SE516414C2 - Metod vid tillverkning av en mall, samt mallen tillverkad därav - Google Patents
Metod vid tillverkning av en mall, samt mallen tillverkad däravInfo
- Publication number
- SE516414C2 SE516414C2 SE0001931A SE0001931A SE516414C2 SE 516414 C2 SE516414 C2 SE 516414C2 SE 0001931 A SE0001931 A SE 0001931A SE 0001931 A SE0001931 A SE 0001931A SE 516414 C2 SE516414 C2 SE 516414C2
- Authority
- SE
- Sweden
- Prior art keywords
- plate
- template
- pattern
- heat treatment
- resist
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001931A SE516414C2 (sv) | 2000-05-24 | 2000-05-24 | Metod vid tillverkning av en mall, samt mallen tillverkad därav |
JP2001586524A JP2003534651A (ja) | 2000-05-24 | 2001-04-10 | テンプレートの製作に関する方法およびその方法で製作されるテンプレート |
AT01920080T ATE471533T1 (de) | 2000-05-24 | 2001-04-10 | Verfahren zur herstellung einer schablone |
CNB01809984XA CN1236359C (zh) | 2000-05-24 | 2001-04-10 | 有关模板的制造方法和制成的模板 |
US10/296,326 US7022465B2 (en) | 2000-05-24 | 2001-04-10 | Method in connection with the production of a template and the template thus produced |
DE60142393T DE60142393D1 (de) | 2000-05-24 | 2001-04-10 | Verfahren zur herstellung einer schablone |
AU2001247025A AU2001247025A1 (en) | 2000-05-24 | 2001-04-10 | Method in connection with the production of a template and the template thus produced |
PCT/SE2001/000787 WO2001090816A1 (en) | 2000-05-24 | 2001-04-10 | Method in connection with the production of a template and the template thus produced |
EP01920080A EP1290497B1 (en) | 2000-05-24 | 2001-04-10 | Method for the production of a template and the template thus produced |
HK03105231.5A HK1052978B (zh) | 2000-05-24 | 2003-07-21 | 模板的製造方法和製成的模板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001931A SE516414C2 (sv) | 2000-05-24 | 2000-05-24 | Metod vid tillverkning av en mall, samt mallen tillverkad därav |
Publications (3)
Publication Number | Publication Date |
---|---|
SE0001931D0 SE0001931D0 (sv) | 2000-05-24 |
SE0001931L SE0001931L (sv) | 2001-11-25 |
SE516414C2 true SE516414C2 (sv) | 2002-01-15 |
Family
ID=20279811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0001931A SE516414C2 (sv) | 2000-05-24 | 2000-05-24 | Metod vid tillverkning av en mall, samt mallen tillverkad därav |
Country Status (10)
Country | Link |
---|---|
US (1) | US7022465B2 (ja) |
EP (1) | EP1290497B1 (ja) |
JP (1) | JP2003534651A (ja) |
CN (1) | CN1236359C (ja) |
AT (1) | ATE471533T1 (ja) |
AU (1) | AU2001247025A1 (ja) |
DE (1) | DE60142393D1 (ja) |
HK (1) | HK1052978B (ja) |
SE (1) | SE516414C2 (ja) |
WO (1) | WO2001090816A1 (ja) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100827741B1 (ko) | 2000-07-17 | 2008-05-07 | 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 | 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템 |
US7037639B2 (en) | 2002-05-01 | 2006-05-02 | Molecular Imprints, Inc. | Methods of manufacturing a lithography template |
US6936194B2 (en) | 2002-09-05 | 2005-08-30 | Molecular Imprints, Inc. | Functional patterning material for imprint lithography processes |
GB0229191D0 (en) * | 2002-12-14 | 2003-01-22 | Plastic Logic Ltd | Embossing of polymer devices |
US6951173B1 (en) | 2003-05-14 | 2005-10-04 | Molecular Imprints, Inc. | Assembly and method for transferring imprint lithography templates |
US6805054B1 (en) | 2003-05-14 | 2004-10-19 | Molecular Imprints, Inc. | Method, system and holder for transferring templates during imprint lithography processes |
KR100868887B1 (ko) * | 2004-01-12 | 2008-11-17 | 더 리전트 오브 더 유니버시티 오브 캘리포니아 | 나노 규모의 전기 석판 인쇄술 |
US7730834B2 (en) * | 2004-03-04 | 2010-06-08 | Asml Netherlands B.V. | Printing apparatus and device manufacturing method |
WO2005104756A2 (en) * | 2004-04-27 | 2005-11-10 | The Board Of Trustees Of The University Of Illinois | Composite patterning devices for soft lithography |
US8075298B2 (en) * | 2004-09-08 | 2011-12-13 | Nil Technology Aps | Flexible nano-imprint stamp |
US7676088B2 (en) * | 2004-12-23 | 2010-03-09 | Asml Netherlands B.V. | Imprint lithography |
US20060144814A1 (en) * | 2004-12-30 | 2006-07-06 | Asml Netherlands B.V. | Imprint lithography |
CN100541326C (zh) * | 2004-12-30 | 2009-09-16 | 中国科学院电工研究所 | 纳米级别图形的压印制造方法及其装置 |
US7490547B2 (en) * | 2004-12-30 | 2009-02-17 | Asml Netherlands B.V. | Imprint lithography |
US20060144274A1 (en) * | 2004-12-30 | 2006-07-06 | Asml Netherlands B.V. | Imprint lithography |
US7686970B2 (en) * | 2004-12-30 | 2010-03-30 | Asml Netherlands B.V. | Imprint lithography |
US7354698B2 (en) * | 2005-01-07 | 2008-04-08 | Asml Netherlands B.V. | Imprint lithography |
US7922474B2 (en) * | 2005-02-17 | 2011-04-12 | Asml Netherlands B.V. | Imprint lithography |
US7329115B2 (en) * | 2005-02-18 | 2008-02-12 | Hewlett-Packard Development Company, L.P. | Patterning nanoline arrays with spatially varying pitch |
US7523701B2 (en) * | 2005-03-07 | 2009-04-28 | Asml Netherlands B.V. | Imprint lithography method and apparatus |
US7611348B2 (en) * | 2005-04-19 | 2009-11-03 | Asml Netherlands B.V. | Imprint lithography |
US7762186B2 (en) * | 2005-04-19 | 2010-07-27 | Asml Netherlands B.V. | Imprint lithography |
US7442029B2 (en) * | 2005-05-16 | 2008-10-28 | Asml Netherlands B.V. | Imprint lithography |
US7692771B2 (en) * | 2005-05-27 | 2010-04-06 | Asml Netherlands B.V. | Imprint lithography |
US20060267231A1 (en) | 2005-05-27 | 2006-11-30 | Asml Netherlands B.V. | Imprint lithography |
US7708924B2 (en) * | 2005-07-21 | 2010-05-04 | Asml Netherlands B.V. | Imprint lithography |
US7418902B2 (en) * | 2005-05-31 | 2008-09-02 | Asml Netherlands B.V. | Imprint lithography including alignment |
US7377764B2 (en) * | 2005-06-13 | 2008-05-27 | Asml Netherlands B.V. | Imprint lithography |
US20070023976A1 (en) * | 2005-07-26 | 2007-02-01 | Asml Netherlands B.V. | Imprint lithography |
US8011915B2 (en) * | 2005-11-04 | 2011-09-06 | Asml Netherlands B.V. | Imprint lithography |
US7878791B2 (en) * | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
EP1795958A1 (en) * | 2005-12-07 | 2007-06-13 | Electronics And Telecommunications Research Institute | Method of fabricating nanoimprint mold |
US7517211B2 (en) * | 2005-12-21 | 2009-04-14 | Asml Netherlands B.V. | Imprint lithography |
US20070138699A1 (en) * | 2005-12-21 | 2007-06-21 | Asml Netherlands B.V. | Imprint lithography |
CN100396595C (zh) * | 2005-12-27 | 2008-06-25 | 北京大学 | 应用纳米压印和反应离子刻蚀术制备纳米悬臂结构的方法 |
US20070134943A2 (en) * | 2006-04-02 | 2007-06-14 | Dunnrowicz Clarence J | Subtractive - Additive Edge Defined Lithography |
US20070290282A1 (en) * | 2006-06-15 | 2007-12-20 | Nanochip, Inc. | Bonded chip assembly with a micro-mover for microelectromechanical systems |
US20070121477A1 (en) * | 2006-06-15 | 2007-05-31 | Nanochip, Inc. | Cantilever with control of vertical and lateral position of contact probe tip |
US20070291623A1 (en) * | 2006-06-15 | 2007-12-20 | Nanochip, Inc. | Cantilever with control of vertical and lateral position of contact probe tip |
US20080023885A1 (en) * | 2006-06-15 | 2008-01-31 | Nanochip, Inc. | Method for forming a nano-imprint lithography template having very high feature counts |
US8015939B2 (en) | 2006-06-30 | 2011-09-13 | Asml Netherlands B.V. | Imprintable medium dispenser |
US8318253B2 (en) * | 2006-06-30 | 2012-11-27 | Asml Netherlands B.V. | Imprint lithography |
JP5061525B2 (ja) * | 2006-08-04 | 2012-10-31 | 株式会社日立製作所 | インプリント方法及びインプリント装置 |
US20080074792A1 (en) * | 2006-09-21 | 2008-03-27 | Nanochip, Inc. | Control scheme for a memory device |
US20080074984A1 (en) * | 2006-09-21 | 2008-03-27 | Nanochip, Inc. | Architecture for a Memory Device |
US20090038636A1 (en) * | 2007-08-09 | 2009-02-12 | Asml Netherlands B.V. | Cleaning method |
US7854877B2 (en) | 2007-08-14 | 2010-12-21 | Asml Netherlands B.V. | Lithography meandering order |
US8144309B2 (en) | 2007-09-05 | 2012-03-27 | Asml Netherlands B.V. | Imprint lithography |
US7906274B2 (en) | 2007-11-21 | 2011-03-15 | Molecular Imprints, Inc. | Method of creating a template employing a lift-off process |
EP2563453B1 (en) | 2010-04-28 | 2017-02-08 | Kimberly-Clark Worldwide, Inc. | Nanopatterned medical device with enhanced cellular interaction and method for its forming |
KR20140079429A (ko) | 2011-10-27 | 2014-06-26 | 킴벌리-클라크 월드와이드, 인크. | 생체활성 제제를 전달하기 위한 이식형 기구 |
TW201445246A (zh) * | 2013-05-31 | 2014-12-01 | Nanocrystal Asia Inc | 無缺陷模仁之製造方法 |
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US4336320A (en) * | 1981-03-12 | 1982-06-22 | Honeywell Inc. | Process for dielectric stenciled microcircuits |
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JPH085072B2 (ja) * | 1987-12-29 | 1996-01-24 | キヤノン株式会社 | 情報記録媒体用基板の製造方法 |
JPH01309989A (ja) * | 1988-06-09 | 1989-12-14 | Asahi Glass Co Ltd | 樹脂またはガラス基板成型用スタンパー |
JPH02149952A (ja) * | 1988-11-30 | 1990-06-08 | Sharp Corp | スタンパー製造方法 |
DE3937308C1 (ja) * | 1989-11-09 | 1991-03-21 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De | |
JPH04109536A (ja) * | 1990-08-29 | 1992-04-10 | Mitsubishi Electric Corp | プラズマデイスプレイの製造方法 |
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JP3077188B2 (ja) * | 1990-10-22 | 2000-08-14 | ブラザー工業株式会社 | 光導波路の製造方法 |
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US5512131A (en) | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
US5494782A (en) * | 1994-07-29 | 1996-02-27 | Sony Corporation | Direct to stamper/mother optical disk mastering |
DE19510096A1 (de) * | 1995-03-20 | 1996-09-26 | Leybold Ag | Matrize zum Abformen von Schallaufzeichnungen und Verfahren zu ihrer Herstellung |
US5944974A (en) * | 1995-07-01 | 1999-08-31 | Fahrenberg; Jens | Process for manufacturing mold inserts |
US5645977A (en) | 1995-09-22 | 1997-07-08 | Industrial Technology Research Institute | Method of making molds for manufacturing multiple-lead microstructures |
US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
DE19755712B4 (de) * | 1997-12-15 | 2005-09-01 | Industrial Technology Research Institute, Chutung | Verfahren zum Erzeugen von Stanzstempeln für gestanzte IC-Mikrostrukturen |
DE19815130A1 (de) | 1998-04-03 | 1999-10-14 | Bosch Gmbh Robert | Herstellung eines metallischen Stempels zur Definition von Nanostrukturen |
EP1171800B1 (en) * | 2000-02-07 | 2006-04-19 | Koninklijke Philips Electronics N.V. | Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate |
WO2003099536A1 (en) * | 2002-05-24 | 2003-12-04 | Chou Stephen Y | Methods and apparatus of field-induced pressure imprint lithography |
-
2000
- 2000-05-24 SE SE0001931A patent/SE516414C2/sv not_active IP Right Cessation
-
2001
- 2001-04-10 JP JP2001586524A patent/JP2003534651A/ja active Pending
- 2001-04-10 DE DE60142393T patent/DE60142393D1/de not_active Expired - Lifetime
- 2001-04-10 EP EP01920080A patent/EP1290497B1/en not_active Expired - Lifetime
- 2001-04-10 AT AT01920080T patent/ATE471533T1/de not_active IP Right Cessation
- 2001-04-10 CN CNB01809984XA patent/CN1236359C/zh not_active Expired - Fee Related
- 2001-04-10 WO PCT/SE2001/000787 patent/WO2001090816A1/en active Application Filing
- 2001-04-10 US US10/296,326 patent/US7022465B2/en not_active Expired - Lifetime
- 2001-04-10 AU AU2001247025A patent/AU2001247025A1/en not_active Abandoned
-
2003
- 2003-07-21 HK HK03105231.5A patent/HK1052978B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US7022465B2 (en) | 2006-04-04 |
AU2001247025A1 (en) | 2001-12-03 |
SE0001931D0 (sv) | 2000-05-24 |
US20030139042A1 (en) | 2003-07-24 |
CN1236359C (zh) | 2006-01-11 |
DE60142393D1 (de) | 2010-07-29 |
SE0001931L (sv) | 2001-11-25 |
ATE471533T1 (de) | 2010-07-15 |
EP1290497B1 (en) | 2010-06-16 |
HK1052978B (zh) | 2010-09-17 |
CN1434930A (zh) | 2003-08-06 |
HK1052978A1 (en) | 2003-10-03 |
JP2003534651A (ja) | 2003-11-18 |
EP1290497A1 (en) | 2003-03-12 |
WO2001090816A1 (en) | 2001-11-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |