SG11201804810QA - Process for obtaining thick ordered films with increased periods comprising a block copolymer - Google Patents

Process for obtaining thick ordered films with increased periods comprising a block copolymer

Info

Publication number
SG11201804810QA
SG11201804810QA SG11201804810QA SG11201804810QA SG11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA SG 11201804810Q A SG11201804810Q A SG 11201804810QA
Authority
SG
Singapore
Prior art keywords
international
obtaining thick
block copolymer
increased periods
ordered films
Prior art date
Application number
SG11201804810QA
Inventor
Christophe Navarro
Celia Nicolet
Xavier Chevalier
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11201804810QA publication Critical patent/SG11201804810QA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property -' Organization International Bureau res., 00) (43) International Publication Date .... .....r ,„„01 22 June 2017(22.06.2017) WIPO I PCT ID Hit (10) WO 1111111111111111111111111111 International III 2017/103082 III III Publication IIIIIIIIIIIIIIIIIII Number Al RIIIIIIIIIIIIIII (51) International Patent Classification: AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, GO3F 7/00 (2006.01) C08L 53/00 (2006.01) BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, (21) International Application Number: HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, PCT/EP2016/081395 KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, (22) International Filing Date: MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, 16 December 2016 (16.12.2016) NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, (25) Filing Language: English TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, (26) Publication Language: English ZA, ZM, ZW. (30) Priority Data: (84) Designated States (unless otherwise indicated, for every 15.62781 18 December 2015 (18.12.2015) FR kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, (71) Applicant: ARKEMA FRANCE [FR/FR]; 420 rue d'Es- TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, tienne d'Orves, 92700 Colombes (FR). TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, (72) Inventors: NAVARRO, Christophe; 15 allee de Segure, 64100 Bayonne (FR). NICOLET, Celia; 4, Chemin du LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, Petit Pre, 64230 Sauvagnon (FR) CHEVALIER, Xavier; SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, 1, Boulevard Joseph Vallier, 38100 Grenoble (FR). GW, KM, ML, MR, NE, SN, TD, TG). (74) Agent: LE CROM, Christophe; 420, me d'Estienne Published: d'Orves, 92705 Colombes Cedex (FR). — with international search report (Art 21(3)) (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, 1-1 .4t ei cc O o en (54) Title: PROCESS FOR OBTAINING THICK ORDERED FILMS WITH INCREASED PERIODS COMPRISING A BLOCK - COPOLYMER L .-- (57) : Process for obtaining thick ordered films with increased periods comprising a block copolymer The present invention ::::, relates to a process for obtaining thick ordered films (typically > 20nm) with increased periods (typically > 1 Onm) on a nanometric ei scale of a composition comprising a block copolymer (BCP) deposited on a surface without degradation of the other critical structur- 0 ing parameters (kinetics, structuring defects, critical dimension uniformity), this being whatever the orientation (perpendicular to the ,1 . substrate, parallel to the substrate, etc.); this composition having a product x effective*N (with x effective = Flory-Huggins parameter between two blocks under consideration, and N the total degree of polymerization of these two blocks)of between 0.5 and 40.
SG11201804810QA 2015-12-18 2016-12-16 Process for obtaining thick ordered films with increased periods comprising a block copolymer SG11201804810QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1562781A FR3045644A1 (en) 2015-12-18 2015-12-18 PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER
PCT/EP2016/081395 WO2017103082A1 (en) 2015-12-18 2016-12-16 Process for obtaining thick ordered films with increased periods comprising a block copolymer

Publications (1)

Publication Number Publication Date
SG11201804810QA true SG11201804810QA (en) 2018-07-30

Family

ID=55451378

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201804810QA SG11201804810QA (en) 2015-12-18 2016-12-16 Process for obtaining thick ordered films with increased periods comprising a block copolymer

Country Status (9)

Country Link
US (1) US20180364562A1 (en)
EP (1) EP3391143A1 (en)
JP (1) JP2019507199A (en)
KR (1) KR20180095667A (en)
CN (1) CN108369373A (en)
FR (1) FR3045644A1 (en)
SG (1) SG11201804810QA (en)
TW (1) TWI658074B (en)
WO (1) WO2017103082A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3045645B1 (en) * 2015-12-18 2019-07-05 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM
FR3045642A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS
FR3045643A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8193285B2 (en) * 2006-05-16 2012-06-05 Nippon Soda Co., Ltd. Block copolymers
US8398868B2 (en) * 2009-05-19 2013-03-19 International Business Machines Corporation Directed self-assembly of block copolymers using segmented prepatterns
JP2010283928A (en) * 2009-06-02 2010-12-16 Kuraray Co Ltd Polymer transducer
US8349203B2 (en) * 2009-09-04 2013-01-08 International Business Machines Corporation Method of forming self-assembled patterns using block copolymers, and articles thereof
US8304493B2 (en) * 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers
US9580534B2 (en) * 2011-07-29 2017-02-28 Wisconsin Alumni Research Foundation Block copolymer materials for directed assembly of thin films
FR2983773B1 (en) * 2011-12-09 2014-10-24 Arkema France PROCESS FOR PREPARING SURFACES
JP5894445B2 (en) * 2012-01-23 2016-03-30 東京エレクトロン株式会社 Etching method and etching apparatus
US8513356B1 (en) * 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US9005877B2 (en) * 2012-05-15 2015-04-14 Tokyo Electron Limited Method of forming patterns using block copolymers and articles thereof
US9012545B2 (en) * 2012-08-31 2015-04-21 Rohm And Haas Electronic Materials Llc Composition and method for preparing pattern on a substrate
CN104918984A (en) * 2012-10-31 2015-09-16 陶氏环球技术有限责任公司 Nanocomposites of copolymers and dielectric materials
FR3008413B1 (en) * 2013-07-11 2015-08-07 Arkema France PROCESS FOR PERPENDICULAR ORIENTATION OF NANODOMAINES OF BLOCK COPOLYMERS USING STATISTICAL OR GRADIENT COPOLYMERS WHERE THE MONOMERS ARE AT LEAST DIFFERENT FROM THOSE PRESENT SPECIFICALLY IN EACH BLOCK OF BLOCK COPOLYMER
FR3008986B1 (en) * 2013-07-25 2016-12-30 Arkema France METHOD OF CONTROLLING THE PERIOD CHARACTERIZING THE MORPHOLOGY OBTAINED FROM A MIXTURE OF BLOCK COPOLYMER AND (CO) POLYMER FROM ONE OF THE BLOCKS
FR3014877B1 (en) * 2013-12-17 2017-03-31 Arkema France METHOD FOR NANOSTRUCTURING A BLOCK COPOLYMER FILM FROM A NON-STRUCTURED BLOCK COPOLYMER BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM
KR102364329B1 (en) * 2014-01-16 2022-02-17 브레우어 사이언스, 인코포레이션 High-chi block copolymers for directed self-assembly
FR3022249B1 (en) * 2014-06-11 2018-01-19 Arkema France METHOD FOR CONTROLLING THE PERIOD OF A NANOSTRUCTUE BLOCK COPOLYMER FILM BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM
FR3045642A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS
FR3045645B1 (en) * 2015-12-18 2019-07-05 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM
FR3045643A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS

Also Published As

Publication number Publication date
FR3045644A1 (en) 2017-06-23
JP2019507199A (en) 2019-03-14
EP3391143A1 (en) 2018-10-24
TW201734102A (en) 2017-10-01
US20180364562A1 (en) 2018-12-20
WO2017103082A1 (en) 2017-06-22
TWI658074B (en) 2019-05-01
CN108369373A (en) 2018-08-03
KR20180095667A (en) 2018-08-27

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