SG11202001636RA - Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk - Google Patents
Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic diskInfo
- Publication number
- SG11202001636RA SG11202001636RA SG11202001636RA SG11202001636RA SG11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA SG 11202001636R A SG11202001636R A SG 11202001636RA
- Authority
- SG
- Singapore
- Prior art keywords
- manufacturing
- glass substrate
- magnetic disk
- polishing liquid
- manufacturing glass
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 2
- 238000000034 method Methods 0.000 title 2
- 239000011521 glass Substances 0.000 title 1
- 239000007788 liquid Substances 0.000 title 1
- 238000005498 polishing Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
- B24B7/245—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass discontinuous
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/02—Lapping machines or devices; Accessories designed for working surfaces of revolution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/241—Methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017210817 | 2017-10-31 | ||
| PCT/JP2018/040610 WO2019088209A1 (fr) | 2017-10-31 | 2018-10-31 | Liquide de polissage, procédé de fabrication d'un substrat en verre et procédé de fabrication d'un disque magnétique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202001636RA true SG11202001636RA (en) | 2020-03-30 |
Family
ID=66331926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202001636RA SG11202001636RA (en) | 2017-10-31 | 2018-10-31 | Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US11214713B2 (fr) |
| JP (3) | JP6692006B2 (fr) |
| CN (2) | CN111094502B (fr) |
| SG (1) | SG11202001636RA (fr) |
| WO (1) | WO2019088209A1 (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111094502B (zh) * | 2017-10-31 | 2021-11-16 | Hoya株式会社 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
| CN112266729A (zh) * | 2020-11-17 | 2021-01-26 | 云南光电辅料有限公司 | 一种超低色散玻璃镜片用抛光液及其制备方法 |
| CN114800055A (zh) * | 2022-04-28 | 2022-07-29 | 浙江美迪凯光学半导体有限公司 | 一种方形片的抛光工艺 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2001246851A1 (en) | 2000-10-02 | 2002-04-15 | Mitsui Mining And Smelting Co. Lt.D | Cerium based abrasive material and method for producing cerium based abrasive material |
| JP4807905B2 (ja) * | 2001-04-05 | 2011-11-02 | 昭和電工株式会社 | 研磨材スラリー及び研磨微粉 |
| JP4885352B2 (ja) | 2000-12-12 | 2012-02-29 | 昭和電工株式会社 | 研磨材スラリー及び研磨微粉 |
| JP2002371267A (ja) * | 2001-06-15 | 2002-12-26 | Mitsui Mining & Smelting Co Ltd | セリウム系研摩材粒子の製造方法及びセリウム系研摩材粒子 |
| JP5256832B2 (ja) * | 2007-04-17 | 2013-08-07 | 日立化成株式会社 | 研磨剤及びその製造方法 |
| MY154861A (en) * | 2008-12-22 | 2015-08-14 | Kao Corp | Polishing liquid composition for magnetic-disk substrate |
| CN101486879A (zh) | 2009-02-20 | 2009-07-22 | 包头迅博新材料有限公司 | 一种稀土精细抛光材料及其制造工艺 |
| JP2011110637A (ja) * | 2009-11-25 | 2011-06-09 | Asahi Glass Co Ltd | 磁気ディスク用ガラス基板の製造方法 |
| CN102079950A (zh) | 2009-11-27 | 2011-06-01 | 东莞市卓越研磨材料有限公司 | 单分散稀土抛光粉制备方法 |
| MX337752B (es) * | 2010-02-10 | 2016-03-17 | Saint Gobain Ceramics | Particulas ceramicas y metodos para producirlas. |
| JP5736681B2 (ja) * | 2010-07-15 | 2015-06-17 | 旭硝子株式会社 | 研磨液及び磁気ディスク用ガラス基板の製造方法 |
| JP5695068B2 (ja) * | 2010-09-30 | 2015-04-01 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法および情報記録媒体の製造方法 |
| US8421536B2 (en) * | 2011-09-21 | 2013-04-16 | Analog Devices, Inc. | Apparatus and methods for electronic amplification |
| JPWO2013069720A1 (ja) * | 2011-11-09 | 2015-04-02 | Ｄｏｗａエコシステム株式会社 | 研磨剤リサイクル方法 |
| JPWO2013146090A1 (ja) * | 2012-03-30 | 2015-12-10 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| JP5612235B2 (ja) * | 2012-08-29 | 2014-10-22 | Hoya株式会社 | 磁気ディスク用ガラス基板、磁気ディスク |
| WO2014168113A1 (fr) | 2013-04-09 | 2014-10-16 | Ｄｏｗａエコシステム株式会社 | Procédé de fabrication de particules abrasives à base d'oxyde de cérium régénérées et particules régénérées |
| US20160239913A1 (en) | 2013-08-13 | 2016-08-18 | Cfph, Llc | Foreign exchange trading |
| JP6063611B2 (ja) * | 2014-06-30 | 2017-01-18 | Hoya株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| KR20190091579A (ko) | 2015-01-12 | 2019-08-06 | 버슘머트리얼즈 유에스, 엘엘씨 | 화학적 기계적 평탄화 조성물용 복합 연마 입자 및 이를 사용하는 방법 |
| CN106479371A (zh) * | 2016-08-15 | 2017-03-08 | 惠州市米特仑科技有限公司 | 一种高精度复合抛光液及其制备方法 |
| CN111094502B (zh) * | 2017-10-31 | 2021-11-16 | Hoya株式会社 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
-
2018
- 2018-10-31 CN CN201880060448.9A patent/CN111094502B/zh active Active
- 2018-10-31 JP JP2019550479A patent/JP6692006B2/ja active Active
- 2018-10-31 WO PCT/JP2018/040610 patent/WO2019088209A1/fr active Application Filing
- 2018-10-31 US US16/641,185 patent/US11214713B2/en active Active
- 2018-10-31 SG SG11202001636RA patent/SG11202001636RA/en unknown
- 2018-10-31 CN CN202111254736.8A patent/CN113913156B/zh active Active
-
2020
- 2020-04-13 JP JP2020071965A patent/JP7201639B2/ja active Active
-
2021
- 2021-12-30 US US17/566,200 patent/US11680187B2/en active Active
-
2022
- 2022-12-22 JP JP2022205494A patent/JP7547449B2/ja active Active
-
2023
- 2023-05-22 US US18/321,385 patent/US20230287244A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN113913156A (zh) | 2022-01-11 |
| CN111094502B (zh) | 2021-11-16 |
| US20200208015A1 (en) | 2020-07-02 |
| JP7547449B2 (ja) | 2024-09-09 |
| US11680187B2 (en) | 2023-06-20 |
| CN113913156B (zh) | 2022-06-24 |
| CN111094502A (zh) | 2020-05-01 |
| JP7201639B2 (ja) | 2023-01-10 |
| JPWO2019088209A1 (ja) | 2020-06-11 |
| JP2023052035A (ja) | 2023-04-11 |
| JP2020128539A (ja) | 2020-08-27 |
| US20220119680A1 (en) | 2022-04-21 |
| US20230287244A1 (en) | 2023-09-14 |
| JP6692006B2 (ja) | 2020-05-13 |
| US11214713B2 (en) | 2022-01-04 |
| WO2019088209A1 (fr) | 2019-05-09 |
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