SG11201703833UA - Abatement device - Google Patents
Abatement deviceInfo
- Publication number
- SG11201703833UA SG11201703833UA SG11201703833UA SG11201703833UA SG11201703833UA SG 11201703833U A SG11201703833U A SG 11201703833UA SG 11201703833U A SG11201703833U A SG 11201703833UA SG 11201703833U A SG11201703833U A SG 11201703833UA SG 11201703833U A SG11201703833U A SG 11201703833UA
- Authority
- SG
- Singapore
- Prior art keywords
- abatement device
- abatement
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/96—Regeneration, reactivation or recycling of reactants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/38—Removing components of undefined structure
- B01D53/40—Acidic components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D21/00—Separation of suspended solid particles from liquids by sedimentation
- B01D21/26—Separation of sediment aided by centrifugal force or centripetal force
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D21/00—Separation of suspended solid particles from liquids by sedimentation
- B01D21/26—Separation of sediment aided by centrifugal force or centripetal force
- B01D21/267—Separation of sediment aided by centrifugal force or centripetal force by using a cyclone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/14—Packed scrubbers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2252/00—Absorbents, i.e. solvents and liquid materials for gas absorption
- B01D2252/10—Inorganic absorbents
- B01D2252/103—Water
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
- B01D2257/2047—Hydrofluoric acid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/55—Compounds of silicon, phosphorus, germanium or arsenic
- B01D2257/553—Compounds comprising hydrogen, e.g. silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/346—Controlling the process
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Analytical Chemistry (AREA)
- Biomedical Technology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014231944A JP6370684B2 (ja) | 2014-11-14 | 2014-11-14 | 除害装置 |
PCT/JP2015/081146 WO2016076190A1 (ja) | 2014-11-14 | 2015-11-05 | 除害装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201703833UA true SG11201703833UA (en) | 2017-06-29 |
Family
ID=55954279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201703833UA SG11201703833UA (en) | 2014-11-14 | 2015-11-05 | Abatement device |
Country Status (7)
Country | Link |
---|---|
US (1) | US10618004B2 (de) |
EP (1) | EP3219380B1 (de) |
JP (1) | JP6370684B2 (de) |
KR (1) | KR102406433B1 (de) |
CN (1) | CN107106976B (de) |
SG (1) | SG11201703833UA (de) |
WO (1) | WO2016076190A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7021237B2 (ja) * | 2017-02-09 | 2022-02-16 | アプライド マテリアルズ インコーポレイテッド | 水蒸気および酸素の反応物を利用するプラズマ軽減技術 |
GB2604652A (en) * | 2021-03-12 | 2022-09-14 | Edwards Ltd | Abatement apparatus |
CN114100352B (zh) * | 2021-10-19 | 2024-02-02 | 安徽京仪自动化装备技术有限公司 | 一种废气洗涤处理系统及控制方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1417064A (en) * | 1921-02-25 | 1922-05-23 | Charles H Holmgren | Centrifugal separator |
GB9224594D0 (en) * | 1991-12-10 | 1993-01-13 | Ici Plc | Water separation process |
US6986874B2 (en) | 2000-12-14 | 2006-01-17 | The Boc Group, Inc. | Method and apparatus for the production of nitrogen trifluoride |
KR100521398B1 (ko) * | 2003-12-30 | 2005-10-12 | 손복남 | 산성가스를 처리하기 위한 스크러버 시스템 |
JP2005334729A (ja) * | 2004-05-25 | 2005-12-08 | Canon Inc | ガス処理方法 |
ITMI20041677A1 (it) * | 2004-08-30 | 2004-11-30 | E T C Epitaxial Technology Ct | Processo di pulitura e processo operativo per un reattore cvd. |
DE102004044592A1 (de) | 2004-09-13 | 2006-03-30 | Basf Ag | Verfahren zur Trennung von Chlorwasserstoff und Phosgen |
JP4394555B2 (ja) * | 2004-09-30 | 2010-01-06 | 株式会社日立製作所 | フッ素化合物含有ガスの処理方法及び処理装置 |
JP4434933B2 (ja) * | 2004-12-03 | 2010-03-17 | 株式会社荏原製作所 | 排ガスの処理方法及び処理装置 |
JP4576312B2 (ja) | 2005-10-03 | 2010-11-04 | 東北電力株式会社 | 四フッ化ケイ素の製造方法、及びそれに用いる製造装置 |
US7718151B1 (en) * | 2006-04-07 | 2010-05-18 | Liang Hu | Methods and systems for deacidizing gaseous mixtures |
GB0624931D0 (en) * | 2006-12-14 | 2007-01-24 | Boc Group Plc | Method of treating a gas stream |
JP2009018290A (ja) * | 2007-07-13 | 2009-01-29 | Ebara Corp | 排ガス洗浄装置 |
US20110020187A1 (en) | 2008-03-06 | 2011-01-27 | Toyo Tanso Co., Ltd. | Surface treatment apparatus |
JP5554482B2 (ja) * | 2008-09-08 | 2014-07-23 | 大陽日酸株式会社 | 排ガス処理方法 |
WO2010034791A1 (de) * | 2008-09-26 | 2010-04-01 | Siemens Vai Metals Technologies Gmbh & Co | Verfahren und vorrichtung zur trockenen entstaubung und reinigung von bei der eisenerzeugung oder kohlevergasung produziertem gas |
US20100126349A1 (en) * | 2008-11-26 | 2010-05-27 | Applied Materials, Inc. | Reduced temperature scrubbing of effluent gas |
CA2750562C (en) | 2009-01-27 | 2017-08-15 | Schlumberger Norge As | Methods for granular scavenger material transfer |
DK2539281T3 (da) | 2010-02-25 | 2016-04-18 | Alfa Laval Corp Ab | Rensningsudstyr til udstødningsgas og gas-scrubber-fluid og fremgangsmåde |
US8642252B2 (en) | 2010-03-10 | 2014-02-04 | International Business Machines Corporation | Methods for fabrication of an air gap-containing interconnect structure |
WO2011162023A1 (ja) * | 2010-06-21 | 2011-12-29 | エドワーズ株式会社 | ガス処理システム |
US8937186B2 (en) * | 2012-08-21 | 2015-01-20 | Uop Llc | Acids removal and methane conversion process using a supersonic flow reactor |
JP5941028B2 (ja) * | 2012-11-15 | 2016-06-29 | オー・ジー株式会社 | Si含有フッ酸系廃液からSiを除去する方法及びSi含有フッ酸系混酸廃液からフッ酸を回収する方法 |
-
2014
- 2014-11-14 JP JP2014231944A patent/JP6370684B2/ja active Active
-
2015
- 2015-11-05 US US15/523,787 patent/US10618004B2/en active Active
- 2015-11-05 EP EP15858179.3A patent/EP3219380B1/de active Active
- 2015-11-05 SG SG11201703833UA patent/SG11201703833UA/en unknown
- 2015-11-05 KR KR1020177010912A patent/KR102406433B1/ko active IP Right Grant
- 2015-11-05 WO PCT/JP2015/081146 patent/WO2016076190A1/ja active Application Filing
- 2015-11-05 CN CN201580059249.2A patent/CN107106976B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR102406433B1 (ko) | 2022-06-08 |
EP3219380B1 (de) | 2020-10-21 |
EP3219380A1 (de) | 2017-09-20 |
CN107106976B (zh) | 2020-09-25 |
EP3219380A4 (de) | 2018-06-06 |
US20180015413A1 (en) | 2018-01-18 |
KR20170083538A (ko) | 2017-07-18 |
WO2016076190A1 (ja) | 2016-05-19 |
JP2016093792A (ja) | 2016-05-26 |
CN107106976A (zh) | 2017-08-29 |
US10618004B2 (en) | 2020-04-14 |
JP6370684B2 (ja) | 2018-08-08 |
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