SG112084A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG112084A1
SG112084A1 SG200407096A SG200407096A SG112084A1 SG 112084 A1 SG112084 A1 SG 112084A1 SG 200407096 A SG200407096 A SG 200407096A SG 200407096 A SG200407096 A SG 200407096A SG 112084 A1 SG112084 A1 SG 112084A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200407096A
Other languages
English (en)
Inventor
Arno Jan Bleeker
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG112084A1 publication Critical patent/SG112084A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Polarising Elements (AREA)
SG200407096A 2003-11-07 2004-11-05 Lithographic apparatus and device manufacturing method SG112084A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03257056 2003-11-07

Publications (1)

Publication Number Publication Date
SG112084A1 true SG112084A1 (en) 2005-06-29

Family

ID=34610135

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200407096A SG112084A1 (en) 2003-11-07 2004-11-05 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (2) US7196772B2 (ja)
JP (2) JP4397791B2 (ja)
KR (1) KR100592826B1 (ja)
CN (1) CN100517073C (ja)
DE (1) DE602004017400D1 (ja)
SG (1) SG112084A1 (ja)
TW (1) TWI265382B (ja)

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* Cited by examiner, † Cited by third party
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US7196772B2 (en) * 2003-11-07 2007-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060088076A1 (en) * 2004-10-25 2006-04-27 Yoram Lubianiker Operational range designation and enhancement in optical readout of temperature
US7268357B2 (en) * 2005-05-16 2007-09-11 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and method
KR100764061B1 (ko) * 2006-12-04 2007-10-08 삼성전자주식회사 이미지 센서 및 그 형성 방법
KR101562073B1 (ko) * 2007-10-16 2015-10-21 가부시키가이샤 니콘 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법
CN101681125B (zh) * 2007-10-16 2013-08-21 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
NL2004852A (en) * 2009-06-30 2011-01-04 Asml Netherlands Bv Lithographic apparatus and an array of reflective elements.
US8318409B2 (en) * 2009-10-21 2012-11-27 GM Global Technology Operations LLC Dynamic masking method for micro-truss foam fabrication
FR2959025B1 (fr) * 2010-04-20 2013-11-15 St Microelectronics Rousset Procede et dispositif de photolithographie
NL2024009A (en) * 2018-10-18 2020-05-07 Asml Netherlands Bv Control of optical modulator
WO2023172228A2 (en) * 2022-03-07 2023-09-14 Istanbul Medipol Universitesi A photolithography method and system

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KR100545297B1 (ko) * 2002-06-12 2006-01-24 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
JP3613342B2 (ja) * 2002-08-27 2005-01-26 独立行政法人科学技術振興機構 マスクレス露光装置
US6870554B2 (en) * 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
US7061591B2 (en) * 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays
EP1482373A1 (en) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1530092B1 (en) 2003-11-07 2008-10-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7196772B2 (en) * 2003-11-07 2007-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US20070165203A1 (en) 2007-07-19
JP4397791B2 (ja) 2010-01-13
CN100517073C (zh) 2009-07-22
TWI265382B (en) 2006-11-01
JP4860674B2 (ja) 2012-01-25
JP2009021618A (ja) 2009-01-29
US7826035B2 (en) 2010-11-02
CN1614514A (zh) 2005-05-11
KR100592826B1 (ko) 2006-06-26
TW200527151A (en) 2005-08-16
US20050118528A1 (en) 2005-06-02
JP2005150714A (ja) 2005-06-09
DE602004017400D1 (de) 2008-12-11
US7196772B2 (en) 2007-03-27
KR20050044295A (ko) 2005-05-12

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