FR2375624A1 - Procede pour l'obtention d'enregistrements en relief - Google Patents
Procede pour l'obtention d'enregistrements en reliefInfo
- Publication number
- FR2375624A1 FR2375624A1 FR7738594A FR7738594A FR2375624A1 FR 2375624 A1 FR2375624 A1 FR 2375624A1 FR 7738594 A FR7738594 A FR 7738594A FR 7738594 A FR7738594 A FR 7738594A FR 2375624 A1 FR2375624 A1 FR 2375624A1
- Authority
- FR
- France
- Prior art keywords
- layer
- photopolymerizable
- support
- procedure
- washing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
L'invention est relative à un procédé pour l'obtention d'enregistrement en relief au cours duquel on applique une matière de transfert de couche comprenant une couche photopolymérisable rigide sur un support de couche temporaire flexible, de telle façon sur un support de couche permanent que la couche photopolymérisable soit reliée solidement à cette dernière, on expose la couche photopolymérisable reliée au support permanent à la lumière selon une image, on enlève le support de couche temporaire avant ou après l'exposition, on enlève les parties non exposées de la couche par lavage avec un révélateur et on modifie éventuellement par attaque ou par dépôt de métal la partie de la surface mise à nu par le lavage, caractérisé en ce que l'on utilise une couche photopolymérisable composée d'au moins deux couches partielles photopolymérisables de compositions différentes.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2658422A DE2658422C2 (de) | 1976-12-23 | 1976-12-23 | Verfahren zur Herstellung eines Negativ-Trockenresistfilms |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2375624A1 true FR2375624A1 (fr) | 1978-07-21 |
FR2375624B1 FR2375624B1 (fr) | 1980-08-22 |
Family
ID=5996394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7738594A Granted FR2375624A1 (fr) | 1976-12-23 | 1977-12-21 | Procede pour l'obtention d'enregistrements en relief |
Country Status (11)
Country | Link |
---|---|
US (1) | US4337308A (fr) |
JP (1) | JPS5382322A (fr) |
BE (1) | BE862048A (fr) |
BR (1) | BR7708588A (fr) |
CH (1) | CH635203A5 (fr) |
DE (1) | DE2658422C2 (fr) |
FR (1) | FR2375624A1 (fr) |
GB (1) | GB1597607A (fr) |
IT (1) | IT1090632B (fr) |
NL (1) | NL186723C (fr) |
SE (1) | SE435108B (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2486671A1 (fr) * | 1978-12-25 | 1982-01-15 | Kuznetsov Vladimir | Photoresists secs a couches minces |
EP0729071A1 (fr) * | 1995-02-15 | 1996-08-28 | Schablonentechnik Kufstein Aktiengesellschaft | Procédé pour la fabrication d'une matrice d'impression |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4349620A (en) | 1979-06-15 | 1982-09-14 | E. I. Du Pont De Nemours And Company | Solvent developable photoresist film |
JPS58134632A (ja) * | 1982-02-05 | 1983-08-10 | Mitsubishi Rayon Co Ltd | 感光性積層物 |
US4504566A (en) * | 1982-11-01 | 1985-03-12 | E. I. Du Pont De Nemours And Company | Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers |
US4786569A (en) * | 1985-09-04 | 1988-11-22 | Ciba-Geigy Corporation | Adhesively bonded photostructurable polyimide film |
DE3606266A1 (de) * | 1986-02-27 | 1987-09-03 | Basf Ag | Lichtempfindliches aufzeichnungselement |
DE3618373A1 (de) * | 1986-05-31 | 1987-12-03 | Basf Ag | Lichtempfindliches aufzeichnungselement |
DE3827245A1 (de) * | 1988-08-11 | 1990-02-15 | Hoechst Ag | Photopolymerisierbares aufzeichnungsmaterial |
DE4024908A1 (de) * | 1990-08-06 | 1992-02-20 | Ant Nachrichtentech | Verfahren zum herstellen von resistmustern auf substraten |
US5288589A (en) * | 1992-12-03 | 1994-02-22 | Mckeever Mark R | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits |
US5405731A (en) * | 1992-12-22 | 1995-04-11 | E. I. Du Pont De Nemours And Company | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits |
EP1205802A4 (fr) | 1999-06-24 | 2009-07-15 | Hitachi Chemical Co Ltd | Element photosensible, rouleau d'element photosensible, procede de fabrication d'un motif de resine, motif de resine, substrat avec motif de resine sus-jacent, procede de fabrication d'un motif de cablage et motif de cablage associe |
JP2004020643A (ja) * | 2002-06-12 | 2004-01-22 | Fuji Photo Film Co Ltd | ドライフィルムレジスト及びプリント基板の製造方法 |
JP5264589B2 (ja) * | 2008-03-28 | 2013-08-14 | 富士フイルム株式会社 | 同時2光子吸収3次元光記録媒体および同時2光子3次元光記録方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE755709A (fr) * | 1969-10-29 | 1971-02-15 | Shipley Co | Procede d'application d'une reserve photographique sur un support et produit obtenu |
DE2558530A1 (de) * | 1974-12-28 | 1976-07-08 | Fuji Photo Film Co Ltd | Bilderzeugungsverfahren |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2964401A (en) * | 1957-02-18 | 1960-12-13 | Du Pont | Photopolymerizable elements and processes |
GB841454A (en) * | 1957-09-16 | 1960-07-13 | Du Pont | Improvements in or relating to photopolymerisable elements |
NL245513A (fr) * | 1959-01-23 | |||
US3615435A (en) * | 1968-02-14 | 1971-10-26 | Du Pont | Photohardenable image reproduction element with integral pigmented layer and process for use |
US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
BE759791A (nl) * | 1969-12-11 | 1971-06-03 | Agfa Gevaert Nv | Installatie voor het opdragen van verschillende lagen |
US3785817A (en) * | 1970-10-05 | 1974-01-15 | A Kuchta | Transfer of photopolymer images by irradiation |
CA993709A (en) * | 1971-01-21 | 1976-07-27 | Leo Roos | Composite, mask-forming photohardenable elements |
US3770438A (en) * | 1971-12-09 | 1973-11-06 | J Celeste | Photopolymerizable transfer elements |
US3982943A (en) * | 1974-03-05 | 1976-09-28 | Ibm Corporation | Lift-off method of fabricating thin films and a structure utilizable as a lift-off mask |
DE2448850C2 (de) * | 1974-10-14 | 1986-03-13 | Hoechst Ag, 6230 Frankfurt | Verfahren zum Übertragen einer trockenen thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial |
-
1976
- 1976-12-23 DE DE2658422A patent/DE2658422C2/de not_active Expired
-
1977
- 1977-12-20 NL NLAANVRAGE7714128,A patent/NL186723C/xx not_active IP Right Cessation
- 1977-12-20 BE BE183613A patent/BE862048A/fr not_active IP Right Cessation
- 1977-12-20 CH CH1566377A patent/CH635203A5/de not_active IP Right Cessation
- 1977-12-21 GB GB53174/77A patent/GB1597607A/en not_active Expired
- 1977-12-21 FR FR7738594A patent/FR2375624A1/fr active Granted
- 1977-12-21 SE SE7714551A patent/SE435108B/sv not_active IP Right Cessation
- 1977-12-22 BR BR7708588A patent/BR7708588A/pt unknown
- 1977-12-22 IT IT52332/77A patent/IT1090632B/it active
- 1977-12-23 JP JP15548277A patent/JPS5382322A/ja active Granted
-
1979
- 1979-09-07 US US06/073,473 patent/US4337308A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE755709A (fr) * | 1969-10-29 | 1971-02-15 | Shipley Co | Procede d'application d'une reserve photographique sur un support et produit obtenu |
DE2558530A1 (de) * | 1974-12-28 | 1976-07-08 | Fuji Photo Film Co Ltd | Bilderzeugungsverfahren |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2486671A1 (fr) * | 1978-12-25 | 1982-01-15 | Kuznetsov Vladimir | Photoresists secs a couches minces |
EP0729071A1 (fr) * | 1995-02-15 | 1996-08-28 | Schablonentechnik Kufstein Aktiengesellschaft | Procédé pour la fabrication d'une matrice d'impression |
Also Published As
Publication number | Publication date |
---|---|
SE435108B (sv) | 1984-09-03 |
JPS6131855B2 (fr) | 1986-07-23 |
GB1597607A (en) | 1981-09-09 |
FR2375624B1 (fr) | 1980-08-22 |
NL186723C (nl) | 1991-02-01 |
NL7714128A (nl) | 1978-06-27 |
US4337308A (en) | 1982-06-29 |
SE7714551L (sv) | 1978-06-24 |
BE862048A (fr) | 1978-06-20 |
IT1090632B (it) | 1985-06-26 |
DE2658422A1 (de) | 1978-06-29 |
BR7708588A (pt) | 1978-08-08 |
CH635203A5 (de) | 1983-03-15 |
DE2658422C2 (de) | 1986-05-22 |
JPS5382322A (en) | 1978-07-20 |
NL186723B (nl) | 1990-09-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |