SE8104410L - Optisk beleggning - Google Patents

Optisk beleggning

Info

Publication number
SE8104410L
SE8104410L SE8104410A SE8104410A SE8104410L SE 8104410 L SE8104410 L SE 8104410L SE 8104410 A SE8104410 A SE 8104410A SE 8104410 A SE8104410 A SE 8104410A SE 8104410 L SE8104410 L SE 8104410L
Authority
SE
Sweden
Prior art keywords
substrate
parameters
impedance
deposition
frequency
Prior art date
Application number
SE8104410A
Other languages
English (en)
Swedish (sv)
Inventor
R T Corbett
B C Monachan
A J N Hope
Original Assignee
Barr & Stroud Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Barr & Stroud Ltd filed Critical Barr & Stroud Ltd
Publication of SE8104410L publication Critical patent/SE8104410L/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/338—Changing chemical properties of treated surfaces
    • H01J2237/3385—Carburising

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Filters (AREA)
  • Eyeglasses (AREA)
SE8104410A 1980-07-17 1981-07-16 Optisk beleggning SE8104410L (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8023435 1980-07-17
GB8118713 1981-06-18

Publications (1)

Publication Number Publication Date
SE8104410L true SE8104410L (sv) 1983-08-02

Family

ID=26276256

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8104410A SE8104410L (sv) 1980-07-17 1981-07-16 Optisk beleggning

Country Status (7)

Country Link
US (1) US4444805A (nl)
DE (1) DE3128022A1 (nl)
FR (1) FR2518581B3 (nl)
IT (1) IT1144745B (nl)
NL (1) NL8103333A (nl)
NO (1) NO812436L (nl)
SE (1) SE8104410L (nl)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0142176A1 (en) * 1983-10-24 1985-05-22 George Gergely Merkl Cubic carbon
US4645713A (en) * 1985-01-25 1987-02-24 Agency Of Industrial Science & Technology Method for forming conductive graphite film and film formed thereby
US4626447A (en) * 1985-03-18 1986-12-02 Energy Conversion Devices, Inc. Plasma confining apparatus
US4603082A (en) * 1985-04-29 1986-07-29 Rca Corporation Diamond-like film
GB2175016B (en) * 1985-05-11 1990-01-24 Barr & Stroud Ltd Optical coating
DE3630418C1 (de) * 1986-09-06 1987-12-17 Kernforschungsanlage Juelich Verfahren zur Beschichtung von Werkstuecken mit amorphem,wasserstoffhaltigem Kohlenstoff
DE3630419A1 (de) * 1986-09-06 1988-03-10 Kernforschungsanlage Juelich Verfahren zur beschichtung von hoher waermebelastung ausgesetzten bauelementen mit einer amorphen wasserstoffhaltigen kohlenstoffschicht
DE3719616A1 (de) * 1987-06-12 1988-12-29 Leybold Ag Verfahren und vorrichtung zur beschichtung eines substrats
US5283087A (en) * 1988-02-05 1994-02-01 Semiconductor Energy Laboratory Co., Ltd. Plasma processing method and apparatus
US4994298A (en) * 1988-06-07 1991-02-19 Biogold Inc. Method of making a biocompatible prosthesis
US4992298A (en) * 1988-10-11 1991-02-12 Beamalloy Corporation Dual ion beam ballistic alloying process
US5055318A (en) * 1988-10-11 1991-10-08 Beamalloy Corporation Dual ion beam ballistic alloying process
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
GB9420089D0 (en) * 1994-10-05 1994-11-16 Applied Vision Ltd Coatings for optical lens having low surface energy properties
DE19819414A1 (de) * 1998-04-30 1999-11-04 Leybold Ag Für ein Kunststoffsubstrat bestimmtes Schichtpaket und Verfahren zum Erzeugen eines solchen Schichtpaketes
US8545995B2 (en) * 2009-12-14 2013-10-01 Lawrence Livermore National Security, Llc. Systems having optical absorption layer for mid and long wave infrared and methods for making the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3776762A (en) * 1971-10-18 1973-12-04 Kote Corp Du Dry lubrication
US3961103A (en) * 1972-07-12 1976-06-01 Space Sciences, Inc. Film deposition
US4170662A (en) * 1974-11-05 1979-10-09 Eastman Kodak Company Plasma plating
GB1582231A (en) * 1976-08-13 1981-01-07 Nat Res Dev Application of a layer of carbonaceous material to a surface
JPS55500588A (nl) * 1978-08-18 1980-09-04
JPS5846057B2 (ja) * 1979-03-19 1983-10-14 富士通株式会社 プラズマ処理方法

Also Published As

Publication number Publication date
FR2518581B3 (nl) 1984-09-07
NO812436L (no) 1984-08-24
IT1144745B (it) 1986-10-29
US4444805A (en) 1984-04-24
FR2518581A1 (nl) 1983-06-24
IT8167986A0 (it) 1981-07-17
DE3128022A1 (de) 1984-01-26
NL8103333A (nl) 1983-04-05

Similar Documents

Publication Publication Date Title
SE8104410L (sv) Optisk beleggning
US4617079A (en) Plasma etching system
US4333814A (en) Methods and apparatus for improving an RF excited reactive gas plasma
US4557819A (en) System for igniting and controlling a wafer processing plasma
US4352725A (en) Dry etching device comprising an electrode for controlling etch rate
US4438315A (en) High selectivity plasma etching apparatus
ES8400997A1 (es) Un metodo mejorado para recubrir mediante plasma la superficie interior de un tubo de cristal.
ATE207978T1 (de) Verfahren und vorrichtung zum zünden von plasmen in einem process modul
EP0327406A3 (en) Plasma processing method and apparatus for the deposition of thin films
JP2008240156A (ja) プラズマｃｖｄ法
EP0641150A4 (en) TREATMENT DEVICE.
KR20010023113A (ko) 플라즈마 처리 장치의 제어 방법
JPS5647572A (en) Etching method of indium oxide film
JPS57210631A (en) Reactive type ion etching method
JPS5615044A (en) Plasma cleaning method
JPS57202733A (en) Dry etching device
JPS55118636A (en) Gas etching method and device
JPH0211781A (ja) ドライエッチング装置
US4974542A (en) Photochemical vapor reaction apparatus
GB677784A (en) Improvements in and relating to a method for treating the surface of optical elements and to an optical element treated thereby
JPS5454578A (en) Gas plasma etching method
JPS5612541A (en) Removing device of contaminant
JPS52122284A (en) Sputtering device having bias electrode
JPS57174465A (en) High frequency ion etching device
JPS647623A (en) Cleaning method for si surface by dry type