SG11201501957PA - Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents - Google Patents

Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents

Info

Publication number
SG11201501957PA
SG11201501957PA SG11201501957PA SG11201501957PA SG11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA
Authority
SG
Singapore
Prior art keywords
dual
lens
methods
resolution imaging
electron beam
Prior art date
Application number
SG11201501957PA
Other languages
English (en)
Inventor
Xinrong Jiang
Liqun Han
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG11201501957PA publication Critical patent/SG11201501957PA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/029—Schematic arrangements for beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/08—Arrangements for controlling intensity of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0456—Supports
    • H01J2237/0458—Supports movable, i.e. for changing between differently sized apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG11201501957PA 2012-09-14 2013-09-13 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents SG11201501957PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/618,760 US8859982B2 (en) 2012-09-14 2012-09-14 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
PCT/US2013/059788 WO2014043557A1 (en) 2012-09-14 2013-09-13 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents

Publications (1)

Publication Number Publication Date
SG11201501957PA true SG11201501957PA (en) 2015-04-29

Family

ID=50273493

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201501957PA SG11201501957PA (en) 2012-09-14 2013-09-13 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents

Country Status (8)

Country Link
US (1) US8859982B2 (ja)
EP (1) EP2896062B1 (ja)
JP (1) JP6310920B2 (ja)
KR (1) KR102139654B1 (ja)
IL (1) IL237738A (ja)
SG (1) SG11201501957PA (ja)
TW (1) TWI620224B (ja)
WO (1) WO2014043557A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI502616B (zh) 2014-08-08 2015-10-01 Nat Univ Tsing Hua 桌上型電子顯微鏡以及其廣域可調式磁透鏡
CN110462509B (zh) 2017-03-30 2022-04-15 Lg伊诺特有限公司 双透镜驱动装置和摄像头模块
DE102017208005B3 (de) * 2017-05-11 2018-08-16 Carl Zeiss Microscopy Gmbh Teilchenquelle zur Erzeugung eines Teilchenstrahls und teilchenoptische Vorrichtung
US10096447B1 (en) * 2017-08-02 2018-10-09 Kla-Tencor Corporation Electron beam apparatus with high resolutions
KR102634195B1 (ko) * 2017-09-29 2024-02-07 에이에스엠엘 네델란즈 비.브이. 하전 입자의 빔 조건을 조정하기 위한 방법 및 장치
US10964522B2 (en) * 2018-06-06 2021-03-30 Kla Corporation High resolution electron energy analyzer
WO2020235003A1 (ja) * 2019-05-21 2020-11-26 株式会社日立ハイテク 電子銃および電子銃を備えた荷電粒子線装置
US11469072B2 (en) * 2021-02-17 2022-10-11 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam apparatus, scanning electron microscope, and method of operating a charged particle beam apparatus
CN113163564B (zh) * 2021-04-30 2024-06-04 中国科学院电工研究所 一种具有静电消除功能的电子束加工装置

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JPH01143217A (ja) * 1987-11-27 1989-06-05 Jeol Ltd 電子ビーム描画装置
US5444243A (en) 1993-09-01 1995-08-22 Hitachi, Ltd. Wien filter apparatus with hyperbolic surfaces
DE4438315A1 (de) 1994-10-26 1996-05-02 Siemens Ag Vorrichtung zum Entfernen von Ionen aus einem Elektronenstrahl
US6111253A (en) 1997-09-01 2000-08-29 Jeol Ltd. Transmission electron microscope
JPH11233053A (ja) * 1998-02-18 1999-08-27 Jeol Ltd 電子顕微鏡等用可動絞り装置
WO2000079565A1 (en) * 1999-06-22 2000-12-28 Philips Electron Optics B.V. Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current
JP3757371B2 (ja) 1999-07-05 2006-03-22 日本電子株式会社 エネルギーフィルタ及びそれを用いた電子顕微鏡
JP4146103B2 (ja) * 2001-05-23 2008-09-03 日本電子株式会社 電界放射型電子銃を備えた電子ビーム装置
US6717141B1 (en) 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
JP2003173581A (ja) * 2001-12-07 2003-06-20 Matsushita Electric Ind Co Ltd 電子線記録装置および電子線記録方法
JP2003331770A (ja) 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
US6753533B2 (en) * 2002-11-04 2004-06-22 Jeol Ltd. Electron beam apparatus and method of controlling same
DE602004021750D1 (de) 2003-07-14 2009-08-13 Fei Co Zweistrahlsystem
WO2006093268A1 (ja) 2005-03-03 2006-09-08 Ebara Corporation 写像投影型電子線装置及び該装置を用いた欠陥検査システム
US7893406B1 (en) 2005-06-29 2011-02-22 Hermes-Microvision, Inc. Electron gun with magnetic immersion double condenser lenses
WO2007013398A1 (ja) 2005-07-26 2007-02-01 Ebara Corporation 電子線装置
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US7560691B1 (en) 2007-01-19 2009-07-14 Kla-Tencor Technologies Corporation High-resolution auger electron spectrometer
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EP2492950B1 (en) * 2011-02-25 2018-04-11 FEI Company Method for rapid switching between a high current mode and a low current mode in a charged particle beam system

Also Published As

Publication number Publication date
EP2896062A4 (en) 2016-06-08
KR20150055023A (ko) 2015-05-20
KR102139654B1 (ko) 2020-07-30
IL237738A (en) 2016-10-31
US20140077077A1 (en) 2014-03-20
TW201419360A (zh) 2014-05-16
JP6310920B2 (ja) 2018-04-11
TWI620224B (zh) 2018-04-01
JP2015531984A (ja) 2015-11-05
EP2896062A1 (en) 2015-07-22
EP2896062B1 (en) 2019-12-18
US8859982B2 (en) 2014-10-14
WO2014043557A1 (en) 2014-03-20

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