SG11201609653SA - Process for producing organic-inorganic laminates - Google Patents
Process for producing organic-inorganic laminatesInfo
- Publication number
- SG11201609653SA SG11201609653SA SG11201609653SA SG11201609653SA SG11201609653SA SG 11201609653S A SG11201609653S A SG 11201609653SA SG 11201609653S A SG11201609653S A SG 11201609653SA SG 11201609653S A SG11201609653S A SG 11201609653SA SG 11201609653S A SG11201609653S A SG 11201609653SA
- Authority
- SG
- Singapore
- Prior art keywords
- producing organic
- inorganic laminates
- laminates
- inorganic
- organic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
- C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP14172353 | 2014-06-13 | ||
| PCT/EP2015/060049 WO2015188990A2 (en) | 2014-06-13 | 2015-05-07 | Process for producing organic-inorganic laminates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201609653SA true SG11201609653SA (en) | 2016-12-29 |
Family
ID=51059264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201609653SA SG11201609653SA (en) | 2014-06-13 | 2015-05-07 | Process for producing organic-inorganic laminates |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US11639549B2 (pt) |
| EP (1) | EP3155142B1 (pt) |
| JP (1) | JP6688288B2 (pt) |
| KR (1) | KR102459808B1 (pt) |
| CN (1) | CN106460171B (pt) |
| BR (1) | BR112016028242B1 (pt) |
| CA (1) | CA2949398C (pt) |
| MX (1) | MX2016016452A (pt) |
| RU (1) | RU2694031C2 (pt) |
| SG (1) | SG11201609653SA (pt) |
| TW (1) | TWI711715B (pt) |
| WO (1) | WO2015188990A2 (pt) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10988844B2 (en) | 2015-01-20 | 2021-04-27 | Basf Coatings Gmbh | Process for producing flexible organic-inorganic laminates |
| MX2017012134A (es) | 2015-03-25 | 2018-02-09 | Basf Coatings Gmbh | Procedimiento para la produccion de laminados organicos e inorganicos flexibles. |
| CN110433329B (zh) * | 2019-08-28 | 2022-03-01 | 珠海乔丹科技股份有限公司 | 一种高强度、低弹性模量、无毒性钛铌锆合金牙科种植体 |
| KR20240004863A (ko) | 2021-05-06 | 2024-01-11 | 바스프 코팅스 게엠베하 | 다층 배리어 필름, 그의 제조 및 광기전 적용 분야에서의 용도 |
| JP2023003828A (ja) * | 2021-06-24 | 2023-01-17 | 東京エレクトロン株式会社 | 成膜装置及び成膜方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030203210A1 (en) * | 2002-04-30 | 2003-10-30 | Vitex Systems, Inc. | Barrier coatings and methods of making same |
| US20050214556A1 (en) * | 2004-02-20 | 2005-09-29 | Fuji Photo Film Co., Ltd | Organic-inorganic composite composition, plastic substrate, gas barrier laminate film, and image display device |
| KR100600051B1 (ko) * | 2005-02-22 | 2006-07-13 | 주식회사 하이닉스반도체 | 원자층 증착 장비 및 그를 이용한 3원계 박막 형성 방법 |
| WO2008083304A2 (en) * | 2006-12-29 | 2008-07-10 | 3M Innovative Properties Company | Method of making inorganic or inorganic/organic hybrid films |
| US8101288B2 (en) * | 2007-06-11 | 2012-01-24 | Fujifilm Corporation | Gas barrier film and organic device using the same |
| US9660205B2 (en) * | 2007-06-22 | 2017-05-23 | Regents Of The University Of Colorado | Protective coatings for organic electronic devices made using atomic layer deposition and molecular layer deposition techniques |
| US7858144B2 (en) * | 2007-09-26 | 2010-12-28 | Eastman Kodak Company | Process for depositing organic materials |
| US8133555B2 (en) * | 2008-10-14 | 2012-03-13 | Asm Japan K.K. | Method for forming metal film by ALD using beta-diketone metal complex |
| KR20110027487A (ko) * | 2009-09-10 | 2011-03-16 | 삼성전자주식회사 | 금속 패턴 형성용 조성물 및 이를 이용한 금속 패턴 형성방법 |
| US20110076421A1 (en) * | 2009-09-30 | 2011-03-31 | Synos Technology, Inc. | Vapor deposition reactor for forming thin film on curved surface |
| EP2360293A1 (en) * | 2010-02-11 | 2011-08-24 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Method and apparatus for depositing atomic layers on a substrate |
| EP2441860A1 (en) | 2010-10-13 | 2012-04-18 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Apparatus and method for atomic layer deposition on a surface |
| EP2481832A1 (en) * | 2011-01-31 | 2012-08-01 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Apparatus for atomic layer deposition |
| US20140106151A1 (en) * | 2011-06-27 | 2014-04-17 | Konica Minolta , Inc. | Gas barrier film, manufacturing method for gas barrier film, and electronic device |
| CN103732393B (zh) * | 2011-07-28 | 2016-10-05 | 凸版印刷株式会社 | 层叠体、阻气膜、层叠体的制造方法及层叠体制造装置 |
| EP2557198A1 (en) * | 2011-08-10 | 2013-02-13 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Method and apparatus for depositing atomic layers on a substrate |
| US20130337259A1 (en) * | 2012-06-14 | 2013-12-19 | E I Du Pont De Nemours And Company | Gas permeation barrier material |
| JP5708602B2 (ja) * | 2012-09-20 | 2015-04-30 | 株式会社デンソー | 有機ｅｌ表示装置及びその製造方法 |
| CN104134756A (zh) * | 2013-04-30 | 2014-11-05 | 成均馆大学校产学协力团 | 多层封装薄膜 |
| SG11201508014WA (en) * | 2013-05-02 | 2015-10-29 | Tera Barrier Films Pte Ltd | Encapsulation barrier stack comprising dendrimer encapsulated nanop articles |
| US9464353B2 (en) * | 2013-11-21 | 2016-10-11 | Wonik Ips Co., Ltd. | Substrate processing apparatus |
| EP3155141B1 (en) * | 2014-06-12 | 2021-04-21 | BASF Coatings GmbH | Process for producing flexible organic-inorganic laminates |
-
2015
- 2015-05-07 KR KR1020167034417A patent/KR102459808B1/ko active IP Right Grant
- 2015-05-07 MX MX2016016452A patent/MX2016016452A/es unknown
- 2015-05-07 JP JP2017517186A patent/JP6688288B2/ja active Active
- 2015-05-07 BR BR112016028242-6A patent/BR112016028242B1/pt active IP Right Grant
- 2015-05-07 SG SG11201609653SA patent/SG11201609653SA/en unknown
- 2015-05-07 US US15/317,594 patent/US11639549B2/en active Active
- 2015-05-07 CA CA2949398A patent/CA2949398C/en active Active
- 2015-05-07 CN CN201580030828.4A patent/CN106460171B/zh active Active
- 2015-05-07 EP EP15721225.9A patent/EP3155142B1/en active Active
- 2015-05-07 RU RU2017100977A patent/RU2694031C2/ru active
- 2015-05-07 WO PCT/EP2015/060049 patent/WO2015188990A2/en active Application Filing
- 2015-05-27 TW TW104117039A patent/TWI711715B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP3155142A2 (en) | 2017-04-19 |
| RU2017100977A3 (pt) | 2018-11-20 |
| RU2694031C2 (ru) | 2019-07-08 |
| CA2949398C (en) | 2022-07-19 |
| TW201610200A (zh) | 2016-03-16 |
| TWI711715B (zh) | 2020-12-01 |
| JP6688288B2 (ja) | 2020-04-28 |
| KR102459808B1 (ko) | 2022-10-28 |
| MX2016016452A (es) | 2017-05-08 |
| CA2949398A1 (en) | 2015-12-17 |
| WO2015188990A2 (en) | 2015-12-17 |
| US11639549B2 (en) | 2023-05-02 |
| JP2017517639A (ja) | 2017-06-29 |
| BR112016028242B1 (pt) | 2022-08-16 |
| KR20170020766A (ko) | 2017-02-24 |
| US20170121817A1 (en) | 2017-05-04 |
| CN106460171B (zh) | 2020-10-16 |
| BR112016028242A2 (pt) | 2017-08-22 |
| RU2017100977A (ru) | 2018-07-16 |
| WO2015188990A3 (en) | 2016-01-28 |
| CN106460171A (zh) | 2017-02-22 |
| EP3155142B1 (en) | 2021-04-21 |
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