JPS5382322A - Method of producing relief recording material - Google Patents

Method of producing relief recording material

Info

Publication number
JPS5382322A
JPS5382322A JP15548277A JP15548277A JPS5382322A JP S5382322 A JPS5382322 A JP S5382322A JP 15548277 A JP15548277 A JP 15548277A JP 15548277 A JP15548277 A JP 15548277A JP S5382322 A JPS5382322 A JP S5382322A
Authority
JP
Japan
Prior art keywords
recording material
producing relief
relief recording
producing
relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15548277A
Other languages
English (en)
Other versions
JPS6131855B2 (ja
Inventor
Furanke Bueruneru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS5382322A publication Critical patent/JPS5382322A/ja
Publication of JPS6131855B2 publication Critical patent/JPS6131855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP15548277A 1976-12-23 1977-12-23 Method of producing relief recording material Granted JPS5382322A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2658422A DE2658422C2 (de) 1976-12-23 1976-12-23 Verfahren zur Herstellung eines Negativ-Trockenresistfilms

Publications (2)

Publication Number Publication Date
JPS5382322A true JPS5382322A (en) 1978-07-20
JPS6131855B2 JPS6131855B2 (ja) 1986-07-23

Family

ID=5996394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15548277A Granted JPS5382322A (en) 1976-12-23 1977-12-23 Method of producing relief recording material

Country Status (11)

Country Link
US (1) US4337308A (ja)
JP (1) JPS5382322A (ja)
BE (1) BE862048A (ja)
BR (1) BR7708588A (ja)
CH (1) CH635203A5 (ja)
DE (1) DE2658422C2 (ja)
FR (1) FR2375624A1 (ja)
GB (1) GB1597607A (ja)
IT (1) IT1090632B (ja)
NL (1) NL186723C (ja)
SE (1) SE435108B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58134632A (ja) * 1982-02-05 1983-08-10 Mitsubishi Rayon Co Ltd 感光性積層物
JPH06282068A (ja) * 1992-12-22 1994-10-07 E I Du Pont De Nemours & Co 印刷回路のための水性処理可能な多層の光像形成性永久コーティング

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55501072A (ja) * 1978-12-25 1980-12-04
US4349620A (en) 1979-06-15 1982-09-14 E. I. Du Pont De Nemours And Company Solvent developable photoresist film
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
DE3606266A1 (de) * 1986-02-27 1987-09-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3618373A1 (de) * 1986-05-31 1987-12-03 Basf Ag Lichtempfindliches aufzeichnungselement
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
DE4024908A1 (de) * 1990-08-06 1992-02-20 Ant Nachrichtentech Verfahren zum herstellen von resistmustern auf substraten
US5288589A (en) * 1992-12-03 1994-02-22 Mckeever Mark R Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
EP0729071A1 (de) * 1995-02-15 1996-08-28 Schablonentechnik Kufstein Aktiengesellschaft Verfahren zur Herstellung einer Druckschablone
EP1205802A4 (en) 1999-06-24 2009-07-15 Hitachi Chemical Co Ltd PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, RESIN PATTERN MANUFACTURING METHOD, RESIN PATTERN, SUBSTRATE WITH RESILIENT RESIN PATTERN, WIRING PATTERN MANUFACTURING METHOD, AND WIRING PATTERN THEREFOR
JP2004020643A (ja) * 2002-06-12 2004-01-22 Fuji Photo Film Co Ltd ドライフィルムレジスト及びプリント基板の製造方法
JP5264589B2 (ja) * 2008-03-28 2013-08-14 富士フイルム株式会社 同時２光子吸収３次元光記録媒体および同時２光子３次元光記録方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2964401A (en) * 1957-02-18 1960-12-13 Du Pont Photopolymerizable elements and processes
GB841454A (en) * 1957-09-16 1960-07-13 Du Pont Improvements in or relating to photopolymerisable elements
NL245513A (ja) * 1959-01-23
US3615435A (en) * 1968-02-14 1971-10-26 Du Pont Photohardenable image reproduction element with integral pigmented layer and process for use
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
BE755709A (fr) * 1969-10-29 1971-02-15 Shipley Co Procede d'application d'une reserve photographique sur un support et produit obtenu
BE759791A (nl) * 1969-12-11 1971-06-03 Agfa Gevaert Nv Installatie voor het opdragen van verschillende lagen
US3785817A (en) * 1970-10-05 1974-01-15 A Kuchta Transfer of photopolymer images by irradiation
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
US3770438A (en) * 1971-12-09 1973-11-06 J Celeste Photopolymerizable transfer elements
US3982943A (en) * 1974-03-05 1976-09-28 Ibm Corporation Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask
DE2448850C2 (de) * 1974-10-14 1986-03-13 Hoechst Ag, 6230 Frankfurt Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial
JPS6032173B2 (ja) * 1974-12-28 1985-07-26 富士写真フイルム株式会社 画像形成法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58134632A (ja) * 1982-02-05 1983-08-10 Mitsubishi Rayon Co Ltd 感光性積層物
JPH06282068A (ja) * 1992-12-22 1994-10-07 E I Du Pont De Nemours & Co 印刷回路のための水性処理可能な多層の光像形成性永久コーティング

Also Published As

Publication number Publication date
SE435108B (sv) 1984-09-03
NL186723B (nl) 1990-09-03
FR2375624B1 (ja) 1980-08-22
US4337308A (en) 1982-06-29
BR7708588A (pt) 1978-08-08
CH635203A5 (de) 1983-03-15
IT1090632B (it) 1985-06-26
DE2658422C2 (de) 1986-05-22
FR2375624A1 (fr) 1978-07-21
BE862048A (fr) 1978-06-20
DE2658422A1 (de) 1978-06-29
GB1597607A (en) 1981-09-09
NL7714128A (nl) 1978-06-27
JPS6131855B2 (ja) 1986-07-23
SE7714551L (sv) 1978-06-24
NL186723C (nl) 1991-02-01

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