B (en) * | 2000-08-10 | 2005-04-01 | Sumitomo Chemical Co | Photosensitive coloring composition, and color filter and liquid crystal display panel using the same |
JP2003149810A (ja) * | 2001-08-28 | 2003-05-21 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
TWI257527B (en) * | 2001-12-18 | 2006-07-01 | Jsr Corp | Radiation sensitive composition for color filter, method to form color filter, color filter and color liquid crystal display device |
SG102064A1 (en) * | 2001-12-25 | 2004-02-27 | Toray Industries | Color filter, liquid crystal display device, and method for making color filter |
JP4198363B2 (ja) * | 2002-01-29 | 2008-12-17 | 富士フイルム株式会社 | 反射型カラーフィルタ |
JP3951731B2 (ja) * | 2002-02-08 | 2007-08-01 | 東洋インキ製造株式会社 | カラーフィルタ用着色組成物およびカラーフィルタ |
JP3860806B2 (ja) * | 2002-12-19 | 2006-12-20 | Jsr株式会社 | カラーフィルタ用着色層の形成方法 |
JP3767552B2 (ja) * | 2002-12-26 | 2006-04-19 | Jsr株式会社 | 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置 |
-
2004
- 2004-07-15 JP JP2004208620A patent/JP4407410B2/ja not_active Expired - Fee Related
-
2005
- 2005-07-11 TW TW094123441A patent/TW200615692A/zh unknown
- 2005-07-11 SG SG200504360A patent/SG119305A1/en unknown
- 2005-07-14 KR KR1020050063589A patent/KR101134278B1/ko active IP Right Grant
- 2005-07-15 CN CNB2005100844237A patent/CN100443931C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR101134278B1 (ko) | 2012-04-12 |
CN100443931C (zh) | 2008-12-17 |
JP4407410B2 (ja) | 2010-02-03 |
KR20060050157A (ko) | 2006-05-19 |
TW200615692A (en) | 2006-05-16 |
CN1758077A (zh) | 2006-04-12 |
JP2006030541A (ja) | 2006-02-02 |
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