SG114604A1 - Thermosetting resin composition and semiconductor device obtained with the same - Google Patents

Thermosetting resin composition and semiconductor device obtained with the same

Info

Publication number
SG114604A1
SG114604A1 SG200301172A SG200301172A SG114604A1 SG 114604 A1 SG114604 A1 SG 114604A1 SG 200301172 A SG200301172 A SG 200301172A SG 200301172 A SG200301172 A SG 200301172A SG 114604 A1 SG114604 A1 SG 114604A1
Authority
SG
Singapore
Prior art keywords
semiconductor device
thermosetting resin
resin composition
device obtained
same
Prior art date
Application number
SG200301172A
Other languages
English (en)
Inventor
Noro Hiroshi
Fusumada Mitsuaki
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002144080A external-priority patent/JP3955234B2/ja
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of SG114604A1 publication Critical patent/SG114604A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/188Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using encapsulated compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29005Structure
    • H01L2224/29007Layer connector smaller than the underlying bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01025Manganese [Mn]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12528Semiconductor component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31511Of epoxy ether

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
SG200301172A 2002-05-20 2003-03-10 Thermosetting resin composition and semiconductor device obtained with the same SG114604A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002144080A JP3955234B2 (ja) 2001-09-28 2002-05-20 熱硬化性樹脂組成物およびそれを用いた半導体装置

Publications (1)

Publication Number Publication Date
SG114604A1 true SG114604A1 (en) 2005-09-28

Family

ID=29397728

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200301172A SG114604A1 (en) 2002-05-20 2003-03-10 Thermosetting resin composition and semiconductor device obtained with the same

Country Status (6)

Country Link
US (1) US6916538B2 (de)
EP (1) EP1364979A1 (de)
KR (1) KR100649818B1 (de)
CN (1) CN1262599C (de)
MY (1) MY139328A (de)
SG (1) SG114604A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI228132B (en) * 2001-09-26 2005-02-21 Nof Corp Soldering flux composition and solder paste
US6936644B2 (en) 2002-10-16 2005-08-30 Cookson Electronics, Inc. Releasable microcapsule and adhesive curing system using the same
US20070164079A1 (en) * 2004-02-24 2007-07-19 Matsushita Electric Industrial Co., Ltd. Electronic component mounting method, and circuit substrate and circuit substrate unit used in the method
EP1786592A2 (de) * 2004-08-25 2007-05-23 Matsushita Electric Industrial Co., Ltd. Lötzusammensetzung, verbindungsverfahren mit lötmittel und verbindungsstruktur mit lötmittel
CN101142499A (zh) * 2004-09-28 2008-03-12 布鲁尔科技公司 用于光电子用途的可固化的高折射率树脂
JP4811555B2 (ja) * 2005-01-12 2011-11-09 ソニーケミカル&インフォメーションデバイス株式会社 潜在性硬化剤
CA2601950C (en) * 2005-02-23 2010-07-13 Asahi Kasei Chemicals Corporation Latent hardener for epoxy resin and epoxy resin composition
US20070244267A1 (en) * 2006-04-10 2007-10-18 Dueber Thomas E Hydrophobic crosslinkable compositions for electronic applications
EP2029655B1 (de) * 2006-06-16 2011-10-12 Huntsman Advanced Materials (Switzerland) GmbH Beschichtungssystem
WO2008053888A1 (fr) * 2006-10-31 2008-05-08 Nippon Shokubai Co., Ltd. Guide d'ondes optique flexible, procédé pour produire celui-ci, et composition de résine époxyde pour un guide d'ondes optique flexible
JP5207658B2 (ja) * 2007-05-17 2013-06-12 日東電工株式会社 光半導体素子封止用エポキシ樹脂組成物およびその硬化体ならびにそれを用いた光半導体装置
JP5234029B2 (ja) * 2009-08-05 2013-07-10 山栄化学株式会社 無洗浄活性樹脂組成物及び表面実装技術
KR20120095925A (ko) * 2009-10-19 2012-08-29 스미또모 베이크라이트 가부시키가이샤 전자 장치의 제조 방법, 전자 장치 및 전자 장치의 제조 장치
JP5166495B2 (ja) * 2010-08-11 2013-03-21 株式会社日立製作所 ドライマイカテープ及びこれを用いた電気絶縁線輪
JP5467469B2 (ja) 2011-01-04 2014-04-09 山栄化学株式会社 プリント配線基板に表面実装する方法
US8470936B2 (en) 2011-07-29 2013-06-25 Namics Corporation Liquid epoxy resin composition for semiconductor encapsulation
US20130026660A1 (en) * 2011-07-29 2013-01-31 Namics Corporation Liquid epoxy resin composition for semiconductor encapsulation, and semiconductor device using the same
CN102719211A (zh) * 2011-12-06 2012-10-10 常州大学 一种填充银纳米线自修复型导电胶及其制备方法
WO2016029452A1 (en) * 2014-08-29 2016-03-03 Blue Cube Ip Llc Naphthalene based epoxy for halogen-free and flame retardant compositions
US10797013B2 (en) * 2015-02-16 2020-10-06 Panasonic Intellectual Property Management Co., Ltd. Acrylic resin composition for sealing, cured product of same, method for producing same, semiconductor device using said resin composition, and method for manufacturing said semiconductor device
JP7210031B2 (ja) * 2017-11-27 2023-01-23 ナミックス株式会社 フィルム状半導体封止材
CN111732829A (zh) * 2020-06-05 2020-10-02 安徽省华瑞网业有限公司 一种反应注射成型互穿网络发汗耐磨筛网的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3791027A (en) * 1971-06-30 1974-02-12 Ibm Soldering method
US5538789A (en) * 1990-02-09 1996-07-23 Toranaga Technologies, Inc. Composite substrates for preparation of printed circuits
US5851311A (en) * 1996-03-29 1998-12-22 Sophia Systems Co., Ltd. Polymerizable flux composition for encapsulating the solder in situ
TWI257935B (en) 1999-10-06 2006-07-11 Nitto Denko Corp Resin composition for sealing semiconductor and semiconductor device using the same and method for producing semiconductor device
JP2002069157A (ja) * 2000-08-24 2002-03-08 Nitto Denko Corp 半導体封止用樹脂組成物、およびそれを用いた半導体装置、半導体ウエハ、ならびに半導体装置の実装構造
US6667194B1 (en) * 2000-10-04 2003-12-23 Henkel Loctite Corporation Method of bonding die chip with underfill fluxing composition
TW574739B (en) 2001-02-14 2004-02-01 Nitto Denko Corp Thermosetting resin composition and semiconductor device using the same

Also Published As

Publication number Publication date
KR20030090494A (ko) 2003-11-28
MY139328A (en) 2009-09-30
CN1262599C (zh) 2006-07-05
US20030219619A1 (en) 2003-11-27
KR100649818B1 (ko) 2006-11-24
EP1364979A1 (de) 2003-11-26
CN1459469A (zh) 2003-12-03
US6916538B2 (en) 2005-07-12

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