SG11201601091PA - Method and device for determining information relating to the mass of a semiconductor wafer - Google Patents

Method and device for determining information relating to the mass of a semiconductor wafer

Info

Publication number
SG11201601091PA
SG11201601091PA SG11201601091PA SG11201601091PA SG11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA SG 11201601091P A SG11201601091P A SG 11201601091PA
Authority
SG
Singapore
Prior art keywords
mass
semiconductor wafer
information relating
determining information
determining
Prior art date
Application number
SG11201601091PA
Inventor
Robert John Wilby
Adrian Kiermasz
Original Assignee
Metryx Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metryx Ltd filed Critical Metryx Ltd
Publication of SG11201601091PA publication Critical patent/SG11201601091PA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01GWEIGHING
    • G01G19/00Weighing apparatus or methods adapted for special purposes not provided for in the preceding groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B06GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06BMETHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/06Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction
    • B06B1/0644Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element
    • B06B1/0648Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy operating with piezoelectric effect or with electrostriction using a single piezoelectric element of rectangular shape
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01GWEIGHING
    • G01G17/00Apparatus for or methods of weighing material of special form or property
    • G01G17/02Apparatus for or methods of weighing material of special form or property for weighing material of filamentary or sheet form
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01GWEIGHING
    • G01G3/00Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances
    • G01G3/12Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing
    • G01G3/16Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing measuring variations of frequency of oscillations of the body
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01HMEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
    • G01H11/00Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties
    • G01H11/06Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties by electric means
    • G01H11/08Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by detecting changes in electric or magnetic properties by electric means using piezoelectric devices
SG11201601091PA 2013-09-04 2014-08-21 Method and device for determining information relating to the mass of a semiconductor wafer SG11201601091PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB1315715.1A GB201315715D0 (en) 2013-09-04 2013-09-04 Method and device for determining information relating to the mass of a semiconductor wafer
PCT/GB2014/052573 WO2015033108A1 (en) 2013-09-04 2014-08-21 Method and device for determining information relating to the mass of a semiconductor wafer

Publications (1)

Publication Number Publication Date
SG11201601091PA true SG11201601091PA (en) 2016-03-30

Family

ID=49397261

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601091PA SG11201601091PA (en) 2013-09-04 2014-08-21 Method and device for determining information relating to the mass of a semiconductor wafer

Country Status (7)

Country Link
US (1) US9903750B2 (en)
EP (1) EP3042164B1 (en)
JP (1) JP6449889B2 (en)
GB (1) GB201315715D0 (en)
SG (1) SG11201601091PA (en)
TW (2) TWI728695B (en)
WO (1) WO2015033108A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201315715D0 (en) * 2013-09-04 2013-10-16 Metryx Ltd Method and device for determining information relating to the mass of a semiconductor wafer
GB201405926D0 (en) * 2014-04-02 2014-05-14 Metryx Ltd Semiconductor wafer weighing apparatus and methods
JP6953242B2 (en) * 2017-09-06 2021-10-27 株式会社ディスコ Height detector and laser machining equipment
CN113029070B (en) * 2019-12-25 2023-04-18 中国科学院微电子研究所 Method for monitoring growth thickness of atomic layer deposition film

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2601165C3 (en) * 1976-01-14 1979-06-28 Sartorius Gmbh, 3400 Goettingen Verifiable, electromagnetically compensating scale
JP2913962B2 (en) * 1991-11-27 1999-06-28 株式会社島津製作所 Balances for measuring plate samples
JP2576338B2 (en) * 1992-07-31 1997-01-29 株式会社島津製作所 Automatic wafer weighing system
US5625170A (en) 1994-01-18 1997-04-29 Nanometrics Incorporated Precision weighing to monitor the thickness and uniformity of deposited or etched thin film
JP3652021B2 (en) * 1996-07-23 2005-05-25 三洋機工株式会社 Weight measurement method
JP4420646B2 (en) * 2003-10-09 2010-02-24 花王株式会社 Load measuring device
US7256866B2 (en) * 2004-10-12 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804582B2 (en) * 2006-07-28 2010-09-28 Asml Netherlands B.V. Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method
GB0620196D0 (en) * 2006-10-11 2006-11-22 Metryx Ltd Measuring apparatus
GB0719469D0 (en) * 2007-10-04 2007-11-14 Metryx Ltd Measurement apparatus and method
GB0719460D0 (en) 2007-10-04 2007-11-14 Metryx Ltd Measurement apparatus and method
US7989714B2 (en) 2007-10-05 2011-08-02 Neopost Technologies High capacity and high resolution scale
GB0800227D0 (en) * 2008-01-07 2008-02-13 Metryx Ltd Method of controlling semiconductor device fabrication
JP2010129729A (en) * 2008-11-27 2010-06-10 Kyocera Corp Sensor-holding substrate and substrate with sensor using the same, and method of manufacturing sensor-holding substrate
JP5289918B2 (en) * 2008-12-10 2013-09-11 アンリツ産機システム株式会社 Weight sorter
US8347740B2 (en) * 2009-03-31 2013-01-08 Memc Electronic Materials, Inc. Systems for weighing a pulled object having a changing weight
JP2013088393A (en) * 2011-10-21 2013-05-13 Daihatsu Motor Co Ltd Weight difference measuring apparatus
EP2690415B2 (en) * 2012-07-23 2022-05-18 Mettler-Toledo GmbH Force measurement device with sliding weight
GB201315715D0 (en) * 2013-09-04 2013-10-16 Metryx Ltd Method and device for determining information relating to the mass of a semiconductor wafer

Also Published As

Publication number Publication date
TW201517195A (en) 2015-05-01
TWI688021B (en) 2020-03-11
GB201315715D0 (en) 2013-10-16
US9903750B2 (en) 2018-02-27
TW202021006A (en) 2020-06-01
JP6449889B2 (en) 2019-01-09
TWI728695B (en) 2021-05-21
JP2016537641A (en) 2016-12-01
EP3042164A1 (en) 2016-07-13
EP3042164B1 (en) 2019-05-22
US20160195424A1 (en) 2016-07-07
WO2015033108A1 (en) 2015-03-12

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