SG11201601091PA - Method and device for determining information relating to the mass of a semiconductor wafer - Google Patents

Method and device for determining information relating to the mass of a semiconductor wafer

Info

Publication number
SG11201601091PA
SG11201601091PA SG11201601091PA SG11201601091PA SG11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA
Authority
SG
Singapore
Prior art keywords
mass
semiconductor wafer
information relating
determining information
determining
Prior art date
Application number
SG11201601091PA
Other languages
English (en)
Inventor
Robert John Wilby
Adrian Kiermasz
Original Assignee
Metryx Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metryx Ltd filed Critical Metryx Ltd
Publication of SG11201601091PA publication Critical patent/SG11201601091PA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G19/00—Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • B06B1/0644—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element
    • B06B1/0648—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element of rectangular shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G17/00—Apparatus for or methods of weighing material of special form or property
    • G01G17/02—Apparatus for or methods of weighing material of special form or property for weighing material of filamentary or sheet form
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G3/00—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances
    • G01G3/12—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing
    • G01G3/16—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing measuring variations of frequency of oscillations of the body
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
    • G01H11/00—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties
    • G01H11/06—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties by electric means
    • G01H11/08—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties by electric means using piezoelectric devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG11201601091PA 2013-09-04 2014-08-21 Method and device for determining information relating to the mass of a semiconductor wafer SG11201601091PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB1315715.1A GB201315715D0 (en) 2013-09-04 2013-09-04 Method and device for determining information relating to the mass of a semiconductor wafer
PCT/GB2014/052573 WO2015033108A1 (en) 2013-09-04 2014-08-21 Method and device for determining information relating to the mass of a semiconductor wafer

Publications (1)

Publication Number Publication Date
SG11201601091PA true SG11201601091PA (en) 2016-03-30

Family

ID=49397261

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601091PA SG11201601091PA (en) 2013-09-04 2014-08-21 Method and device for determining information relating to the mass of a semiconductor wafer

Country Status (7)

Country Link
US (1) US9903750B2 (enrdf_load_stackoverflow)
EP (1) EP3042164B1 (enrdf_load_stackoverflow)
JP (1) JP6449889B2 (enrdf_load_stackoverflow)
GB (1) GB201315715D0 (enrdf_load_stackoverflow)
SG (1) SG11201601091PA (enrdf_load_stackoverflow)
TW (2) TWI688021B (enrdf_load_stackoverflow)
WO (1) WO2015033108A1 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201315715D0 (en) * 2013-09-04 2013-10-16 Metryx Ltd Method and device for determining information relating to the mass of a semiconductor wafer
GB201405926D0 (en) * 2014-04-02 2014-05-14 Metryx Ltd Semiconductor wafer weighing apparatus and methods
JP6953242B2 (ja) * 2017-09-06 2021-10-27 株式会社ディスコ 高さ検出装置、及びレーザー加工装置
GB201806377D0 (en) * 2018-04-19 2018-06-06 Metryx Ltd Semiconductor wafer mass metrology apparatus and semiconductor wafer mass metrology method
CN113029070B (zh) * 2019-12-25 2023-04-18 中国科学院微电子研究所 一种监测原子层沉积薄膜生长厚度的方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2601165C3 (de) * 1976-01-14 1979-06-28 Sartorius Gmbh, 3400 Goettingen Eichfähige, elektromagnetisch kompensierende Waage
JP2913962B2 (ja) 1991-11-27 1999-06-28 株式会社島津製作所 板状試料測定用天びん
JP2576338B2 (ja) * 1992-07-31 1997-01-29 株式会社島津製作所 ウエハ自動秤量システム
US5625170A (en) * 1994-01-18 1997-04-29 Nanometrics Incorporated Precision weighing to monitor the thickness and uniformity of deposited or etched thin film
JP3652021B2 (ja) 1996-07-23 2005-05-25 三洋機工株式会社 重量測定方法
JP4420646B2 (ja) 2003-10-09 2010-02-24 花王株式会社 荷重測定装置
US7256866B2 (en) * 2004-10-12 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804582B2 (en) * 2006-07-28 2010-09-28 Asml Netherlands B.V. Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method
GB0620196D0 (en) * 2006-10-11 2006-11-22 Metryx Ltd Measuring apparatus
GB0719460D0 (en) 2007-10-04 2007-11-14 Metryx Ltd Measurement apparatus and method
GB0719469D0 (en) * 2007-10-04 2007-11-14 Metryx Ltd Measurement apparatus and method
US7989714B2 (en) 2007-10-05 2011-08-02 Neopost Technologies High capacity and high resolution scale
GB0800227D0 (en) * 2008-01-07 2008-02-13 Metryx Ltd Method of controlling semiconductor device fabrication
JP2010129729A (ja) * 2008-11-27 2010-06-10 Kyocera Corp センサ保持用基板およびこれを用いたセンサ付き基板、センサ保持用基板の製造方法。
JP5289918B2 (ja) * 2008-12-10 2013-09-11 アンリツ産機システム株式会社 重量選別装置
US8691008B2 (en) * 2009-03-31 2014-04-08 Memc Electronic Materials, Inc. Systems for weighing a pulled object
JP2013088393A (ja) 2011-10-21 2013-05-13 Daihatsu Motor Co Ltd 重量差測定装置
EP2690415B2 (de) * 2012-07-23 2022-05-18 Mettler-Toledo GmbH Kraftmessvorrichtung mit Verschiebegewicht
GB201315715D0 (en) * 2013-09-04 2013-10-16 Metryx Ltd Method and device for determining information relating to the mass of a semiconductor wafer

Also Published As

Publication number Publication date
WO2015033108A1 (en) 2015-03-12
JP6449889B2 (ja) 2019-01-09
GB201315715D0 (en) 2013-10-16
TWI688021B (zh) 2020-03-11
JP2016537641A (ja) 2016-12-01
EP3042164A1 (en) 2016-07-13
TW201517195A (zh) 2015-05-01
US9903750B2 (en) 2018-02-27
EP3042164B1 (en) 2019-05-22
TW202021006A (zh) 2020-06-01
TWI728695B (zh) 2021-05-21
US20160195424A1 (en) 2016-07-07

Similar Documents

Publication Publication Date Title
ZA201600046B (en) Device and method for sensing mass airflow
TWI563614B (en) Methods of forming semiconductor packages
SG11201504442YA (en) Semiconductor device and method of making semiconductor device
SG10201406149PA (en) Semiconductor Device And Method For Manufacturing The Same
SG11201605303XA (en) Silicon wafer pre-alignment device and method therefor
SG11201505829VA (en) Semiconductor device and method for driving semiconductor device
SG10201604835TA (en) Semiconductor device inspection device and semiconductor device inspection method
SG11201601300TA (en) Adhesive film and method for manufacturing semiconductor device
EP2955748A4 (en) SEMICONDUCTOR COMPONENT AND METHOD FOR THE PRODUCTION THEREOF
SG11201509734YA (en) Semiconductor wafer protective film and method of manufacturing semiconductor device
SG11201508291QA (en) Semiconductor device and method for manufacturing semiconductor device
SG10201800413PA (en) Semiconductor device and method of forming embeddedwafer level chip scale packages
EP3021353A4 (en) Silicon-carbide semiconductor device and method for manufacturing silicon-carbide semiconductor device
SG11201510008UA (en) Semiconductor device and manufacturing method therefor
PL3038927T3 (pl) Sposób i urządzenie do wytwarzania opakowań zbiorczych
EP3046141A4 (en) EVALUATION DEVICE FOR OXIDE SEMICONDUCTOR THIN LAYER
TWI562316B (en) Semiconductor device and method for fabricating the same
EP2991108A4 (en) Semiconductor device and method of manufacture thereof
KR101470493B9 (ko) 다중 봉지층을 구비하는 반도체 장치 및 반도체 장치의 제조방법
EP2816594A4 (en) SEMICONDUCTOR COMPONENT AND MANUFACTURING METHOD THEREFOR
SG11201601091PA (en) Method and device for determining information relating to the mass of a semiconductor wafer
SG11201605213WA (en) Method for testing semiconductor wafers using temporary sacrificial bond pads
SG11201507884PA (en) Method of manufacturing semiconductor device
SG11201601727WA (en) Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
SG11201508204RA (en) Method of producing semiconductor device