JPS55501072A - - Google Patents

Info

Publication number
JPS55501072A
JPS55501072A JP50016979A JP50016979A JPS55501072A JP S55501072 A JPS55501072 A JP S55501072A JP 50016979 A JP50016979 A JP 50016979A JP 50016979 A JP50016979 A JP 50016979A JP S55501072 A JPS55501072 A JP S55501072A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50016979A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS55501072A publication Critical patent/JPS55501072A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
JP50016979A 1978-12-25 1979-12-14 Pending JPS55501072A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SU2695701 1978-12-25
FR8015410A FR2486671A1 (fr) 1978-12-25 1980-07-10 Photoresists secs a couches minces

Publications (1)

Publication Number Publication Date
JPS55501072A true JPS55501072A (ja) 1980-12-04

Family

ID=26221887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50016979A Pending JPS55501072A (ja) 1978-12-25 1979-12-14

Country Status (6)

Country Link
US (1) US4318975A (ja)
JP (1) JPS55501072A (ja)
DE (1) DE2953429T1 (ja)
FR (1) FR2486671A1 (ja)
GB (1) GB2047909B (ja)
WO (1) WO1980001321A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0283546A (ja) * 1988-09-20 1990-03-23 Toray Ind Inc フォトレジストフィルム
US7592124B2 (en) 1999-06-24 2009-09-22 Hitachi Chemical Co., Ltd. Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern
US8092980B2 (en) 2007-01-31 2012-01-10 Hitachi Chemical Company, Ltd. Photosensitive element
US9439291B2 (en) 2010-12-16 2016-09-06 Hitachi Chemical Company, Ltd. Photosensitive element, method for forming resist pattern, and method for producing printed circuit board

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1980001321A1 (en) * 1978-12-25 1980-06-26 N Smirnova Dry film photoresist
JPS58196971A (ja) * 1982-05-13 1983-11-16 Asahi Chem Ind Co Ltd サンドブラスト用マスクの製造方法
US4992354A (en) * 1988-02-26 1991-02-12 Morton International, Inc. Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like
US5213945A (en) * 1988-02-26 1993-05-25 Morton International, Inc. Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like
US5077175A (en) * 1988-08-30 1991-12-31 E. I. Du Pont De Nemours And Company Plasticized polyvinyl alcohol release layer for a flexographic printing plate
DE4030622B4 (de) * 1989-09-28 2005-11-17 Fuji Photo Film Co., Ltd., Minami-Ashigara Bildempfangsblatt
JPH0580503A (ja) * 1991-06-25 1993-04-02 Fuji Photo Film Co Ltd 感光性転写材料及び画像形成方法
US5442517A (en) * 1993-05-28 1995-08-15 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Cellulose triacetate, thin film dielectric capacitor
US5955244A (en) * 1996-08-20 1999-09-21 Quantum Corporation Method for forming photoresist features having reentrant profiles using a basic agent
US6143387A (en) * 1997-07-28 2000-11-07 Kubler; Virginia L. UV shield
DE69808587T2 (de) * 1997-11-27 2003-07-10 Agfa-Gevaert, Mortsel Strahlungsempfindliches Material mit einem mehrschichtigen Trägermaterial
WO2001073510A1 (fr) * 2000-03-29 2001-10-04 Kanagawa University Composition de resine photodurcissante/thermodurcissante, couche seche photosensible preparee au moyen de cette resine et procede de creation de configurations
DE10260235B4 (de) * 2002-12-20 2010-10-28 Infineon Technologies Ag Verfahren zum Strukturieren einer Resistschicht und Negativ-Resistschicht
US20060257785A1 (en) * 2005-05-13 2006-11-16 Johnson Donald W Method of forming a photoresist element
US20090186293A1 (en) * 2008-01-23 2009-07-23 Bryan Thomas Fannin Dry film protoresist for a micro-fluid ejection head and method therefor
CN102799070B (zh) * 2012-08-27 2014-03-05 珠海市能动科技光学产业有限公司 双层涂布的负性光致抗蚀干膜
JP6225053B2 (ja) * 2014-03-20 2017-11-01 富士フイルム株式会社 感光性積層体、転写材料、パターン化された感光性積層体及びその製造方法、タッチパネル、並びに画像表示装置
DE102014222535B3 (de) 2014-11-05 2016-03-17 Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. Verfahren zur Herstellung eines ultrakompakten Mikrokondensators und damit hergestellter Kondensator

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1285876B (de) * 1964-06-16 1968-12-19 Du Pont Fotopolymerisierbares Aufzeichnungsmaterial
US3661576A (en) * 1970-02-09 1972-05-09 Brady Co W H Photopolymerizable compositions and articles
DE2106574A1 (de) * 1970-03-03 1971-09-23 Shpley Co Inc Lichtempfindliches Laminat
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
US3754920A (en) * 1971-04-30 1973-08-28 Du Pont Photopolymerizable elements of low optical density containing thickeners with discrete orderly orientation
DE2123702C3 (de) * 1971-05-13 1988-05-26 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Reliefbildes
CA1051707A (en) * 1973-10-25 1979-04-03 Michael Gulla Photoresist film with non-photosensitive resist layer
US3873319A (en) * 1974-01-31 1975-03-25 Minnesota Mining & Mfg Dry-film negative photoresist having amidized styrene-maleic anhydride binder material
GB1521766A (en) * 1974-11-13 1978-08-16 Minnesota Mining & Mfg Image transfer element
US4247619A (en) * 1979-12-20 1981-01-27 E. I. Du Pont De Nemours And Company Negative-working multilayer photosensitive tonable element
SU941918A1 (ru) * 1976-08-10 1982-07-07 Предприятие П/Я Г-4444 Сухой пленочный фоторезист
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
US4262080A (en) * 1978-10-31 1981-04-14 Nasa Method for applying photographic resist to otherwise incompatible substrates
WO1980001321A1 (en) * 1978-12-25 1980-06-26 N Smirnova Dry film photoresist

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0283546A (ja) * 1988-09-20 1990-03-23 Toray Ind Inc フォトレジストフィルム
US7592124B2 (en) 1999-06-24 2009-09-22 Hitachi Chemical Co., Ltd. Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern
US8092980B2 (en) 2007-01-31 2012-01-10 Hitachi Chemical Company, Ltd. Photosensitive element
US9439291B2 (en) 2010-12-16 2016-09-06 Hitachi Chemical Company, Ltd. Photosensitive element, method for forming resist pattern, and method for producing printed circuit board

Also Published As

Publication number Publication date
FR2486671A1 (fr) 1982-01-15
WO1980001321A1 (en) 1980-06-26
GB2047909B (en) 1982-10-06
US4318975A (en) 1982-03-09
GB2047909A (en) 1980-12-03
DE2953429T1 (de) 1980-12-18
DE2953429C2 (ja) 1989-02-09

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