SG11202007003RA - Methods and apparatus for cleaning substrates - Google Patents

Methods and apparatus for cleaning substrates

Info

Publication number
SG11202007003RA
SG11202007003RA SG11202007003RA SG11202007003RA SG11202007003RA SG 11202007003R A SG11202007003R A SG 11202007003RA SG 11202007003R A SG11202007003R A SG 11202007003RA SG 11202007003R A SG11202007003R A SG 11202007003RA SG 11202007003R A SG11202007003R A SG 11202007003RA
Authority
SG
Singapore
Prior art keywords
methods
cleaning substrates
substrates
cleaning
Prior art date
Application number
SG11202007003RA
Inventor
Hui Wang
Xi Wang
Xiaoyan Zhang
Fufa Chen
Original Assignee
Acm Res Shanghai Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acm Res Shanghai Inc filed Critical Acm Res Shanghai Inc
Publication of SG11202007003RA publication Critical patent/SG11202007003RA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SG11202007003RA 2018-01-23 2018-01-23 Methods and apparatus for cleaning substrates SG11202007003RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2018/073723 WO2019144256A1 (en) 2018-01-23 2018-01-23 Methods and apparatus for cleaning substrates

Publications (1)

Publication Number Publication Date
SG11202007003RA true SG11202007003RA (en) 2020-08-28

Family

ID=67395151

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202007003RA SG11202007003RA (en) 2018-01-23 2018-01-23 Methods and apparatus for cleaning substrates

Country Status (7)

Country Link
US (1) US20210031243A1 (en)
EP (1) EP3743939A4 (en)
JP (1) JP7217280B2 (en)
KR (1) KR102553512B1 (en)
CN (1) CN111656484A (en)
SG (1) SG11202007003RA (en)
WO (1) WO2019144256A1 (en)

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3192610B2 (en) * 1996-05-28 2001-07-30 キヤノン株式会社 Method for cleaning porous surface, method for cleaning semiconductor surface, and method for manufacturing semiconductor substrate
US6058945A (en) 1996-05-28 2000-05-09 Canon Kabushiki Kaisha Cleaning methods of porous surface and semiconductor surface
US7336019B1 (en) * 2005-07-01 2008-02-26 Puskas William L Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound
US20060086604A1 (en) * 1996-09-24 2006-04-27 Puskas William L Organism inactivation method and system
US20080047575A1 (en) * 1996-09-24 2008-02-28 Puskas William L Apparatus, circuitry, signals and methods for cleaning and processing with sound
US6124214A (en) * 1998-08-27 2000-09-26 Micron Technology, Inc. Method and apparatus for ultrasonic wet etching of silicon
JP2003234320A (en) * 2002-02-06 2003-08-22 Nec Electronics Corp Method, chemical liquid, and device for cleaning substrate, and semiconductor device
JP2003311226A (en) * 2002-04-19 2003-11-05 Kaijo Corp Cleaning method and cleaning apparatus
US7373941B2 (en) * 2003-03-28 2008-05-20 Taiwan Semiconductor Manufacturing Co. Ltd Wet cleaning cavitation system and method to remove particulate wafer contamination
US7270130B2 (en) * 2003-10-15 2007-09-18 Infineon Technologies Ag Semiconductor device cleaning employing heterogeneous nucleation for controlled cavitation
JP2007150164A (en) * 2005-11-30 2007-06-14 Renesas Technology Corp Substrate washing method
US20100224215A1 (en) * 2009-03-06 2010-09-09 Imec Method for Reducing the Damage Induced by a Physical Force Assisted Cleaning
US9492852B2 (en) * 2009-03-31 2016-11-15 Acm Research (Shanghai) Inc. Methods and apparatus for cleaning semiconductor wafers
US8973601B2 (en) * 2010-02-01 2015-03-10 Ultrasonic Power Corporation Liquid condition sensing circuit and method
CN102368468B (en) * 2011-10-17 2013-09-25 浙江贝盛光伏股份有限公司 Precleaning process of silicon wafer
US10910244B2 (en) * 2015-05-20 2021-02-02 Acm Research, Inc. Methods and system for cleaning semiconductor wafers
US10512946B2 (en) * 2015-09-03 2019-12-24 Taiwan Semiconductor Manufacturing Co., Ltd. Gigasonic cleaning techniques
CN105414084A (en) * 2015-12-10 2016-03-23 北京七星华创电子股份有限公司 Ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing device and ultrasonic or mega-sonic oscillatory two-phase-flow atomization washing method

Also Published As

Publication number Publication date
JP2021515979A (en) 2021-06-24
WO2019144256A1 (en) 2019-08-01
CN111656484A (en) 2020-09-11
EP3743939A4 (en) 2021-08-18
US20210031243A1 (en) 2021-02-04
JP7217280B2 (en) 2023-02-02
KR20200106542A (en) 2020-09-14
KR102553512B1 (en) 2023-07-10
EP3743939A1 (en) 2020-12-02

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