SG11201804810QA - Process for obtaining thick ordered films with increased periods comprising a block copolymer - Google Patents
Process for obtaining thick ordered films with increased periods comprising a block copolymerInfo
- Publication number
- SG11201804810QA SG11201804810QA SG11201804810QA SG11201804810QA SG11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA
- Authority
- SG
- Singapore
- Prior art keywords
- international
- obtaining thick
- block copolymer
- increased periods
- ordered films
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Graft Or Block Polymers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1562781A FR3045644A1 (fr) | 2015-12-18 | 2015-12-18 | Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs |
PCT/EP2016/081395 WO2017103082A1 (fr) | 2015-12-18 | 2016-12-16 | Procédé d'obtention de films ordonnés épais ayant des périodes accrues comprenant un copolymère à blocs |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201804810QA true SG11201804810QA (en) | 2018-07-30 |
Family
ID=55451378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201804810QA SG11201804810QA (en) | 2015-12-18 | 2016-12-16 | Process for obtaining thick ordered films with increased periods comprising a block copolymer |
Country Status (9)
Country | Link |
---|---|
US (1) | US20180364562A1 (fr) |
EP (1) | EP3391143A1 (fr) |
JP (1) | JP2019507199A (fr) |
KR (1) | KR20180095667A (fr) |
CN (1) | CN108369373A (fr) |
FR (1) | FR3045644A1 (fr) |
SG (1) | SG11201804810QA (fr) |
TW (1) | TWI658074B (fr) |
WO (1) | WO2017103082A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3045643A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs |
FR3045645B1 (fr) * | 2015-12-18 | 2019-07-05 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
FR3045642A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8193285B2 (en) * | 2006-05-16 | 2012-06-05 | Nippon Soda Co., Ltd. | Block copolymers |
US8398868B2 (en) * | 2009-05-19 | 2013-03-19 | International Business Machines Corporation | Directed self-assembly of block copolymers using segmented prepatterns |
JP2010283928A (ja) * | 2009-06-02 | 2010-12-16 | Kuraray Co Ltd | 高分子トランスデューサ |
US8349203B2 (en) * | 2009-09-04 | 2013-01-08 | International Business Machines Corporation | Method of forming self-assembled patterns using block copolymers, and articles thereof |
US8304493B2 (en) * | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
US9580534B2 (en) * | 2011-07-29 | 2017-02-28 | Wisconsin Alumni Research Foundation | Block copolymer materials for directed assembly of thin films |
FR2983773B1 (fr) * | 2011-12-09 | 2014-10-24 | Arkema France | Procede de preparation de surfaces |
JP5894445B2 (ja) * | 2012-01-23 | 2016-03-30 | 東京エレクトロン株式会社 | エッチング方法及びエッチング装置 |
US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
US9005877B2 (en) * | 2012-05-15 | 2015-04-14 | Tokyo Electron Limited | Method of forming patterns using block copolymers and articles thereof |
US9012545B2 (en) * | 2012-08-31 | 2015-04-21 | Rohm And Haas Electronic Materials Llc | Composition and method for preparing pattern on a substrate |
CN104918984A (zh) * | 2012-10-31 | 2015-09-16 | 陶氏环球技术有限责任公司 | 共聚物与介电材料的纳米复合物 |
FR3008413B1 (fr) * | 2013-07-11 | 2015-08-07 | Arkema France | Procede d'orientation perpendiculaire de nanodomaines de copolymeres a blocs par l'utilisation de copolymeres statistiques ou a gradient dont les monomeres sont au moins en partie differents de ceux presents respectivement dans chacun des blocs du copolymere a blocs |
FR3008986B1 (fr) * | 2013-07-25 | 2016-12-30 | Arkema France | Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs |
FR3014877B1 (fr) * | 2013-12-17 | 2017-03-31 | Arkema France | Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
WO2015109224A1 (fr) * | 2014-01-16 | 2015-07-23 | Brewer Science Inc. | Copolymères à blocs à haut paramètre d'interaction de flory-huggins pour auto-assemblage guidé |
FR3022249B1 (fr) * | 2014-06-11 | 2018-01-19 | Arkema France | Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
FR3045642A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs |
FR3045645B1 (fr) * | 2015-12-18 | 2019-07-05 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
FR3045643A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs |
-
2015
- 2015-12-18 FR FR1562781A patent/FR3045644A1/fr active Pending
-
2016
- 2016-12-16 SG SG11201804810QA patent/SG11201804810QA/en unknown
- 2016-12-16 KR KR1020187020582A patent/KR20180095667A/ko not_active Application Discontinuation
- 2016-12-16 US US16/062,513 patent/US20180364562A1/en not_active Abandoned
- 2016-12-16 CN CN201680073926.0A patent/CN108369373A/zh active Pending
- 2016-12-16 EP EP16822939.1A patent/EP3391143A1/fr not_active Withdrawn
- 2016-12-16 JP JP2018530688A patent/JP2019507199A/ja active Pending
- 2016-12-16 TW TW105141870A patent/TWI658074B/zh not_active IP Right Cessation
- 2016-12-16 WO PCT/EP2016/081395 patent/WO2017103082A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
TWI658074B (zh) | 2019-05-01 |
WO2017103082A1 (fr) | 2017-06-22 |
FR3045644A1 (fr) | 2017-06-23 |
CN108369373A (zh) | 2018-08-03 |
KR20180095667A (ko) | 2018-08-27 |
TW201734102A (zh) | 2017-10-01 |
JP2019507199A (ja) | 2019-03-14 |
US20180364562A1 (en) | 2018-12-20 |
EP3391143A1 (fr) | 2018-10-24 |
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