SG11202107101PA - Substrate holder for use in a lithographic apparatus and a device manufacturing method - Google Patents

Substrate holder for use in a lithographic apparatus and a device manufacturing method

Info

Publication number
SG11202107101PA
SG11202107101PA SG11202107101PA SG11202107101PA SG11202107101PA SG 11202107101P A SG11202107101P A SG 11202107101PA SG 11202107101P A SG11202107101P A SG 11202107101PA SG 11202107101P A SG11202107101P A SG 11202107101PA SG 11202107101P A SG11202107101P A SG 11202107101PA
Authority
SG
Singapore
Prior art keywords
substrate holder
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG11202107101PA
Other languages
English (en)
Inventor
Johannes Maassen
Herman Marquart
André Schreuder
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG11202107101PA publication Critical patent/SG11202107101PA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG11202107101PA 2019-01-23 2019-12-13 Substrate holder for use in a lithographic apparatus and a device manufacturing method SG11202107101PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19153181 2019-01-23
PCT/EP2019/085167 WO2020151878A1 (en) 2019-01-23 2019-12-13 Substrate holder for use in a lithographic apparatus and a device manufacturing method

Publications (1)

Publication Number Publication Date
SG11202107101PA true SG11202107101PA (en) 2021-07-29

Family

ID=65200697

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202107101PA SG11202107101PA (en) 2019-01-23 2019-12-13 Substrate holder for use in a lithographic apparatus and a device manufacturing method

Country Status (9)

Country Link
US (1) US20220115260A1 (ja)
EP (1) EP3915142A1 (ja)
JP (1) JP7269351B2 (ja)
KR (1) KR20210105415A (ja)
CN (1) CN113348543A (ja)
NL (1) NL2024454A (ja)
SG (1) SG11202107101PA (ja)
TW (2) TWI752394B (ja)
WO (1) WO2020151878A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023241893A1 (en) * 2022-06-15 2023-12-21 Asml Netherlands B.V. Substrate support and lithographic apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6664549B2 (en) * 2000-01-28 2003-12-16 Hitachi Tokyo Electronics Co., Ltd. Wafer chuck, exposure system, and method of manufacturing semiconductor device
JP3977324B2 (ja) 2002-11-12 2007-09-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
US7133120B2 (en) * 2004-05-04 2006-11-07 Asml Netherlands B.V. Lithographic apparatus, article support member, and method
KR101293059B1 (ko) * 2005-12-08 2013-08-05 몰레큘러 임프린츠 인코퍼레이티드 기판과 몰드 사이에 위치되는 기체를 축출하기 위한 방법
EP3049869B1 (en) * 2013-09-27 2017-11-08 ASML Netherlands B.V. Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
JP6495484B2 (ja) * 2015-06-11 2019-04-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び基板をロードするための方法
KR102108243B1 (ko) * 2015-09-28 2020-05-08 에이에스엠엘 네델란즈 비.브이. 기판 홀더, 리소그래피 장치 및 디바이스 제조 방법
WO2017060028A1 (en) * 2015-10-09 2017-04-13 Asml Netherlands B.V. Substrate table and lithographic apparatus

Also Published As

Publication number Publication date
EP3915142A1 (en) 2021-12-01
WO2020151878A1 (en) 2020-07-30
JP7269351B2 (ja) 2023-05-08
JP2022517546A (ja) 2022-03-09
NL2024454A (en) 2020-08-18
CN113348543A (zh) 2021-09-03
TW202213622A (zh) 2022-04-01
TW202030831A (zh) 2020-08-16
US20220115260A1 (en) 2022-04-14
TWI752394B (zh) 2022-01-11
JP2023095890A (ja) 2023-07-06
KR20210105415A (ko) 2021-08-26

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