SG10201506124TA - Resin Mold For Nanoimprinting And Production Method Thereof - Google Patents
Resin Mold For Nanoimprinting And Production Method ThereofInfo
- Publication number
- SG10201506124TA SG10201506124TA SG10201506124TA SG10201506124TA SG10201506124TA SG 10201506124T A SG10201506124T A SG 10201506124TA SG 10201506124T A SG10201506124T A SG 10201506124TA SG 10201506124T A SG10201506124T A SG 10201506124TA SG 10201506124T A SG10201506124T A SG 10201506124TA
- Authority
- SG
- Singapore
- Prior art keywords
- nanoimprinting
- production method
- resin mold
- mold
- resin
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/005—Surface shaping of articles, e.g. embossing; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/40—Plastics, e.g. foam or rubber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
- B29C2033/426—Stampers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
- B29C33/424—Moulding surfaces provided with means for marking or patterning
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Laminated Bodies (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010177602 | 2010-08-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201506124TA true SG10201506124TA (en) | 2015-09-29 |
Family
ID=45559544
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2013008388A SG187703A1 (en) | 2010-08-06 | 2011-08-03 | Resin mold for nanoimprinting and manufacturing method thereof |
SG10201506124TA SG10201506124TA (en) | 2010-08-06 | 2011-08-03 | Resin Mold For Nanoimprinting And Production Method Thereof |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2013008388A SG187703A1 (en) | 2010-08-06 | 2011-08-03 | Resin mold for nanoimprinting and manufacturing method thereof |
Country Status (8)
Country | Link |
---|---|
US (2) | US9713900B2 (zh) |
EP (1) | EP2602089B1 (zh) |
JP (1) | JP5838160B2 (zh) |
KR (1) | KR20130138723A (zh) |
CN (1) | CN103068556B (zh) |
DK (1) | DK2602089T3 (zh) |
SG (2) | SG187703A1 (zh) |
WO (1) | WO2012018048A1 (zh) |
Families Citing this family (23)
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JP2012143915A (ja) * | 2011-01-10 | 2012-08-02 | Scivax Kk | インプリント用型 |
JPWO2013147105A1 (ja) * | 2012-03-30 | 2015-12-14 | コニカミノルタ株式会社 | ロール状モールド、並びに、ロール状モールド及び素子の製造方法 |
JP2014168868A (ja) * | 2013-03-01 | 2014-09-18 | Sony Corp | 転写型および構造体の製造方法 |
WO2014168237A1 (ja) * | 2013-04-12 | 2014-10-16 | 株式会社カネカ | 構造体の複製方法及び当該複製方法を含む局在型表面プラズモン共鳴センサ用チップの製造方法、並びに、構造体、局在型表面プラズモン共鳴センサ用チップ及び局在型表面プラズモン共鳴センサ |
JP6178628B2 (ja) * | 2013-06-05 | 2017-08-09 | 神戸セラミックス株式会社 | 断熱金型及びその製造方法 |
KR102214828B1 (ko) * | 2014-05-02 | 2021-02-15 | 삼성전자주식회사 | 임프린트 장치 및 방법 |
JP6967832B2 (ja) | 2014-10-28 | 2021-11-17 | デクセリアルズ株式会社 | エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法 |
WO2016068166A1 (ja) * | 2014-10-28 | 2016-05-06 | デクセリアルズ株式会社 | エンボスフィルム、枚葉フィルム、転写物、およびエンボスフィルムの製造方法 |
JP6529843B2 (ja) * | 2015-07-14 | 2019-06-12 | 芝浦メカトロニクス株式会社 | インプリント用のテンプレート製造装置及びテンプレート製造方法 |
JP2018187767A (ja) * | 2015-09-29 | 2018-11-29 | 綜研化学株式会社 | 撥水性部材及びその製造方法 |
DE102015118991A1 (de) | 2015-11-05 | 2017-05-11 | Ev Group E. Thallner Gmbh | Verfahren zur Behandlung von Millimeter- und/oder Mikrometer- und/oder Nanometerstrukturen an einer Oberfläche eines Substrats |
CN105824228B (zh) * | 2016-03-15 | 2019-01-11 | 北京大学 | 一种基于表面等离子体耦合结构的全息成像膜 |
JP7066975B2 (ja) * | 2017-03-10 | 2022-05-16 | 味の素株式会社 | 樹脂組成物、樹脂シート、回路基板及び半導体チップパッケージ |
TWI770237B (zh) * | 2017-07-26 | 2022-07-11 | 日商富士軟片股份有限公司 | 壓印用硬化性組成物、硬化物、圖案製造方法、微影方法、圖案、微影用遮罩及壓印用聚合性組成物 |
KR102580856B1 (ko) | 2018-01-30 | 2023-09-20 | 삼성디스플레이 주식회사 | 와이어 그리드 편광자용 몰드 및 이를 제조하는 방법 |
US10649119B2 (en) * | 2018-07-16 | 2020-05-12 | Facebook Technologies, Llc | Duty cycle, depth, and surface energy control in nano fabrication |
KR102194832B1 (ko) * | 2019-01-03 | 2020-12-23 | 부산대학교 산학협력단 | 렌즈 표면 나노구조층의 제조 방법 |
US11550083B2 (en) | 2019-06-26 | 2023-01-10 | Meta Platforms Technologies, Llc | Techniques for manufacturing slanted structures |
EP3839626B1 (fr) * | 2019-12-18 | 2023-10-11 | Nivarox-FAR S.A. | Procede de fabrication d'un composant horloger |
CN112198759A (zh) * | 2020-10-21 | 2021-01-08 | 中芯集成电路制造(绍兴)有限公司 | 压印模具、压印模具的制作方法、纳米压印方法 |
JP6972409B1 (ja) * | 2021-03-30 | 2021-11-24 | リンテック株式会社 | マイクロニードルの製造方法およびマイクロニードルの製造装置 |
JP2023008475A (ja) | 2021-07-06 | 2023-01-19 | 信越化学工業株式会社 | インプリントモールドおよびその製造方法ならびに再生インプリントモールドの製造方法 |
WO2023054527A1 (ja) * | 2021-09-30 | 2023-04-06 | デクセリアルズ株式会社 | モールド、モールドの製造方法および微細凹凸構造体の製造方法 |
Family Cites Families (19)
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JP2003306520A (ja) | 2002-04-17 | 2003-10-31 | Hitachi Kasei Polymer Co Ltd | 活性エネルギー線硬化性樹脂組成物 |
JP4317375B2 (ja) * | 2003-03-20 | 2009-08-19 | 株式会社日立製作所 | ナノプリント装置、及び微細構造転写方法 |
KR20070105040A (ko) * | 2006-04-25 | 2007-10-30 | 엘지.필립스 엘시디 주식회사 | 레지스트 조성물, 이를 이용한 레지스트 패턴 형성방법 및이를 이용하여 제조된 어레이 기판 |
KR100857521B1 (ko) | 2006-06-13 | 2008-09-08 | 엘지디스플레이 주식회사 | 박막트랜지스터 제조용 몰드의 제조방법 및 그 제조장비 |
KR101358255B1 (ko) * | 2006-06-27 | 2014-02-05 | 엘지디스플레이 주식회사 | 광경화 타입 소수성 몰드 및 그 제조방법 |
KR100831046B1 (ko) * | 2006-09-13 | 2008-05-21 | 삼성전자주식회사 | 나노 임프린트용 몰드 및 그 제조 방법 |
JP4983262B2 (ja) | 2007-01-10 | 2012-07-25 | Jnc株式会社 | ナノインプリント用組成物 |
US8027086B2 (en) * | 2007-04-10 | 2011-09-27 | The Regents Of The University Of Michigan | Roll to roll nanoimprint lithography |
JP5016368B2 (ja) | 2007-05-09 | 2012-09-05 | 株式会社ブリヂストン | 光硬化性転写シート、これを用いた光情報記録媒体の製造方法、及び光情報記録媒体 |
WO2008149544A1 (ja) | 2007-06-04 | 2008-12-11 | Scivax Corporation | 型、微細加工品およびそれらの製造方法 |
JP5309579B2 (ja) | 2008-02-01 | 2013-10-09 | コニカミノルタ株式会社 | 樹脂成形金型及びその製造方法 |
BRPI0822215A2 (pt) * | 2008-02-27 | 2015-06-23 | Sharp Kk | Aparelho de nanolitografia de rolo, rolo de molde para utilização em aparelho de nanolitografia de rolo, rolo de fixação para utilização em aparelho de nanolitografia de rolo, e método de produção de folha de nanolitografia |
EP2286980A4 (en) * | 2008-06-05 | 2011-07-13 | Asahi Glass Co Ltd | NANO-PRINTING MOLD, METHOD FOR MANUFACTURING THE SAME, AND PROCESSES FOR PRODUCING A MOLDED RESIN HAVING A FINE ROUGH STRUCTURE ON A SURFACE AND FOR PRODUCING A METAL GRID POLARIZER |
EP2314634B1 (en) * | 2008-08-08 | 2014-05-07 | Showa Denko K.K. | Epoxy-group-containing copolymer, epoxy (meth)acrylate copolymer using same, and processes for producing the copolymers |
JP5187144B2 (ja) | 2008-11-07 | 2013-04-24 | コニカミノルタアドバンストレイヤー株式会社 | 情報記録媒体用基板の製造方法 |
EP2199855B1 (en) * | 2008-12-19 | 2016-07-20 | Obducat | Methods and processes for modifying polymer material surface interactions |
CN101923282B (zh) * | 2009-06-09 | 2012-01-25 | 清华大学 | 纳米压印抗蚀剂及采用该纳米压印抗蚀剂的纳米压印方法 |
JP5403371B2 (ja) * | 2009-06-22 | 2014-01-29 | 綜研化学株式会社 | 金属製モールドの製造方法ならびに該金属製モールドを製造するための樹脂モールドおよび樹脂 |
CA2768830C (en) | 2009-08-07 | 2018-07-31 | Soken Chemical & Engineering Co., Ltd. | Resin mold for imprinting and method for producing the same |
-
2011
- 2011-08-03 KR KR1020137003989A patent/KR20130138723A/ko not_active Application Discontinuation
- 2011-08-03 JP JP2012527752A patent/JP5838160B2/ja not_active Expired - Fee Related
- 2011-08-03 US US13/814,325 patent/US9713900B2/en not_active Expired - Fee Related
- 2011-08-03 DK DK11814673.7T patent/DK2602089T3/da active
- 2011-08-03 SG SG2013008388A patent/SG187703A1/en unknown
- 2011-08-03 WO PCT/JP2011/067775 patent/WO2012018048A1/ja active Application Filing
- 2011-08-03 SG SG10201506124TA patent/SG10201506124TA/en unknown
- 2011-08-03 EP EP11814673.7A patent/EP2602089B1/en not_active Not-in-force
- 2011-08-03 CN CN201180038661.8A patent/CN103068556B/zh not_active Expired - Fee Related
-
2017
- 2017-05-17 US US15/597,181 patent/US9895838B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN103068556A (zh) | 2013-04-24 |
US20170252962A1 (en) | 2017-09-07 |
JPWO2012018048A1 (ja) | 2013-10-03 |
US20130127090A1 (en) | 2013-05-23 |
KR20130138723A (ko) | 2013-12-19 |
EP2602089A4 (en) | 2015-10-07 |
DK2602089T3 (da) | 2018-01-29 |
EP2602089A1 (en) | 2013-06-12 |
JP5838160B2 (ja) | 2015-12-24 |
US9713900B2 (en) | 2017-07-25 |
SG187703A1 (en) | 2013-03-28 |
WO2012018048A1 (ja) | 2012-02-09 |
EP2602089B1 (en) | 2017-12-20 |
CN103068556B (zh) | 2015-07-22 |
US9895838B2 (en) | 2018-02-20 |
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