SG11201606207WA - Method of optimizing a process window - Google Patents

Method of optimizing a process window

Info

Publication number
SG11201606207WA
SG11201606207WA SG11201606207WA SG11201606207WA SG11201606207WA SG 11201606207W A SG11201606207W A SG 11201606207WA SG 11201606207W A SG11201606207W A SG 11201606207WA SG 11201606207W A SG11201606207W A SG 11201606207WA SG 11201606207W A SG11201606207W A SG 11201606207WA
Authority
SG
Singapore
Prior art keywords
optimizing
process window
window
Prior art date
Application number
SG11201606207WA
Other languages
English (en)
Inventor
Stefan Hunsche
Venugopal Vellanki
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG11201606207WA publication Critical patent/SG11201606207WA/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/20—Design optimisation, verification or simulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
SG11201606207WA 2014-02-12 2015-01-07 Method of optimizing a process window SG11201606207WA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461939071P 2014-02-12 2014-02-12
US201461943834P 2014-02-24 2014-02-24
PCT/EP2015/050168 WO2015120996A1 (en) 2014-02-12 2015-01-07 Method of optimizing a process window

Publications (1)

Publication Number Publication Date
SG11201606207WA true SG11201606207WA (en) 2016-09-29

Family

ID=52302232

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201606207WA SG11201606207WA (en) 2014-02-12 2015-01-07 Method of optimizing a process window

Country Status (8)

Country Link
US (3) US9990451B2 (zh)
EP (1) EP3105636B1 (zh)
JP (2) JP6386569B2 (zh)
KR (4) KR102359050B1 (zh)
CN (2) CN105980934B (zh)
SG (1) SG11201606207WA (zh)
TW (2) TWI694487B (zh)
WO (1) WO2015120996A1 (zh)

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Also Published As

Publication number Publication date
KR20210014745A (ko) 2021-02-09
US20150227654A1 (en) 2015-08-13
KR20180136581A (ko) 2018-12-24
CN105980934B (zh) 2018-10-09
KR101939288B1 (ko) 2019-01-16
JP2018194847A (ja) 2018-12-06
KR20220019070A (ko) 2022-02-15
CN105980934A (zh) 2016-09-28
JP6641422B2 (ja) 2020-02-05
EP3105636A1 (en) 2016-12-21
JP6386569B2 (ja) 2018-09-05
TWI694487B (zh) 2020-05-21
CN109283800B (zh) 2021-01-01
EP3105636B1 (en) 2023-07-12
TW201834016A (zh) 2018-09-16
KR102427139B1 (ko) 2022-07-29
TWI628696B (zh) 2018-07-01
KR102211093B1 (ko) 2021-02-03
KR102359050B1 (ko) 2022-02-08
US20220147665A1 (en) 2022-05-12
WO2015120996A1 (en) 2015-08-20
JP2017505460A (ja) 2017-02-16
KR20160122217A (ko) 2016-10-21
CN109283800A (zh) 2019-01-29
TW201532124A (zh) 2015-08-16
US20180330030A1 (en) 2018-11-15
US9990451B2 (en) 2018-06-05
US11238189B2 (en) 2022-02-01

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