SE435108B - Forfarande for framstellning av reliefartade uppteckningar genom att kontinuerligt pafora minst tva fotopolymeriserbara delskikt pa en temporer berare - Google Patents

Forfarande for framstellning av reliefartade uppteckningar genom att kontinuerligt pafora minst tva fotopolymeriserbara delskikt pa en temporer berare

Info

Publication number
SE435108B
SE435108B SE7714551A SE7714551A SE435108B SE 435108 B SE435108 B SE 435108B SE 7714551 A SE7714551 A SE 7714551A SE 7714551 A SE7714551 A SE 7714551A SE 435108 B SE435108 B SE 435108B
Authority
SE
Sweden
Prior art keywords
layer
photopolymerizable
carrier
temporary
preparing
Prior art date
Application number
SE7714551A
Other languages
English (en)
Swedish (sv)
Other versions
SE7714551L (sv
Inventor
W Franke
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SE7714551L publication Critical patent/SE7714551L/xx
Publication of SE435108B publication Critical patent/SE435108B/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SE7714551A 1976-12-23 1977-12-21 Forfarande for framstellning av reliefartade uppteckningar genom att kontinuerligt pafora minst tva fotopolymeriserbara delskikt pa en temporer berare SE435108B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2658422A DE2658422C2 (de) 1976-12-23 1976-12-23 Verfahren zur Herstellung eines Negativ-Trockenresistfilms

Publications (2)

Publication Number Publication Date
SE7714551L SE7714551L (sv) 1978-06-24
SE435108B true SE435108B (sv) 1984-09-03

Family

ID=5996394

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7714551A SE435108B (sv) 1976-12-23 1977-12-21 Forfarande for framstellning av reliefartade uppteckningar genom att kontinuerligt pafora minst tva fotopolymeriserbara delskikt pa en temporer berare

Country Status (11)

Country Link
US (1) US4337308A (nl)
JP (1) JPS5382322A (nl)
BE (1) BE862048A (nl)
BR (1) BR7708588A (nl)
CH (1) CH635203A5 (nl)
DE (1) DE2658422C2 (nl)
FR (1) FR2375624A1 (nl)
GB (1) GB1597607A (nl)
IT (1) IT1090632B (nl)
NL (1) NL186723C (nl)
SE (1) SE435108B (nl)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2047909B (en) * 1978-12-25 1982-10-06 Karpov V D Dry film photoresist
US4349620A (en) 1979-06-15 1982-09-14 E. I. Du Pont De Nemours And Company Solvent developable photoresist film
JPS58134632A (ja) * 1982-02-05 1983-08-10 Mitsubishi Rayon Co Ltd 感光性積層物
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
DE4024908A1 (de) * 1990-08-06 1992-02-20 Ant Nachrichtentech Verfahren zum herstellen von resistmustern auf substraten
US5288589A (en) * 1992-12-03 1994-02-22 Mckeever Mark R Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
US5405731A (en) * 1992-12-22 1995-04-11 E. I. Du Pont De Nemours And Company Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
EP0729071A1 (de) * 1995-02-15 1996-08-28 Schablonentechnik Kufstein Aktiengesellschaft Verfahren zur Herstellung einer Druckschablone
AU5428000A (en) 1999-06-24 2001-01-09 Hitachi Chemical Co. Ltd. Photosensitive element, photosensitive element roll, process for producing resist pattern with the same, resist pattern, substrate with overlying resist pattern, process for producing wiring pattern, and wiring pattern
JP2004020643A (ja) * 2002-06-12 2004-01-22 Fuji Photo Film Co Ltd ドライフィルムレジスト及びプリント基板の製造方法
JP5264589B2 (ja) * 2008-03-28 2013-08-14 富士フイルム株式会社 同時２光子吸収３次元光記録媒体および同時２光子３次元光記録方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2964401A (en) * 1957-02-18 1960-12-13 Du Pont Photopolymerizable elements and processes
GB841454A (en) * 1957-09-16 1960-07-13 Du Pont Improvements in or relating to photopolymerisable elements
NL245513A (nl) * 1959-01-23
US3615435A (en) * 1968-02-14 1971-10-26 Du Pont Photohardenable image reproduction element with integral pigmented layer and process for use
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
BE755709A (fr) * 1969-10-29 1971-02-15 Shipley Co Procede d'application d'une reserve photographique sur un support et produit obtenu
BE759791A (nl) * 1969-12-11 1971-06-03 Agfa Gevaert Nv Installatie voor het opdragen van verschillende lagen
US3785817A (en) * 1970-10-05 1974-01-15 A Kuchta Transfer of photopolymer images by irradiation
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
US3770438A (en) * 1971-12-09 1973-11-06 J Celeste Photopolymerizable transfer elements
US3982943A (en) * 1974-03-05 1976-09-28 Ibm Corporation Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask
DE2448850C2 (de) * 1974-10-14 1986-03-13 Hoechst Ag, 6230 Frankfurt Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial
JPS6032173B2 (ja) * 1974-12-28 1985-07-26 富士写真フイルム株式会社 画像形成法

Also Published As

Publication number Publication date
DE2658422A1 (de) 1978-06-29
CH635203A5 (de) 1983-03-15
NL7714128A (nl) 1978-06-27
NL186723C (nl) 1991-02-01
FR2375624B1 (nl) 1980-08-22
BR7708588A (pt) 1978-08-08
IT1090632B (it) 1985-06-26
BE862048A (fr) 1978-06-20
SE7714551L (sv) 1978-06-24
DE2658422C2 (de) 1986-05-22
GB1597607A (en) 1981-09-09
FR2375624A1 (fr) 1978-07-21
JPS5382322A (en) 1978-07-20
US4337308A (en) 1982-06-29
NL186723B (nl) 1990-09-03
JPS6131855B2 (nl) 1986-07-23

Similar Documents

Publication Publication Date Title
SE435108B (sv) Forfarande for framstellning av reliefartade uppteckningar genom att kontinuerligt pafora minst tva fotopolymeriserbara delskikt pa en temporer berare
US3892900A (en) Masking films
JP2000330236A (ja) 画像形成要素用のポリマーオーバーコート
JPS5812577B2 (ja) 光重合可能な複写材料
JP2005509869A5 (nl)
CN1202638A (zh) 光敏性记录材料的制备方法
US4581308A (en) Process for preparation of a masking element for forming a multicolor printing plate
GB1581870A (en) Photographic film base
US4369244A (en) Imaging process and article employing photolabile, blocked surfactant
JPS58199074A (ja) 多層同時塗布方法
DE2733581C3 (de) Lichthärtbares Aufzeichnungsmaterial sowie Verfahren zur Herstellung negativer tonbarer Bilder
US4668602A (en) Instant film unit
US4407932A (en) Fade-resistant and abrasion resistant photographic reproduction, method of preparing, and photographic product therefor
US4467022A (en) Imaging process and article employing photolabile, blocked surfactant
JPS62212682A (ja) パタ−ン状ホログラム転写シ−ト
DE4311502C2 (de) Verfahren zur Erzeugung eines Mehrfarbenbildes
US4569898A (en) Photographic film unit with protective, limited swell polymer for silver halide grains
JPS6124999B2 (nl)
US786534A (en) Transparent-paper stripping-film for photographs.
JPS58119885A (ja) 感圧性粘着シ−ト
FR2459498A1 (fr) Structures photographiques composites et leurs utilisations
US1212446A (en) Movable plate applicable to the manufacture of positive cinematograph-films and process of obtaining the same.
US861472A (en) Photographic film.
JPS5928155A (ja) 写真パネルの製造方法
US2040575A (en) Method for the production of color cinematograph films

Legal Events

Date Code Title Description
NAL Patent in force

Ref document number: 7714551-4

Format of ref document f/p: F

NUG Patent has lapsed

Ref document number: 7714551-4

Format of ref document f/p: F