SG11202006013VA - Amorphous silica powder, production method therefor, and use thereof - Google Patents

Amorphous silica powder, production method therefor, and use thereof

Info

Publication number
SG11202006013VA
SG11202006013VA SG11202006013VA SG11202006013VA SG11202006013VA SG 11202006013V A SG11202006013V A SG 11202006013VA SG 11202006013V A SG11202006013V A SG 11202006013VA SG 11202006013V A SG11202006013V A SG 11202006013VA SG 11202006013V A SG11202006013V A SG 11202006013VA
Authority
SG
Singapore
Prior art keywords
production method
method therefor
amorphous silica
silica powder
amorphous
Prior art date
Application number
SG11202006013VA
Other languages
English (en)
Inventor
Shuji Sasaki
Junya Nitta
Ryoma Yamaguma
Hiroaki Yoshigai
Koji Miyazaki
Original Assignee
Denka Company Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=67395420&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG11202006013V(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Denka Company Ltd filed Critical Denka Company Ltd
Publication of SG11202006013VA publication Critical patent/SG11202006013VA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/295Organic, e.g. plastic containing a filler
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141Preparation of hydrosols or aqueous dispersions
    • C01B33/1415Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
    • C01B33/1417Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water an aqueous dispersion being obtained
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146After-treatment of sols
    • C01B33/148Concentration; Drying; Dehydration; Stabilisation; Purification
    • C01B33/1485Stabilisation, e.g. prevention of gelling; Purification
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/02Amorphous compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/30Particle morphology extending in three dimensions
    • C01P2004/32Spheres
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/002Physical properties
    • C08K2201/005Additives being defined by their particle size in general
SG11202006013VA 2018-01-26 2019-01-15 Amorphous silica powder, production method therefor, and use thereof SG11202006013VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018011603 2018-01-26
PCT/JP2019/000974 WO2019146454A1 (ja) 2018-01-26 2019-01-15 非晶質シリカ粉末およびその製造方法、用途

Publications (1)

Publication Number Publication Date
SG11202006013VA true SG11202006013VA (en) 2020-07-29

Family

ID=67395420

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202006013VA SG11202006013VA (en) 2018-01-26 2019-01-15 Amorphous silica powder, production method therefor, and use thereof

Country Status (7)

Country Link
EP (1) EP3744685B1 (zh)
JP (1) JP7197514B2 (zh)
KR (1) KR102578962B1 (zh)
CN (1) CN111566048B (zh)
SG (1) SG11202006013VA (zh)
TW (1) TW201934486A (zh)
WO (1) WO2019146454A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230357007A1 (en) * 2020-09-30 2023-11-09 Denka Company Limited Boron nitride powder and method for producing boron nitride powder
KR20230150344A (ko) 2021-03-31 2023-10-30 덴카 주식회사 실리카 분말 및 그 제조 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE109493T1 (de) * 1986-08-29 1994-08-15 Diafoil Hoechst Co Ltd Polyester-zusammensetzungen, verfahren zu ihrer herstellung, polyesterfilme, polyesterfilme für magnetbänder und daraus hergestellte filme für kondensatoren.
JP3478468B2 (ja) 1997-08-25 2003-12-15 電気化学工業株式会社 無機質球状粒子の製造方法及び装置
JP4691321B2 (ja) * 2003-12-26 2011-06-01 三菱レイヨン株式会社 高純度酸化ケイ素粉末の製造方法
JP2007145880A (ja) * 2005-02-16 2007-06-14 Kaneka Corp 1成分型硬化性組成物
JP2006273927A (ja) * 2005-03-28 2006-10-12 Sanyu Rec Co Ltd 無機充填材の絶縁性改善方法
JP2007005346A (ja) 2005-06-21 2007-01-11 Sanyu Rec Co Ltd 金属性異物の除去方法
JP2007176738A (ja) * 2005-12-28 2007-07-12 Asahi Glass Si-Tech Co Ltd 安定化された表面処理葉状シリカ2次粒子粉末及びその製造方法
JP5280626B2 (ja) * 2006-12-08 2013-09-04 電気化学工業株式会社 非磁性金属酸化物粉末における着磁性粒子の個数測定方法
JP5085432B2 (ja) * 2008-05-26 2012-11-28 電気化学工業株式会社 着磁性異物を低減した球状金属酸化物粉末、その製造方法及び用途
WO2010073457A1 (ja) * 2008-12-22 2010-07-01 電気化学工業株式会社 粉末、その製造方法、及びその粉末を含む樹脂組成物
JP5259500B2 (ja) * 2009-06-10 2013-08-07 電気化学工業株式会社 非晶質シリカ質粉末およびその製造方法、用途
US8889044B2 (en) * 2009-12-18 2014-11-18 Kao Corporation Method for producing mesoporous silica particles
JP5994573B2 (ja) * 2012-10-31 2016-09-21 三菱マテリアル株式会社 酸化珪素粉末の製造方法
JP2015086120A (ja) * 2013-10-31 2015-05-07 株式会社トクヤマ 球状シリカ微粉末とその製造方法
JP6322474B2 (ja) * 2014-05-08 2018-05-09 日揮触媒化成株式会社 疎水性シリカ粉末、それを含むゴム成型用組成物およびその製造方法
JP6934344B2 (ja) * 2017-07-18 2021-09-15 デンカ株式会社 球状シリカフィラー用粉末及びその製造方法

Also Published As

Publication number Publication date
KR102578962B1 (ko) 2023-09-14
JPWO2019146454A1 (ja) 2021-01-28
JP7197514B2 (ja) 2022-12-27
EP3744685B1 (en) 2022-08-17
WO2019146454A1 (ja) 2019-08-01
TW201934486A (zh) 2019-09-01
EP3744685A4 (en) 2021-03-03
EP3744685A1 (en) 2020-12-02
CN111566048B (zh) 2023-05-09
KR20200111686A (ko) 2020-09-29
CN111566048A (zh) 2020-08-21

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