SG10201402081TA - Resist stripping compositions and methods for manufacturing electrical devices - Google Patents
Resist stripping compositions and methods for manufacturing electrical devicesInfo
- Publication number
- SG10201402081TA SG10201402081TA SG10201402081TA SG10201402081TA SG10201402081TA SG 10201402081T A SG10201402081T A SG 10201402081TA SG 10201402081T A SG10201402081T A SG 10201402081TA SG 10201402081T A SG10201402081T A SG 10201402081TA SG 10201402081T A SG10201402081T A SG 10201402081TA
- Authority
- SG
- Singapore
- Prior art keywords
- methods
- electrical devices
- resist stripping
- manufacturing electrical
- stripping compositions
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
- H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Detergent Compositions (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17617909P | 2009-05-07 | 2009-05-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201402081TA true SG10201402081TA (en) | 2014-07-30 |
Family
ID=42271987
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201402081TA SG10201402081TA (en) | 2009-05-07 | 2010-04-20 | Resist stripping compositions and methods for manufacturing electrical devices |
SG2011079381A SG175820A1 (en) | 2009-05-07 | 2010-04-20 | Resist stripping compositions and methods for manufacturing electrical devices |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2011079381A SG175820A1 (en) | 2009-05-07 | 2010-04-20 | Resist stripping compositions and methods for manufacturing electrical devices |
Country Status (11)
Country | Link |
---|---|
US (1) | US9146471B2 (ru) |
EP (1) | EP2427804B1 (ru) |
JP (1) | JP5836932B2 (ru) |
KR (1) | KR101799602B1 (ru) |
CN (1) | CN102804074B (ru) |
IL (1) | IL215954A (ru) |
MY (1) | MY158776A (ru) |
RU (1) | RU2551841C2 (ru) |
SG (2) | SG10201402081TA (ru) |
TW (1) | TWI492001B (ru) |
WO (1) | WO2010127943A1 (ru) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG192847A1 (en) | 2011-03-18 | 2013-09-30 | Basf Se | Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less |
KR102122182B1 (ko) * | 2012-03-16 | 2020-06-12 | 바스프 에스이 | 포토레지스트 박리 및 세정 조성물, 이의 제조 방법 및 이의 용도 |
RU2015104902A (ru) * | 2012-07-16 | 2016-09-10 | Басф Се | Композиция, используемая в изготовлении интегральных схем, оптических устройств, микромашин и механических прецизионных устройств |
US10161046B2 (en) * | 2012-07-24 | 2018-12-25 | Lg Chem, Ltd. | Method for forming metal particle layer and light emitting device fabricated using metal particle layer formed by the method |
JP6165665B2 (ja) * | 2013-05-30 | 2017-07-19 | 信越化学工業株式会社 | 基板の洗浄方法 |
US9472420B2 (en) | 2013-12-20 | 2016-10-18 | Air Products And Chemicals, Inc. | Composition for titanium nitride hard mask and etch residue removal |
CN104774697A (zh) * | 2015-04-28 | 2015-07-15 | 苏州永创达电子有限公司 | 一种液晶清洗剂 |
US9976111B2 (en) | 2015-05-01 | 2018-05-22 | Versum Materials Us, Llc | TiN hard mask and etch residual removal |
KR102384908B1 (ko) * | 2015-11-25 | 2022-04-08 | 삼성전자주식회사 | 자성 패턴 세정 조성물, 자성 패턴 형성 방법 및 자기 메모리 장치의 제조 방법 |
KR20180087624A (ko) | 2017-01-25 | 2018-08-02 | 동우 화인켐 주식회사 | 레지스트 박리액 조성물 |
US11175587B2 (en) * | 2017-09-29 | 2021-11-16 | Versum Materials Us, Llc | Stripper solutions and methods of using stripper solutions |
US10948826B2 (en) * | 2018-03-07 | 2021-03-16 | Versum Materials Us, Llc | Photoresist stripper |
KR20200076778A (ko) | 2018-12-19 | 2020-06-30 | 삼성전자주식회사 | 반도체 패키지의 제조방법 |
JP7273660B2 (ja) * | 2019-08-30 | 2023-05-15 | キオクシア株式会社 | 半導体製造装置、および半導体装置の製造方法 |
KR20220058094A (ko) | 2020-10-30 | 2022-05-09 | 주식회사 이엔에프테크놀로지 | 포토레지스트 제거용 박리액 조성물 |
KR20220150134A (ko) | 2021-05-03 | 2022-11-10 | 삼성전자주식회사 | 포토레지스트 박리 조성물과 이를 이용하는 반도체 소자 및 반도체 패키지의 제조 방법 |
CN117031895A (zh) * | 2023-08-17 | 2023-11-10 | 浙江奥首材料科技有限公司 | 一种芯片光刻胶剥离液、其制备方法及用途 |
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SU1834588A1 (ru) * | 1989-12-07 | 1996-07-10 | Научно-исследовательский институт точного машиностроения | Способ формирования рельефа интегральных микросхем |
CA2193905A1 (en) | 1996-12-24 | 1998-06-24 | Luc Ouellet | Integrated processing for an etch module |
JPH10239865A (ja) * | 1997-02-24 | 1998-09-11 | Jsr Corp | ネガ型フォトレジスト用剥離液組成物 |
US6218078B1 (en) | 1997-09-24 | 2001-04-17 | Advanced Micro Devices, Inc. | Creation of an etch hardmask by spin-on technique |
US5919599A (en) | 1997-09-30 | 1999-07-06 | Brewer Science, Inc. | Thermosetting anti-reflective coatings at deep ultraviolet |
US7579308B2 (en) | 1998-07-06 | 2009-08-25 | Ekc/Dupont Electronics Technologies | Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
US7547669B2 (en) | 1998-07-06 | 2009-06-16 | Ekc Technology, Inc. | Remover compositions for dual damascene system |
RU2145156C1 (ru) * | 1999-02-09 | 2000-01-27 | Нижегородский государственный технический университет | Способ формирования структур в микроэлектронике |
GB0009112D0 (en) * | 2000-04-12 | 2000-05-31 | Ekc Technology Ltd | Inhibition of titanium corrosion |
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CN100403169C (zh) | 2001-07-13 | 2008-07-16 | Ekc技术公司 | 亚砜吡咯烷酮链烷醇胺剥离和清洗组合物 |
US20040256358A1 (en) * | 2001-11-02 | 2004-12-23 | Hidetaka Shimizu | Method for releasing resist |
US20030148624A1 (en) | 2002-01-31 | 2003-08-07 | Kazuto Ikemoto | Method for removing resists |
KR101017738B1 (ko) * | 2002-03-12 | 2011-02-28 | 미츠비시 가스 가가쿠 가부시키가이샤 | 포토레지스트 박리제 조성물 및 세정 조성물 |
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RU2263998C2 (ru) * | 2003-06-05 | 2005-11-10 | Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" | Способ изготовления тонкопленочной структуры межсоединений принтерной головки с тонкопленочным резистором |
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US20090121353A1 (en) * | 2007-11-13 | 2009-05-14 | Ramappa Deepak A | Dual damascene beol integration without dummy fill structures to reduce parasitic capacitance |
CN101578341A (zh) * | 2008-01-07 | 2009-11-11 | 巴斯夫欧洲公司 | 有机涂膜剥离用组合物及剥离有机涂膜的方法 |
RU2010148303A (ru) | 2008-04-28 | 2012-06-10 | Басф Се (De) | Low-к диэлектрики, получаемые методом twin-полимеризации |
US20110076416A1 (en) | 2008-05-26 | 2011-03-31 | Basf Se | Method of making porous materials and porous materials prepared thereof |
US8444768B2 (en) * | 2009-03-27 | 2013-05-21 | Eastman Chemical Company | Compositions and methods for removing organic substances |
WO2010127941A1 (en) | 2009-05-07 | 2010-11-11 | Basf Se | Resist stripping compositions and methods for manufacturing electrical devices |
-
2010
- 2010-04-20 MY MYPI2011005271A patent/MY158776A/en unknown
- 2010-04-20 SG SG10201402081TA patent/SG10201402081TA/en unknown
- 2010-04-20 KR KR1020117029143A patent/KR101799602B1/ko active IP Right Grant
- 2010-04-20 EP EP10715225.8A patent/EP2427804B1/en active Active
- 2010-04-20 WO PCT/EP2010/055205 patent/WO2010127943A1/en active Application Filing
- 2010-04-20 SG SG2011079381A patent/SG175820A1/en unknown
- 2010-04-20 JP JP2012508978A patent/JP5836932B2/ja not_active Expired - Fee Related
- 2010-04-20 CN CN201080030190.1A patent/CN102804074B/zh active Active
- 2010-04-20 US US13/319,187 patent/US9146471B2/en active Active
- 2010-04-20 RU RU2011149552/04A patent/RU2551841C2/ru not_active IP Right Cessation
- 2010-05-06 TW TW099114548A patent/TWI492001B/zh active
-
2011
- 2011-10-26 IL IL215954A patent/IL215954A/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US20120058644A1 (en) | 2012-03-08 |
SG175820A1 (en) | 2011-12-29 |
EP2427804B1 (en) | 2019-10-02 |
CN102804074B (zh) | 2015-03-04 |
JP5836932B2 (ja) | 2015-12-24 |
JP2012526295A (ja) | 2012-10-25 |
IL215954A (en) | 2017-01-31 |
EP2427804A1 (en) | 2012-03-14 |
RU2551841C2 (ru) | 2015-05-27 |
TWI492001B (zh) | 2015-07-11 |
RU2011149552A (ru) | 2013-06-20 |
MY158776A (en) | 2016-11-15 |
TW201044124A (en) | 2010-12-16 |
KR20120024714A (ko) | 2012-03-14 |
WO2010127943A1 (en) | 2010-11-11 |
CN102804074A (zh) | 2012-11-28 |
KR101799602B1 (ko) | 2017-11-20 |
US9146471B2 (en) | 2015-09-29 |
IL215954A0 (en) | 2012-01-31 |
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