SG11201405089WA - Large area imprint lithography - Google Patents

Large area imprint lithography

Info

Publication number
SG11201405089WA
SG11201405089WA SG11201405089WA SG11201405089WA SG11201405089WA SG 11201405089W A SG11201405089W A SG 11201405089WA SG 11201405089W A SG11201405089W A SG 11201405089WA SG 11201405089W A SG11201405089W A SG 11201405089WA SG 11201405089W A SG11201405089W A SG 11201405089WA
Authority
SG
Singapore
Prior art keywords
large area
imprint lithography
area imprint
lithography
imprint
Prior art date
Application number
SG11201405089WA
Other languages
English (en)
Inventor
Byung-Jin Choi
Se Hyun Ahn
Mahadevan Ganapathisubramanian
Michael N Miller
Sidlgata V Sreenivasan
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of SG11201405089WA publication Critical patent/SG11201405089WA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG11201405089WA 2012-02-22 2013-02-22 Large area imprint lithography SG11201405089WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261601632P 2012-02-22 2012-02-22
PCT/US2013/027396 WO2013126750A1 (en) 2012-02-22 2013-02-22 Large area imprint lithography

Publications (1)

Publication Number Publication Date
SG11201405089WA true SG11201405089WA (en) 2014-09-26

Family

ID=47833433

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201405089WA SG11201405089WA (en) 2012-02-22 2013-02-22 Large area imprint lithography

Country Status (8)

Country Link
US (1) US9616614B2 (zh)
EP (1) EP2823356B1 (zh)
JP (1) JP6130404B2 (zh)
KR (1) KR101690532B1 (zh)
CN (2) CN109407463B (zh)
SG (1) SG11201405089WA (zh)
TW (1) TWI574912B (zh)
WO (1) WO2013126750A1 (zh)

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Also Published As

Publication number Publication date
EP2823356A1 (en) 2015-01-14
EP2823356B1 (en) 2018-05-23
JP6130404B2 (ja) 2017-05-17
WO2013126750A1 (en) 2013-08-29
CN104303104A (zh) 2015-01-21
KR101690532B1 (ko) 2016-12-28
US9616614B2 (en) 2017-04-11
JP2015513797A (ja) 2015-05-14
CN104303104B (zh) 2019-02-01
TWI574912B (zh) 2017-03-21
CN109407463B (zh) 2022-06-14
US20130214452A1 (en) 2013-08-22
CN109407463A (zh) 2019-03-01
TW201339091A (zh) 2013-10-01
KR20140135979A (ko) 2014-11-27

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