SG11201703882RA - Uv curable cmp polishing pad and method of manufacture - Google Patents
Uv curable cmp polishing pad and method of manufactureInfo
- Publication number
- SG11201703882RA SG11201703882RA SG11201703882RA SG11201703882RA SG11201703882RA SG 11201703882R A SG11201703882R A SG 11201703882RA SG 11201703882R A SG11201703882R A SG 11201703882RA SG 11201703882R A SG11201703882R A SG 11201703882RA SG 11201703882R A SG11201703882R A SG 11201703882RA
- Authority
- SG
- Singapore
- Prior art keywords
- curable
- manufacture
- polishing pad
- cmp polishing
- cmp
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/001—Manufacture of flexible abrasive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
- B24D3/32—Resins or natural or synthetic macromolecular compounds for porous or cellular structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0822—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using IR radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Toxicology (AREA)
- Thermal Sciences (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/575,608 US10086500B2 (en) | 2014-12-18 | 2014-12-18 | Method of manufacturing a UV curable CMP polishing pad |
PCT/US2015/061647 WO2016099791A1 (en) | 2014-12-18 | 2015-11-19 | Uv curable cmp polishing pad and method of manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201703882RA true SG11201703882RA (en) | 2017-07-28 |
Family
ID=56127289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201703882RA SG11201703882RA (en) | 2014-12-18 | 2015-11-19 | Uv curable cmp polishing pad and method of manufacture |
Country Status (7)
Country | Link |
---|---|
US (2) | US10086500B2 (en) |
JP (1) | JP6676640B2 (en) |
KR (1) | KR102438955B1 (en) |
CN (1) | CN107000170B (en) |
SG (1) | SG11201703882RA (en) |
TW (1) | TWI675869B (en) |
WO (1) | WO2016099791A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
KR102630261B1 (en) | 2014-10-17 | 2024-01-29 | 어플라이드 머티어리얼스, 인코포레이티드 | Cmp pad construction with composite material properties using additive manufacturing processes |
US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
JP6940495B2 (en) | 2015-10-30 | 2021-09-29 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Equipment and methods for forming abrasive articles with the desired zeta potential |
US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
CN113146464A (en) | 2016-01-19 | 2021-07-23 | 应用材料公司 | Porous chemical mechanical polishing pad |
US11137243B2 (en) | 2016-09-20 | 2021-10-05 | Applied Materials, Inc. | Two step curing of polishing pad material in additive manufacturing |
KR101857435B1 (en) * | 2016-12-15 | 2018-05-15 | 한국생산기술연구원 | Surface plate having porous structure and method for manufacturing the same |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
US11072050B2 (en) | 2017-08-04 | 2021-07-27 | Applied Materials, Inc. | Polishing pad with window and manufacturing methods thereof |
WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | Abrasive delivery polishing pads and manufacturing methods thereof |
WO2020050932A1 (en) | 2018-09-04 | 2020-03-12 | Applied Materials, Inc. | Formulations for advanced polishing pads |
CN114502324B (en) * | 2019-08-21 | 2024-05-03 | 应用材料公司 | Additive manufacturing of polishing pads |
US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
KR102636521B1 (en) * | 2020-07-16 | 2024-02-15 | 한국생산기술연구원 | Chemical-mechanical polishing pad including porous protruding pattern and method for preparing the same |
KR102570825B1 (en) * | 2020-07-16 | 2023-08-28 | 한국생산기술연구원 | Polishing pad including porous protruding pattern and polishing apparatus including the same |
US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
CN115319649B (en) * | 2022-09-03 | 2023-08-04 | 深圳市永霖科技有限公司 | PU polishing sand paper for glass polishing and preparation method thereof |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5378251A (en) * | 1991-02-06 | 1995-01-03 | Minnesota Mining And Manufacturing Company | Abrasive articles and methods of making and using same |
CA2113318A1 (en) | 1993-01-28 | 1994-07-29 | Robert J. Jantschek | Abrasive attachment system for rotative abrading applications |
ZA9410384B (en) * | 1994-04-08 | 1996-02-01 | Ultimate Abrasive Syst Inc | Method for making powder preform and abrasive articles made therefrom |
JP2002057130A (en) * | 2000-08-14 | 2002-02-22 | Three M Innovative Properties Co | Polishing pad for cmp |
KR100394572B1 (en) | 2000-12-28 | 2003-08-14 | 삼성전자주식회사 | multi characterized CMP pad structure and method for fabricating same |
US6863774B2 (en) | 2001-03-08 | 2005-03-08 | Raytech Innovative Solutions, Inc. | Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same |
JP2004259728A (en) * | 2003-02-24 | 2004-09-16 | Toray Ind Inc | Polishing pad |
JP3769581B1 (en) | 2005-05-18 | 2006-04-26 | 東洋ゴム工業株式会社 | Polishing pad and manufacturing method thereof |
US7261625B2 (en) * | 2005-02-07 | 2007-08-28 | Inoac Corporation | Polishing pad |
TWI410314B (en) | 2005-04-06 | 2013-10-01 | 羅門哈斯電子材料Cmp控股公司 | Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad |
US7169031B1 (en) | 2005-07-28 | 2007-01-30 | 3M Innovative Properties Company | Self-contained conditioning abrasive article |
US7494519B2 (en) * | 2005-07-28 | 2009-02-24 | 3M Innovative Properties Company | Abrasive agglomerate polishing method |
JP2007067143A (en) * | 2005-08-31 | 2007-03-15 | Asahi Kasei Electronics Co Ltd | Photosensitive resin composition for polishing pad |
CN101966697B (en) * | 2006-04-19 | 2015-04-22 | 东洋橡胶工业株式会社 | Manufacturing method of polishing pad |
US20080146129A1 (en) * | 2006-12-08 | 2008-06-19 | Makoto Kouzuma | Fast break-in polishing pad and a method of making the same |
CN101284952B (en) * | 2007-04-12 | 2011-03-23 | 北京有色金属研究总院 | Abrasive grain CeO2 for chemical and mechanical buffing and method for preparing same |
JP5242427B2 (en) | 2009-01-20 | 2013-07-24 | 東洋ゴム工業株式会社 | Polishing pad and manufacturing method thereof |
WO2011087737A2 (en) * | 2009-12-22 | 2011-07-21 | 3M Innovative Properties Company | Polishing pad and method of making the same |
US9156124B2 (en) * | 2010-07-08 | 2015-10-13 | Nexplanar Corporation | Soft polishing pad for polishing a semiconductor substrate |
JPWO2013039203A1 (en) * | 2011-09-16 | 2015-03-26 | 東レ株式会社 | Polishing pad |
US9597769B2 (en) * | 2012-06-04 | 2017-03-21 | Nexplanar Corporation | Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer |
-
2014
- 2014-12-18 US US14/575,608 patent/US10086500B2/en active Active
-
2015
- 2015-11-19 KR KR1020177016274A patent/KR102438955B1/en active IP Right Grant
- 2015-11-19 SG SG11201703882RA patent/SG11201703882RA/en unknown
- 2015-11-19 CN CN201580066123.8A patent/CN107000170B/en active Active
- 2015-11-19 WO PCT/US2015/061647 patent/WO2016099791A1/en active Application Filing
- 2015-11-19 JP JP2017532780A patent/JP6676640B2/en active Active
- 2015-12-03 TW TW104140525A patent/TWI675869B/en active
-
2018
- 2018-09-13 US US16/130,939 patent/US20190009388A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20160176021A1 (en) | 2016-06-23 |
US10086500B2 (en) | 2018-10-02 |
TW201629128A (en) | 2016-08-16 |
JP2018502452A (en) | 2018-01-25 |
KR20170096113A (en) | 2017-08-23 |
WO2016099791A1 (en) | 2016-06-23 |
KR102438955B1 (en) | 2022-09-02 |
TWI675869B (en) | 2019-11-01 |
US20190009388A1 (en) | 2019-01-10 |
JP6676640B2 (en) | 2020-04-08 |
CN107000170A (en) | 2017-08-01 |
CN107000170B (en) | 2021-09-24 |
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