ES477700A1 - Procedimiento foto-quimico-galvanico de grabado en bajo-re- lieve sobre metales. - Google Patents

Procedimiento foto-quimico-galvanico de grabado en bajo-re- lieve sobre metales.

Info

Publication number
ES477700A1
ES477700A1 ES477700A ES477700A ES477700A1 ES 477700 A1 ES477700 A1 ES 477700A1 ES 477700 A ES477700 A ES 477700A ES 477700 A ES477700 A ES 477700A ES 477700 A1 ES477700 A1 ES 477700A1
Authority
ES
Spain
Prior art keywords
exposed
metal surfaces
chemically
engraving metal
galvanically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES477700A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to ES477700A priority Critical patent/ES477700A1/es
Publication of ES477700A1 publication Critical patent/ES477700A1/es
Priority to IT19717/80A priority patent/IT1141353B/it
Priority to FR8002605A priority patent/FR2449271A1/fr
Priority to GB8004484A priority patent/GB2043107A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Abstract

Procedimiento foto-químico-galvánico de grabado en bajo-relieve sobre metales, esencialmente caracterizado porque en una primera fase operativa se efectúa un deposito metálico sobre la superficie de las piezas a grabar, para en una segunda fase, sobre las aludidas piezas, depositar una emulsión fotosensible que, posteriormente, se expone con una película o transparencia y se revela, habiendose previsto que en una tercera fase operativa las piezas a grabar sean atacadas químicamente o galvanicamente, eliminando el deposito de metal de los puntos a grabar para, finalmente, en una cuarta y última fase operativa, efectuar la coloración química o galvánica de las partes oportunas de las piezas, con baños que no alteren el depósito metálico inicial y que proporcionan el color de grabado deseado.
ES477700A 1979-02-14 1979-02-14 Procedimiento foto-quimico-galvanico de grabado en bajo-re- lieve sobre metales. Expired ES477700A1 (es)

Priority Applications (4)

Application Number Priority Date Filing Date Title
ES477700A ES477700A1 (es) 1979-02-14 1979-02-14 Procedimiento foto-quimico-galvanico de grabado en bajo-re- lieve sobre metales.
IT19717/80A IT1141353B (it) 1979-02-14 1980-02-06 Procedimento foto-chimico-galvanico di incisione in bassorilievo su metalli
FR8002605A FR2449271A1 (fr) 1979-02-14 1980-02-06 Procede de gravure en bas-relief de pieces metalliques
GB8004484A GB2043107A (en) 1979-02-14 1980-02-11 Engraving metal surfaces

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ES477700A ES477700A1 (es) 1979-02-14 1979-02-14 Procedimiento foto-quimico-galvanico de grabado en bajo-re- lieve sobre metales.

Publications (1)

Publication Number Publication Date
ES477700A1 true ES477700A1 (es) 1979-11-01

Family

ID=8477632

Family Applications (1)

Application Number Title Priority Date Filing Date
ES477700A Expired ES477700A1 (es) 1979-02-14 1979-02-14 Procedimiento foto-quimico-galvanico de grabado en bajo-re- lieve sobre metales.

Country Status (4)

Country Link
ES (1) ES477700A1 (es)
FR (1) FR2449271A1 (es)
GB (1) GB2043107A (es)
IT (1) IT1141353B (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3734615C1 (en) * 1987-10-13 1988-12-08 Kiehl & Lang Gbr Manicure and pedicure files having a filing, grinding or polishing metal layer and process for the production thereof
CN101813885B (zh) * 2010-04-14 2012-07-04 深圳市金冠防伪瓶盖有限公司 多层无酸金属板制模工艺
CN101840153B (zh) * 2010-05-10 2012-10-03 吴满荣 金属工艺品浮雕彩绘方法

Also Published As

Publication number Publication date
GB2043107A (en) 1980-10-01
IT1141353B (it) 1986-10-01
FR2449271A1 (fr) 1980-09-12
IT8019717A0 (it) 1980-02-06

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