SG11201510759WA - Silicon nitride powder for mold release agent of casting mold for casting polycrystalline silicon ingot and method for manufacturing said silicon nitride powder, slurry containing said silicon nitride powder, casting mold for casting polycrystalline silicon ingot and method for manufacturing same, and method for manufacturing polycrystalline silicon ingot using said casting mold - Google Patents
Silicon nitride powder for mold release agent of casting mold for casting polycrystalline silicon ingot and method for manufacturing said silicon nitride powder, slurry containing said silicon nitride powder, casting mold for casting polycrystalline silicon ingot and method for manufacturing same, and method for manufacturing polycrystalline silicon ingot using said casting moldInfo
- Publication number
- SG11201510759WA SG11201510759WA SG11201510759WA SG11201510759WA SG11201510759WA SG 11201510759W A SG11201510759W A SG 11201510759WA SG 11201510759W A SG11201510759W A SG 11201510759WA SG 11201510759W A SG11201510759W A SG 11201510759WA SG 11201510759W A SG11201510759W A SG 11201510759WA
- Authority
- SG
- Singapore
- Prior art keywords
- casting
- nitride powder
- manufacturing
- silicon nitride
- polycrystalline silicon
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0406—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
- B05D3/0413—Heating with air
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
- C01B21/0687—After-treatment, e.g. grinding, purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Ceramic Products (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Mold Materials And Core Materials (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013145638 | 2013-07-11 | ||
PCT/JP2014/068324 WO2015005390A1 (ja) | 2013-07-11 | 2014-07-09 | 多結晶シリコンインゴット鋳造用鋳型の離型剤用窒化珪素粉末およびその製造法、その窒化珪素粉末を含有したスラリー、多結晶シリコンインゴット鋳造用鋳型およびその製造方法、ならびにその鋳型を用いた多結晶シリコンインゴット鋳の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201510759WA true SG11201510759WA (en) | 2016-02-26 |
Family
ID=52280068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201510759WA SG11201510759WA (en) | 2013-07-11 | 2014-07-09 | Silicon nitride powder for mold release agent of casting mold for casting polycrystalline silicon ingot and method for manufacturing said silicon nitride powder, slurry containing said silicon nitride powder, casting mold for casting polycrystalline silicon ingot and method for manufacturing same, and method for manufacturing polycrystalline silicon ingot using said casting mold |
Country Status (7)
Country | Link |
---|---|
US (1) | US20160159648A1 (zh) |
EP (1) | EP3020686A4 (zh) |
JP (1) | JP5975176B2 (zh) |
CN (1) | CN105377756B (zh) |
SG (1) | SG11201510759WA (zh) |
TW (1) | TWI624429B (zh) |
WO (1) | WO2015005390A1 (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3425087A4 (en) * | 2016-03-01 | 2019-11-06 | Nippon Steel Corporation | CERAMIC LAMINATE |
CN105780112B (zh) * | 2016-05-25 | 2019-01-29 | 晶科能源有限公司 | 一种铸锭石墨护板及其制作方法 |
JP6690735B2 (ja) * | 2016-12-12 | 2020-04-28 | 宇部興産株式会社 | 窒化ケイ素粉末、多結晶シリコンインゴット用離型剤及び多結晶シリコンインゴットの製造方法 |
WO2018110560A1 (ja) * | 2016-12-12 | 2018-06-21 | 宇部興産株式会社 | 窒化ケイ素粉末、多結晶シリコンインゴット用離型剤及び多結晶シリコンインゴットの製造方法 |
FR3063994B1 (fr) | 2017-03-17 | 2022-01-21 | Arkema France | Procede de synthese a ensemencement multiple de cristaux de zeolithe a granulometrie controlee |
JP6946791B2 (ja) * | 2017-07-07 | 2021-10-06 | トヨタ自動車株式会社 | 硫化物固体電解質微粒子の製造方法 |
WO2020090832A1 (ja) * | 2018-11-01 | 2020-05-07 | 宇部興産株式会社 | 窒化ケイ素基板の製造方法および窒化ケイ素基板 |
CN109550623B (zh) * | 2018-12-29 | 2021-01-22 | 中材江苏太阳能新材料有限公司 | 一种提高多晶硅铸锭用坩埚内表面粗糙度的方法 |
EP3950582B1 (en) * | 2019-03-29 | 2023-12-13 | Denka Company Limited | Silicon nitride powder and production method therefor, and production method for silicon nitride sintered body |
CN110408992A (zh) * | 2019-09-11 | 2019-11-05 | 江苏美科硅能源有限公司 | 一种位错密度低、优质晶粒占比高的全融高效多晶硅锭制备方法 |
TW202142485A (zh) * | 2020-03-30 | 2021-11-16 | 日商電化股份有限公司 | 氮化矽粉末、以及氮化矽燒結體之製造方法 |
CN112935201A (zh) * | 2021-01-27 | 2021-06-11 | 广西南宁市高创机械技术有限公司 | 一种铸造模具内表面易脱模处理方法 |
WO2023176889A1 (ja) * | 2022-03-18 | 2023-09-21 | Ube株式会社 | 窒化ケイ素粉末、および窒化ケイ素質焼結体の製造方法 |
WO2023176893A1 (ja) * | 2022-03-18 | 2023-09-21 | Ube株式会社 | 窒化ケイ素粉末、および窒化ケイ素質焼結体の製造方法 |
Family Cites Families (28)
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JPS5921506A (ja) * | 1982-07-27 | 1984-02-03 | Ube Ind Ltd | 結晶質窒化ケイ素粉末の製法 |
US4710368A (en) * | 1985-06-24 | 1987-12-01 | Gte Products Corporation | High purity high surface area alpha crystalline silicon nitride |
DE3829504A1 (de) * | 1988-08-31 | 1990-03-01 | Bayer Ag | Siliciumnitridpulver mit verbesserten oberflaecheneigenschaften sowie verfahren zu deren herstellung |
US4929432A (en) * | 1988-10-19 | 1990-05-29 | Union Carbide Corporation | Process for producing crystalline silicon nitride powder |
US5176893A (en) * | 1989-10-02 | 1993-01-05 | Phillips Petroleum Company | Silicon nitride products and method for their production |
DE4031070A1 (de) * | 1990-10-02 | 1992-04-09 | Bayer Ag | Siliciumdiimid, verfahren zu dessen herstellung sowie daraus erhaltenes siliciumnitrid |
JP2578022B2 (ja) | 1990-12-04 | 1997-02-05 | 宇部興産株式会社 | 結晶質窒化ケイ素粉末の製造法 |
DE4113884A1 (de) * | 1991-04-27 | 1992-10-29 | Hoechst Ag | Verfahren zur herstellung von siliciumnitrid mit kleiner kristallitgroesse |
JP2696732B2 (ja) * | 1991-10-25 | 1998-01-14 | 宇部興産株式会社 | 結晶質窒化珪素粉末の製造法 |
DE69309515T2 (de) * | 1992-01-24 | 1997-11-06 | Sumitomo Electric Industries | Siliziumnitridpulver und Verfahren zu dessen Herstellung |
JP2872528B2 (ja) * | 1993-05-25 | 1999-03-17 | 宇部興産株式会社 | 窒化珪素粉末 |
JP3475614B2 (ja) | 1995-12-05 | 2003-12-08 | 宇部興産株式会社 | シリコンジイミド |
JP3669406B2 (ja) * | 1997-12-16 | 2005-07-06 | 宇部興産株式会社 | 窒化ケイ素粉末 |
JP3648963B2 (ja) * | 1998-01-20 | 2005-05-18 | 宇部興産株式会社 | 窒化ケイ素粉末 |
DE10165080B4 (de) * | 2000-09-20 | 2015-05-13 | Hitachi Metals, Ltd. | Siliciumnitrid-Pulver und -Sinterkörper sowie Verfahren zu deren Herstellung und Leiterplatte damit |
US7540919B2 (en) * | 2005-04-01 | 2009-06-02 | Gt Solar Incorporated | Solidification of crystalline silicon from reusable crucible molds |
US20100203350A1 (en) * | 2007-07-20 | 2010-08-12 | Bp Corporation Noth America Inc. | Methods and Apparatuses for Manufacturing Cast Silicon from Seed Crystals |
TW201002417A (en) * | 2008-07-04 | 2010-01-16 | Danen Technology Corp | Method of coating protective layer on crucible for crystal growth |
JP5725716B2 (ja) | 2009-01-28 | 2015-05-27 | 京セラ株式会社 | 鋳型の形成方法、太陽電池素子用基板の製造方法、太陽電池素子の製造方法、およびシリコンインゴット製造用鋳型 |
KR20170124614A (ko) * | 2010-08-04 | 2017-11-10 | 우베 고산 가부시키가이샤 | 규질화물 형광체용 질화규소 분말 그리고 그것을 이용한 CaAlSiN3계 형광체, Sr2Si5N8계 형광체, (Sr, Ca)AlSiN3계 형광체 및 La3Si6N11계 형광체, 및 그 제조 방법 |
JP5874635B2 (ja) * | 2010-08-19 | 2016-03-02 | 宇部興産株式会社 | 珪窒化物蛍光体用窒化珪素粉末並びにそれを用いたSr3Al3Si13O2N21系蛍光体、β−サイアロン蛍光体及びそれらの製造方法 |
JP2012090541A (ja) | 2010-10-25 | 2012-05-17 | Q P Corp | 菓子 |
SG191391A1 (en) * | 2010-12-28 | 2013-08-30 | Ube Industries | Polycrystalline silicon ingot casting mold and method for producing same, and silicon nitride powder for mold release material for polycrystalline silicon ingot casting mold and slurry containing same |
CN103269975B (zh) * | 2010-12-28 | 2015-06-10 | 宇部兴产株式会社 | 多晶硅铸锭铸造用铸模及其制造方法、以及多晶硅铸锭铸造用铸模的脱模材料用氮化硅粉末及含有该粉末的浆料 |
EP2660202B1 (en) * | 2010-12-28 | 2016-12-28 | Ube Industries, Ltd. | Polycrystalline silicon ingot casting mold, and silicon nitride powder for mold release material, slurry containing silicon nitride powder for mold release layer and casting release material therefor |
ES2600652T3 (es) * | 2011-01-26 | 2017-02-10 | Yamaguchi University | Elemento de contacto de silicio fundido y proceso para producir el mismo, y proceso para producir silicio cristalino |
CN104203813B (zh) * | 2012-03-28 | 2017-04-26 | 宇部兴产株式会社 | 氮化硅粉末的制造方法和氮化硅粉末以及氮化硅烧结体和使用其的电路基板 |
CN105008486B (zh) * | 2013-03-08 | 2018-04-10 | 宇部兴产株式会社 | 氮化物荧光体的制造方法和氮化物荧光体用氮化硅粉末以及氮化物荧光体 |
-
2014
- 2014-07-09 EP EP14822199.7A patent/EP3020686A4/en not_active Withdrawn
- 2014-07-09 US US14/903,679 patent/US20160159648A1/en not_active Abandoned
- 2014-07-09 CN CN201480038649.0A patent/CN105377756B/zh not_active Expired - Fee Related
- 2014-07-09 WO PCT/JP2014/068324 patent/WO2015005390A1/ja active Application Filing
- 2014-07-09 JP JP2015526376A patent/JP5975176B2/ja not_active Expired - Fee Related
- 2014-07-09 SG SG11201510759WA patent/SG11201510759WA/en unknown
- 2014-07-10 TW TW103123778A patent/TWI624429B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP3020686A1 (en) | 2016-05-18 |
WO2015005390A1 (ja) | 2015-01-15 |
EP3020686A4 (en) | 2017-03-29 |
JPWO2015005390A1 (ja) | 2017-03-02 |
CN105377756A (zh) | 2016-03-02 |
JP5975176B2 (ja) | 2016-08-23 |
CN105377756B (zh) | 2017-03-15 |
TW201512080A (zh) | 2015-04-01 |
TWI624429B (zh) | 2018-05-21 |
US20160159648A1 (en) | 2016-06-09 |
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