SG11202100082XA - Systems and methods for a spray measurement apparatus - Google Patents
Systems and methods for a spray measurement apparatusInfo
- Publication number
- SG11202100082XA SG11202100082XA SG11202100082XA SG11202100082XA SG11202100082XA SG 11202100082X A SG11202100082X A SG 11202100082XA SG 11202100082X A SG11202100082X A SG 11202100082XA SG 11202100082X A SG11202100082X A SG 11202100082XA SG 11202100082X A SG11202100082X A SG 11202100082XA
- Authority
- SG
- Singapore
- Prior art keywords
- systems
- methods
- measurement apparatus
- spray measurement
- spray
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
- B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
- B05B9/035—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material to several spraying apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/004—Arrangements for controlling delivery; Arrangements for controlling the spray area comprising sensors for monitoring the delivery, e.g. by displaying the sensed value or generating an alarm
- B05B12/006—Pressure or flow rate sensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F3/00—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow
- G01F3/36—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with stationary measuring chambers having constant volume during measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Fluid Mechanics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Coating Apparatus (AREA)
- Special Spraying Apparatus (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Measuring Fluid Pressure (AREA)
- Measuring Volume Flow (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862694661P | 2018-07-06 | 2018-07-06 | |
PCT/US2019/040864 WO2020010357A1 (en) | 2018-07-06 | 2019-07-08 | Systems and methods for a spray measurement apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202100082XA true SG11202100082XA (en) | 2021-02-25 |
Family
ID=69060353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202100082XA SG11202100082XA (en) | 2018-07-06 | 2019-07-08 | Systems and methods for a spray measurement apparatus |
Country Status (7)
Country | Link |
---|---|
US (2) | US10777434B2 (zh) |
EP (1) | EP3817870B1 (zh) |
JP (1) | JP7450844B2 (zh) |
KR (1) | KR102538284B1 (zh) |
CN (1) | CN112638557B (zh) |
SG (1) | SG11202100082XA (zh) |
WO (1) | WO2020010357A1 (zh) |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
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US4197000A (en) * | 1978-05-23 | 1980-04-08 | Fsi Corporation | Positive developing method and apparatus |
US4816081A (en) * | 1987-02-17 | 1989-03-28 | Fsi Corporation | Apparatus and process for static drying of substrates |
US4900395A (en) | 1989-04-07 | 1990-02-13 | Fsi International, Inc. | HF gas etching of wafers in an acid processor |
US5232328A (en) * | 1991-03-05 | 1993-08-03 | Semitool, Inc. | Robot loadable centrifugal semiconductor processor with extendible rotor |
US5378308A (en) * | 1992-11-09 | 1995-01-03 | Bmc Industries, Inc. | Etchant distribution apparatus |
US5728220A (en) * | 1996-03-08 | 1998-03-17 | Ultimation, Inc. | Tire soaper apparatus |
US6926017B2 (en) * | 1998-01-09 | 2005-08-09 | Entegris, Inc. | Wafer container washing apparatus |
US6125863A (en) | 1998-06-30 | 2000-10-03 | Semitool, Inc. | Offset rotor flat media processor |
US6904920B2 (en) * | 1998-07-10 | 2005-06-14 | Semitool, Inc. | Method and apparatus for cleaning containers |
US6432214B2 (en) * | 1998-07-10 | 2002-08-13 | Semitool, Inc. | Cleaning apparatus |
JP2001316861A (ja) | 2000-05-01 | 2001-11-16 | Tokyo Electron Ltd | 加熱装置およびそれを用いた液処理装置 |
TW477882B (en) * | 2000-07-03 | 2002-03-01 | Tokyo Electron Ltd | Processing apparatus with sealing mechanism |
US6418945B1 (en) * | 2000-07-07 | 2002-07-16 | Semitool, Inc. | Dual cassette centrifugal processor |
US6591162B1 (en) * | 2000-08-15 | 2003-07-08 | Asyst Technologies, Inc. | Smart load port with integrated carrier monitoring and fab-wide carrier management system |
US6725868B2 (en) * | 2000-11-14 | 2004-04-27 | Tokyo Electron Limited | Liquid processing apparatus |
WO2003006183A2 (en) | 2001-07-12 | 2003-01-23 | Semitool, Inc. | Method and apparatus for cleaning semiconductor wafers and other flat media |
WO2003008114A1 (en) * | 2001-07-16 | 2003-01-30 | Semitool, Inc. | Systems and methods for processing workpieces |
JP3896265B2 (ja) * | 2001-09-11 | 2007-03-22 | オリンパス株式会社 | 位置出し治具及び位置出し治具を用いた吹き付け研磨装置 |
CN1286645C (zh) * | 2003-02-28 | 2006-11-29 | 精工爱普生株式会社 | 液滴喷出装置及液滴喷出头的喷出异常检测、判断方法 |
US7311004B2 (en) * | 2003-03-10 | 2007-12-25 | Capstan Ag Systems, Inc. | Flow control and operation monitoring system for individual spray nozzles |
US20050284375A1 (en) * | 2004-06-24 | 2005-12-29 | Kodjo Leeds | Method and apparatus for processing a workpiece |
US20060040111A1 (en) * | 2004-08-20 | 2006-02-23 | Dolechek Kert L | Process chamber and system for thinning a semiconductor workpiece |
JP2006076067A (ja) * | 2004-09-08 | 2006-03-23 | Seiko Epson Corp | 液滴吐出装置、電気光学装置の製造方法、電気光学装置、および電子機器 |
US20060201541A1 (en) | 2005-03-11 | 2006-09-14 | Semiconductor Energy Laboratory Co., Ltd. | Cleaning-drying apparatus and cleaning-drying method |
KR100696378B1 (ko) * | 2005-04-13 | 2007-03-19 | 삼성전자주식회사 | 반도체 기판을 세정하는 장치 및 방법 |
JP2007053297A (ja) * | 2005-08-19 | 2007-03-01 | Oki Electric Ind Co Ltd | ポリマー除去装置および当該装置の内部の洗浄方法 |
KR100766443B1 (ko) * | 2006-05-23 | 2007-10-11 | 주식회사 케이씨텍 | 슬릿 노즐의 폭방향 토출 균일도 측정 장치 및 방법 |
KR100766444B1 (ko) * | 2006-05-23 | 2007-10-11 | 주식회사 케이씨텍 | 슬릿 노즐의 폭방향 토출 균일도 측정 장치 및 방법 |
US8844546B2 (en) * | 2008-10-01 | 2014-09-30 | Applied Materials, Inc. | Apparatus and method for cleaning semiconductor substrate using pressurized fluid |
KR101022014B1 (ko) * | 2010-05-18 | 2011-03-16 | (주) 디바이스이엔지 | 웨이퍼 보관용기 세정장치 |
AT515531B1 (de) * | 2014-09-19 | 2015-10-15 | Siconnex Customized Solutions Gmbh | Halterungssystem und Beschickungsverfahren für scheibenförmige Objekte |
CN204705491U (zh) * | 2015-06-02 | 2015-10-14 | 中国人民解放军72875部队 | 喷洒车故障检测装置 |
FR3037826B1 (fr) * | 2015-06-25 | 2019-09-20 | Pellenc | Unite de pulverisation, module de pulverisation compact comprenant une telle unite et systeme de pulverisation et de pilotage comprenant une pluralite de tels modules |
JP2017193140A (ja) * | 2016-04-22 | 2017-10-26 | セイコーエプソン株式会社 | 液体吐出装置及び液体吐出方法 |
CN207198602U (zh) * | 2017-09-13 | 2018-04-06 | 张公权 | 航空农林喷洒远程实时监控及计量控制系统 |
-
2019
- 2019-07-08 JP JP2021521950A patent/JP7450844B2/ja active Active
- 2019-07-08 CN CN201980056788.9A patent/CN112638557B/zh active Active
- 2019-07-08 SG SG11202100082XA patent/SG11202100082XA/en unknown
- 2019-07-08 US US16/505,450 patent/US10777434B2/en active Active
- 2019-07-08 KR KR1020217003699A patent/KR102538284B1/ko active IP Right Grant
- 2019-07-08 WO PCT/US2019/040864 patent/WO2020010357A1/en unknown
- 2019-07-08 EP EP19831554.1A patent/EP3817870B1/en active Active
-
2020
- 2020-04-29 US US16/861,868 patent/US11664251B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US10777434B2 (en) | 2020-09-15 |
KR20210050515A (ko) | 2021-05-07 |
EP3817870A1 (en) | 2021-05-12 |
EP3817870B1 (en) | 2024-04-17 |
US20200013650A1 (en) | 2020-01-09 |
KR102538284B1 (ko) | 2023-05-30 |
JP2021529092A (ja) | 2021-10-28 |
JP7450844B2 (ja) | 2024-03-18 |
CN112638557A (zh) | 2021-04-09 |
WO2020010357A1 (en) | 2020-01-09 |
US20200258763A1 (en) | 2020-08-13 |
US11664251B2 (en) | 2023-05-30 |
EP3817870A4 (en) | 2022-04-13 |
CN112638557B (zh) | 2023-02-03 |
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