SG11201509571RA - Electrolytic treatment method and electrolytic treatment device - Google Patents

Electrolytic treatment method and electrolytic treatment device

Info

Publication number
SG11201509571RA
SG11201509571RA SG11201509571RA SG11201509571RA SG11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA
Authority
SG
Singapore
Prior art keywords
electrolytic treatment
treatment device
treatment method
electrolytic
treatment
Prior art date
Application number
SG11201509571RA
Other languages
English (en)
Inventor
Haruo Iwatsu
Hidenori Akiyama
Original Assignee
Tokyo Electron Ltd
Univ Kumamoto Nat Univ Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Univ Kumamoto Nat Univ Corp filed Critical Tokyo Electron Ltd
Publication of SG11201509571RA publication Critical patent/SG11201509571RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B7/00—Electrophoretic production of compounds or non-metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/30—Cells comprising movable electrodes, e.g. rotary electrodes; Assemblies of constructional parts thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
SG11201509571RA 2013-05-20 2014-05-12 Electrolytic treatment method and electrolytic treatment device SG11201509571RA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013106072 2013-05-20
JP2014001465A JP6411741B2 (ja) 2013-05-20 2014-01-08 電解処理方法及び電解処理装置
PCT/JP2014/062585 WO2014188898A1 (ja) 2013-05-20 2014-05-12 電解処理方法及び電解処理装置

Publications (1)

Publication Number Publication Date
SG11201509571RA true SG11201509571RA (en) 2015-12-30

Family

ID=51933459

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201509571RA SG11201509571RA (en) 2013-05-20 2014-05-12 Electrolytic treatment method and electrolytic treatment device

Country Status (7)

Country Link
US (1) US10036095B2 (zh)
JP (1) JP6411741B2 (zh)
KR (1) KR102217899B1 (zh)
CN (1) CN105229205B (zh)
SG (1) SG11201509571RA (zh)
TW (1) TWI613332B (zh)
WO (1) WO2014188898A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104229946B (zh) * 2013-06-20 2017-02-08 罗民雄 一种可将纯净水制成电解水的简易电解方法
US10294575B2 (en) * 2014-01-08 2019-05-21 Tokyo Electron Limited Electric field treatment method and electric field treatment device
JP2016113652A (ja) * 2014-12-12 2016-06-23 春生 岩津 電解処理方法及び電解処理装置
JP6501700B2 (ja) * 2015-12-03 2019-04-17 東京エレクトロン株式会社 電解処理装置及び電解処理方法
JP6783317B2 (ja) * 2016-10-07 2020-11-11 東京エレクトロン株式会社 電解処理治具及び電解処理方法
KR102444029B1 (ko) * 2016-10-12 2022-09-19 뉴사우쓰 이노베이션스 피티와이 리미티드 전기화학 공정을 제어하는 방법 및 장치
TWI746770B (zh) 2017-02-01 2021-11-21 日商東京威力科創股份有限公司 電解處理裝置及電解處理方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798997B2 (ja) * 1992-09-04 1995-10-25 株式会社イケックス工業 金属の電着方法
DE19545231A1 (de) * 1995-11-21 1997-05-22 Atotech Deutschland Gmbh Verfahren zur elektrolytischen Abscheidung von Metallschichten
JP3765076B2 (ja) * 2000-07-13 2006-04-12 藤一 竹間 電気分解方法及び装置
US8147660B1 (en) * 2002-04-04 2012-04-03 Novellus Systems, Inc. Semiconductive counter electrode for electrolytic current distribution control
CN1450207A (zh) * 2002-04-05 2003-10-22 视动自动化科技股份有限公司 电场电子流解偶电镀装置及其控制方法
JP4725145B2 (ja) * 2005-03-17 2011-07-13 日本電気株式会社 合金めっき方法および合金めっき装置
JP4428299B2 (ja) 2005-06-17 2010-03-10 パナソニック株式会社 めっき装置
JP3881687B1 (ja) * 2005-08-05 2007-02-14 新光電気工業株式会社 めっき金属の充填方法及びめっき金属の充填装置
US20110287270A1 (en) * 2008-10-22 2011-11-24 Rohm Co., Ltd. Method for forming a boron-containing thin film and multilayer structure
JP5504147B2 (ja) 2010-12-21 2014-05-28 株式会社荏原製作所 電気めっき方法

Also Published As

Publication number Publication date
US20160083856A1 (en) 2016-03-24
US10036095B2 (en) 2018-07-31
TW201500596A (zh) 2015-01-01
KR20160009684A (ko) 2016-01-26
CN105229205A (zh) 2016-01-06
JP6411741B2 (ja) 2018-10-24
JP2015004124A (ja) 2015-01-08
CN105229205B (zh) 2017-12-19
TWI613332B (zh) 2018-02-01
WO2014188898A1 (ja) 2014-11-27
KR102217899B1 (ko) 2021-02-18

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