SE0001931L - Metod vid tillverkning av en mall, samt mallen tillverkad därav - Google Patents

Metod vid tillverkning av en mall, samt mallen tillverkad därav

Info

Publication number
SE0001931L
SE0001931L SE0001931A SE0001931A SE0001931L SE 0001931 L SE0001931 L SE 0001931L SE 0001931 A SE0001931 A SE 0001931A SE 0001931 A SE0001931 A SE 0001931A SE 0001931 L SE0001931 L SE 0001931L
Authority
SE
Sweden
Prior art keywords
template
plate
producing
well
production
Prior art date
Application number
SE0001931A
Other languages
English (en)
Other versions
SE516414C2 (sv
SE0001931D0 (sv
Inventor
Babak Heidari
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0001931A priority Critical patent/SE516414C2/sv
Publication of SE0001931D0 publication Critical patent/SE0001931D0/sv
Priority to PCT/SE2001/000787 priority patent/WO2001090816A1/en
Priority to EP01920080A priority patent/EP1290497B1/en
Priority to AU2001247025A priority patent/AU2001247025A1/en
Priority to CNB01809984XA priority patent/CN1236359C/zh
Priority to AT01920080T priority patent/ATE471533T1/de
Priority to DE60142393T priority patent/DE60142393D1/de
Priority to US10/296,326 priority patent/US7022465B2/en
Priority to JP2001586524A priority patent/JP2003534651A/ja
Publication of SE0001931L publication Critical patent/SE0001931L/sv
Publication of SE516414C2 publication Critical patent/SE516414C2/sv
Priority to HK03105231.5A priority patent/HK1052978B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Micromachines (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Magnetic Ceramics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Auxiliary Devices For Music (AREA)
  • Mechanical Coupling Of Light Guides (AREA)
  • Adornments (AREA)
SE0001931A 2000-05-24 2000-05-24 Metod vid tillverkning av en mall, samt mallen tillverkad därav SE516414C2 (sv)

Priority Applications (10)

Application Number Priority Date Filing Date Title
SE0001931A SE516414C2 (sv) 2000-05-24 2000-05-24 Metod vid tillverkning av en mall, samt mallen tillverkad därav
JP2001586524A JP2003534651A (ja) 2000-05-24 2001-04-10 テンプレートの製作に関する方法およびその方法で製作されるテンプレート
CNB01809984XA CN1236359C (zh) 2000-05-24 2001-04-10 有关模板的制造方法和制成的模板
EP01920080A EP1290497B1 (en) 2000-05-24 2001-04-10 Method for the production of a template and the template thus produced
AU2001247025A AU2001247025A1 (en) 2000-05-24 2001-04-10 Method in connection with the production of a template and the template thus produced
PCT/SE2001/000787 WO2001090816A1 (en) 2000-05-24 2001-04-10 Method in connection with the production of a template and the template thus produced
AT01920080T ATE471533T1 (de) 2000-05-24 2001-04-10 Verfahren zur herstellung einer schablone
DE60142393T DE60142393D1 (de) 2000-05-24 2001-04-10 Verfahren zur herstellung einer schablone
US10/296,326 US7022465B2 (en) 2000-05-24 2001-04-10 Method in connection with the production of a template and the template thus produced
HK03105231.5A HK1052978B (zh) 2000-05-24 2003-07-21 模板的製造方法和製成的模板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0001931A SE516414C2 (sv) 2000-05-24 2000-05-24 Metod vid tillverkning av en mall, samt mallen tillverkad därav

Publications (3)

Publication Number Publication Date
SE0001931D0 SE0001931D0 (sv) 2000-05-24
SE0001931L true SE0001931L (sv) 2001-11-25
SE516414C2 SE516414C2 (sv) 2002-01-15

Family

ID=20279811

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0001931A SE516414C2 (sv) 2000-05-24 2000-05-24 Metod vid tillverkning av en mall, samt mallen tillverkad därav

Country Status (10)

Country Link
US (1) US7022465B2 (sv)
EP (1) EP1290497B1 (sv)
JP (1) JP2003534651A (sv)
CN (1) CN1236359C (sv)
AT (1) ATE471533T1 (sv)
AU (1) AU2001247025A1 (sv)
DE (1) DE60142393D1 (sv)
HK (1) HK1052978B (sv)
SE (1) SE516414C2 (sv)
WO (1) WO2001090816A1 (sv)

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EP1303793B1 (en) 2000-07-17 2015-01-28 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
GB0229191D0 (en) * 2002-12-14 2003-01-22 Plastic Logic Ltd Embossing of polymer devices
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US6805054B1 (en) 2003-05-14 2004-10-19 Molecular Imprints, Inc. Method, system and holder for transferring templates during imprint lithography processes
JP4892684B2 (ja) * 2004-01-12 2012-03-07 ザ・リージェンツ・オブ・ザ・ユニバーシティ・オブ・カリフォルニア ナノスケール電気リソグラフィー法
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
CN101427182B (zh) * 2004-04-27 2011-10-19 伊利诺伊大学评议会 用于软光刻法的复合构图设备
AU2005282060A1 (en) * 2004-09-08 2006-03-16 Nil Technology Aps A flexible nano-imprint stamp
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
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US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7329115B2 (en) * 2005-02-18 2008-02-12 Hewlett-Packard Development Company, L.P. Patterning nanoline arrays with spatially varying pitch
US7523701B2 (en) 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
US7762186B2 (en) * 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
EP1795958A1 (en) * 2005-12-07 2007-06-13 Electronics And Telecommunications Research Institute Method of fabricating nanoimprint mold
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
CN100396595C (zh) * 2005-12-27 2008-06-25 北京大学 应用纳米压印和反应离子刻蚀术制备纳米悬臂结构的方法
US20070134943A2 (en) * 2006-04-02 2007-06-14 Dunnrowicz Clarence J Subtractive - Additive Edge Defined Lithography
US20080023885A1 (en) * 2006-06-15 2008-01-31 Nanochip, Inc. Method for forming a nano-imprint lithography template having very high feature counts
US20070290282A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Bonded chip assembly with a micro-mover for microelectromechanical systems
US20070291623A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Cantilever with control of vertical and lateral position of contact probe tip
US20070121477A1 (en) * 2006-06-15 2007-05-31 Nanochip, Inc. Cantilever with control of vertical and lateral position of contact probe tip
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
JP5061525B2 (ja) * 2006-08-04 2012-10-31 株式会社日立製作所 インプリント方法及びインプリント装置
US20080074984A1 (en) * 2006-09-21 2008-03-27 Nanochip, Inc. Architecture for a Memory Device
US20080074792A1 (en) * 2006-09-21 2008-03-27 Nanochip, Inc. Control scheme for a memory device
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
US7906274B2 (en) 2007-11-21 2011-03-15 Molecular Imprints, Inc. Method of creating a template employing a lift-off process
WO2011135532A2 (en) 2010-04-28 2011-11-03 Kimberly-Clark Worldwide, Inc. Composite microneedle array including nanostructures thereon
US11110066B2 (en) 2011-10-27 2021-09-07 Sorrento Therapeutics, Inc. Implantable devices for delivery of bioactive agents
TW201445246A (zh) * 2013-05-31 2014-12-01 Nanocrystal Asia Inc 無缺陷模仁之製造方法

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Also Published As

Publication number Publication date
CN1236359C (zh) 2006-01-11
ATE471533T1 (de) 2010-07-15
AU2001247025A1 (en) 2001-12-03
EP1290497A1 (en) 2003-03-12
HK1052978B (zh) 2010-09-17
CN1434930A (zh) 2003-08-06
HK1052978A1 (en) 2003-10-03
US20030139042A1 (en) 2003-07-24
SE516414C2 (sv) 2002-01-15
US7022465B2 (en) 2006-04-04
WO2001090816A1 (en) 2001-11-29
SE0001931D0 (sv) 2000-05-24
EP1290497B1 (en) 2010-06-16
DE60142393D1 (de) 2010-07-29
JP2003534651A (ja) 2003-11-18

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