SG11201810063SA - Composition for black matrix and method for producing black matrix using the same - Google Patents
Composition for black matrix and method for producing black matrix using the sameInfo
- Publication number
- SG11201810063SA SG11201810063SA SG11201810063SA SG11201810063SA SG11201810063SA SG 11201810063S A SG11201810063S A SG 11201810063SA SG 11201810063S A SG11201810063S A SG 11201810063SA SG 11201810063S A SG11201810063S A SG 11201810063SA SG 11201810063S A SG11201810063S A SG 11201810063SA
- Authority
- SG
- Singapore
- Prior art keywords
- black matrix
- international
- composition
- pct
- producing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2150/00—Compositions for coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Silicon Polymers (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016161164A JP2018028630A (ja) | 2016-08-19 | 2016-08-19 | ブラックマトリックス用組成物、およびそれを用いたブラックマトリックスの製造方法 |
PCT/EP2017/070708 WO2018033552A1 (en) | 2016-08-19 | 2017-08-16 | Composition for black matrix and method for producing black matrix using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201810063SA true SG11201810063SA (en) | 2019-03-28 |
Family
ID=59738307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201810063SA SG11201810063SA (en) | 2016-08-19 | 2017-08-16 | Composition for black matrix and method for producing black matrix using the same |
Country Status (7)
Country | Link |
---|---|
US (1) | US10719013B2 (ja) |
JP (2) | JP2018028630A (ja) |
KR (1) | KR102407313B1 (ja) |
CN (1) | CN109563372A (ja) |
SG (1) | SG11201810063SA (ja) |
TW (1) | TWI744376B (ja) |
WO (1) | WO2018033552A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3597694B1 (en) * | 2018-07-17 | 2023-10-11 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix |
WO2023032746A1 (ja) * | 2021-08-31 | 2023-03-09 | 富士フイルム株式会社 | 組成物、硬化膜、構造体、光学フィルタ、固体撮像素子、画像表示装置および硬化膜の製造方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0873800A (ja) | 1994-08-31 | 1996-03-19 | T & K Touka:Kk | 顔料分散組成物 |
JPH10204321A (ja) | 1997-01-24 | 1998-08-04 | Nippon Kayaku Co Ltd | 黒色顔料組成物、高抵抗黒色感放射線性樹脂組成物及びその硬化物 |
TW495494B (en) * | 1998-10-05 | 2002-07-21 | Tonengeneral Sekiyu Kk | Photosensitive polysilazane composition and method of forming patterned polysilazane film |
JP2000327980A (ja) | 1999-05-18 | 2000-11-28 | Jsr Corp | 硬化性インク、およびその使用方法、並びにその硬化方法 |
KR100638525B1 (ko) | 1999-11-15 | 2006-10-25 | 엘지.필립스 엘시디 주식회사 | 컬러 액정표시장치용 어레이기판 제조방법 |
JP2004292672A (ja) | 2003-03-27 | 2004-10-21 | Mikuni Color Ltd | カーボンブラック分散液 |
US20040260018A1 (en) * | 2003-04-10 | 2004-12-23 | Simendinger William H. | Thermal barrier composition |
JP2006350029A (ja) * | 2005-06-16 | 2006-12-28 | Sekisui Chem Co Ltd | ブラックレジスト組成物 |
JP2007211062A (ja) | 2006-02-07 | 2007-08-23 | Tokyo Ohka Kogyo Co Ltd | 着色シリカ系被膜形成用組成物 |
JP2008208342A (ja) | 2007-01-31 | 2008-09-11 | Toray Ind Inc | 樹脂組成物、硬化膜、および硬化膜を有するカラーフィルタ |
CN102245722B (zh) * | 2008-12-10 | 2014-12-10 | 陶氏康宁公司 | 可转换的抗反射涂层 |
JP5397152B2 (ja) | 2009-10-22 | 2014-01-22 | Jsr株式会社 | ポジ型感放射線性組成物、層間絶縁膜及びその形成方法 |
US9668745B2 (en) * | 2011-12-19 | 2017-06-06 | Depuy Ireland Unlimited Company | Anatomical concentric spheres THA |
TWI567498B (zh) * | 2012-04-06 | 2017-01-21 | Az電子材料盧森堡有限公司 | 負型感光性矽氧烷組成物 |
TWI459137B (zh) * | 2012-05-10 | 2014-11-01 | Chi Mei Corp | 彩色濾光片用感光性樹脂組成物及其應用 |
JP6466087B2 (ja) * | 2013-06-14 | 2019-02-06 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | 低温硬化可能なネガ型感光性組成物 |
TWI489213B (zh) * | 2013-10-22 | 2015-06-21 | Chi Mei Corp | 感光性樹脂組成物、彩色濾光片及其液晶顯示元件 |
US9964820B2 (en) | 2014-02-04 | 2018-05-08 | Apple Inc. | Displays with flipped panel structures |
EP3203320B9 (en) * | 2014-09-30 | 2020-05-06 | Toray Industries, Inc. | Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device |
KR101751411B1 (ko) * | 2016-02-19 | 2017-07-11 | 엘티씨 (주) | 폴리실세스퀴옥산 수지 조성물 및 이를 포함하는 차광용 블랙 레지스트 조성물 |
CN114460809A (zh) * | 2016-03-18 | 2022-05-10 | 东丽株式会社 | 负型感光性树脂组合物、固化膜、具备固化膜的显示装置、及其制造方法 |
JP7075209B2 (ja) * | 2016-12-28 | 2022-05-25 | 東京応化工業株式会社 | パターン形成方法及びポリシラン樹脂前駆体の製造方法 |
-
2016
- 2016-08-19 JP JP2016161164A patent/JP2018028630A/ja active Pending
-
2017
- 2017-08-16 SG SG11201810063SA patent/SG11201810063SA/en unknown
- 2017-08-16 US US16/325,937 patent/US10719013B2/en active Active
- 2017-08-16 WO PCT/EP2017/070708 patent/WO2018033552A1/en active Application Filing
- 2017-08-16 CN CN201780050058.9A patent/CN109563372A/zh active Pending
- 2017-08-16 JP JP2018560095A patent/JP7170543B2/ja active Active
- 2017-08-16 KR KR1020197007895A patent/KR102407313B1/ko active IP Right Grant
- 2017-08-18 TW TW106127933A patent/TWI744376B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2019526649A (ja) | 2019-09-19 |
JP7170543B2 (ja) | 2022-11-14 |
TWI744376B (zh) | 2021-11-01 |
KR102407313B1 (ko) | 2022-06-13 |
US20190204734A1 (en) | 2019-07-04 |
JP2018028630A (ja) | 2018-02-22 |
KR20190040984A (ko) | 2019-04-19 |
WO2018033552A1 (en) | 2018-02-22 |
TW201816011A (zh) | 2018-05-01 |
US10719013B2 (en) | 2020-07-21 |
CN109563372A (zh) | 2019-04-02 |
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