RU2398222C2 - Датчик для обнаружения и/или измерения концентрации электрических зарядов и его применения - Google Patents
Датчик для обнаружения и/или измерения концентрации электрических зарядов и его применения Download PDFInfo
- Publication number
- RU2398222C2 RU2398222C2 RU2007101659/28A RU2007101659A RU2398222C2 RU 2398222 C2 RU2398222 C2 RU 2398222C2 RU 2007101659/28 A RU2007101659/28 A RU 2007101659/28A RU 2007101659 A RU2007101659 A RU 2007101659A RU 2398222 C2 RU2398222 C2 RU 2398222C2
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- Prior art keywords
- air gap
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- sensor
- active layer
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- 230000005684 electric field Effects 0.000 claims abstract description 51
- 239000007788 liquid Substances 0.000 claims abstract description 30
- 230000035945 sensitivity Effects 0.000 claims abstract description 30
- 238000009826 distribution Methods 0.000 claims abstract description 25
- 230000005669 field effect Effects 0.000 claims abstract description 25
- 239000011810 insulating material Substances 0.000 claims abstract description 7
- 238000009825 accumulation Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 18
- 150000002500 ions Chemical class 0.000 claims description 14
- 239000000779 smoke Substances 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000005755 formation reaction Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims 3
- 230000000694 effects Effects 0.000 abstract description 27
- 239000000126 substance Substances 0.000 abstract description 5
- 238000010521 absorption reaction Methods 0.000 description 25
- 239000007789 gas Substances 0.000 description 20
- 239000000243 solution Substances 0.000 description 15
- 238000012546 transfer Methods 0.000 description 15
- 239000008186 active pharmaceutical agent Substances 0.000 description 14
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 11
- 229910052581 Si3N4 Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 239000012212 insulator Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 239000011780 sodium chloride Substances 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 239000012777 electrically insulating material Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FRIKWZARTBPWBN-UHFFFAOYSA-N [Si].O=[Si]=O Chemical compound [Si].O=[Si]=O FRIKWZARTBPWBN-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005421 electrostatic potential Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000036403 neuro physiology Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4141—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS specially adapted for gases
- G01N27/4143—Air gap between gate and channel, i.e. suspended gate [SG] FETs
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0407583A FR2872914B1 (fr) | 2004-07-07 | 2004-07-07 | Capteur pour la detection et/ou la mesure d'une concentration de charges electriques contenues dans une ambiance, utilisations et procede de fabrication correspondants |
| FR0407583 | 2004-07-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2007101659A RU2007101659A (ru) | 2008-08-20 |
| RU2398222C2 true RU2398222C2 (ru) | 2010-08-27 |
Family
ID=34947923
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2007101659/28A RU2398222C2 (ru) | 2004-07-07 | 2005-07-07 | Датчик для обнаружения и/или измерения концентрации электрических зарядов и его применения |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20080134759A1 (https=) |
| EP (1) | EP1774307A1 (https=) |
| JP (1) | JP2008506099A (https=) |
| CN (1) | CN101048656A (https=) |
| CA (1) | CA2572485A1 (https=) |
| FR (1) | FR2872914B1 (https=) |
| IL (1) | IL180496A0 (https=) |
| RU (1) | RU2398222C2 (https=) |
| WO (1) | WO2006013289A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2675667C1 (ru) * | 2017-12-18 | 2018-12-21 | Общество с ограниченной ответственностью "Технологии Печатной Электроники" (ООО "ПРИНТЭЛТЕХ") | Способ селективного определения концентрации газообразных меркаптосодержащих и/или аминосодержащих соединений при помощи газового сенсора на основе органического полевого транзистора и устройство для селективного определения концентрации газообразных меркаптосодержащих и/или аминосодержащих соединений |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2934683B1 (fr) * | 2008-07-31 | 2012-11-16 | Mhs Electronics | Capteur biologique a transistor a effet de champ. |
| US8373206B2 (en) * | 2010-07-20 | 2013-02-12 | Nth Tech Corporation | Biosensor apparatuses and methods thereof |
| DE102011083644A1 (de) * | 2011-09-28 | 2013-03-28 | Robert Bosch Gmbh | Mikromechanische Sensorvorrichtung mit beweglichem Gate und entsprechendes Herstellungsverfahren |
| DE102012211460A1 (de) * | 2012-07-03 | 2014-01-09 | Robert Bosch Gmbh | Gassensor und Verfahren zum Herstellen eines solchen |
| US9599586B2 (en) * | 2012-08-27 | 2017-03-21 | Infineon Technologies Ag | Ion sensor |
| WO2014059080A1 (en) * | 2012-10-12 | 2014-04-17 | Texas State University-San Marcos | A vertically movable gate field effect transistor (vmgfet) on a silicon-on-insulator (soi) wafer and method of forming a vmgfet |
| US9170165B2 (en) * | 2013-03-25 | 2015-10-27 | Globalfoundries U.S. 2 Llc | Workfunction modulation-based sensor to measure pressure and temperature |
| KR101616959B1 (ko) * | 2013-07-02 | 2016-04-29 | 전자부품연구원 | Fet 이온센서 및 이를 이용한 시스템 |
| GB2523173A (en) | 2014-02-17 | 2015-08-19 | Nokia Technologies Oy | An apparatus and associated methods |
| DE102014115980B4 (de) | 2014-11-03 | 2022-06-23 | Infineon Technologies Ag | Gerät zum Analysieren der Ionenkinetik in Dielektrika |
| CN105301079B (zh) * | 2015-10-13 | 2019-10-15 | 上海小海龟科技有限公司 | 用于待测物离子活度检测的半导体器件及其检测方法 |
| CN105353000B (zh) * | 2015-10-14 | 2019-04-19 | 深圳市共进电子股份有限公司 | 半导体器件及其检测方法 |
| DE102016209360A1 (de) | 2016-05-31 | 2017-11-30 | Continental Automotive Gmbh | Verfahren, Vorrichtung zum Betreiben eines Stickoxidsensors, Computerprogramm und Computerprogrammprodukt |
| TWI648864B (zh) * | 2017-09-26 | 2019-01-21 | 國立清華大學 | 感測裝置及離子檢測方法 |
| US20240230747A1 (en) * | 2021-06-01 | 2024-07-11 | Eltek S.P.A. | Sensor device for monitoring the dielectric strength of a dielectric fluid, in particular a fluid for the thermal conditioning of a battery |
| CN113203898B (zh) * | 2021-07-05 | 2021-09-14 | 北京科技大学 | 一种用于离子化空气中的非接触表面电位测试方法 |
| US12449395B2 (en) | 2022-03-14 | 2025-10-21 | Saudi Arabian Oil Company | System and method for real-time drilling fluids pH measuring utilizing electrolyte insulator semiconductor field-effect sensors |
| KR102811340B1 (ko) * | 2022-06-15 | 2025-05-21 | 스웨센시 에이비 | Fet 가스 센서 장치 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4020830A (en) * | 1975-03-12 | 1977-05-03 | The University Of Utah | Selective chemical sensitive FET transducers |
| US4514263A (en) * | 1982-01-12 | 1985-04-30 | University Of Utah | Apparatus and method for measuring the concentration of components in fluids |
| DE19849932A1 (de) * | 1998-10-29 | 2000-05-11 | Siemens Ag | Gasdetektion nach dem Prinzip einer Messung von Austrittsarbeiten |
| RU2188411C1 (ru) * | 2001-06-13 | 2002-08-27 | Тамбовский государственный технический университет | Способ измерения активности ионов в растворах и устройство для его осуществления |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1148279A (en) * | 1979-12-14 | 1983-06-14 | Andreas Scheidweiler | Ionization smoke detector with increased operational reliability |
| US4411741A (en) * | 1982-01-12 | 1983-10-25 | University Of Utah | Apparatus and method for measuring the concentration of components in fluids |
| GB8416994D0 (en) * | 1984-07-04 | 1984-08-08 | Emi Ltd | Gas sensor |
| JPS6133645A (ja) * | 1984-07-25 | 1986-02-17 | 住友電気工業株式会社 | 生体用センサ− |
| US4671852A (en) * | 1986-05-07 | 1987-06-09 | The Standard Oil Company | Method of forming suspended gate, chemically sensitive field-effect transistor |
| DE3834189C1 (de) * | 1988-10-07 | 1990-02-15 | Ignaz Eisele | Nicht-elektrochemische Herstellung von chemisch selektiven Schichten in Feldeffekttransistoren mit frei hängendem Gate |
| JPH0368857A (ja) * | 1989-08-09 | 1991-03-25 | Terumo Corp | Isfetセンサ及びその製造方法 |
| US5693545A (en) * | 1996-02-28 | 1997-12-02 | Motorola, Inc. | Method for forming a semiconductor sensor FET device |
| US5683569A (en) * | 1996-02-28 | 1997-11-04 | Motorola, Inc. | Method of sensing a chemical and sensor therefor |
| DE19956303A1 (de) * | 1999-11-23 | 2001-06-07 | Siemens Ag | Brandmelder mit Gassensoren |
| JP4467022B2 (ja) * | 2000-03-31 | 2010-05-26 | フィガロ技研株式会社 | ガスセンサ |
-
2004
- 2004-07-07 FR FR0407583A patent/FR2872914B1/fr not_active Expired - Fee Related
-
2005
- 2005-07-07 JP JP2007519844A patent/JP2008506099A/ja active Pending
- 2005-07-07 RU RU2007101659/28A patent/RU2398222C2/ru not_active IP Right Cessation
- 2005-07-07 CN CNA2005800297375A patent/CN101048656A/zh active Pending
- 2005-07-07 EP EP05788666A patent/EP1774307A1/fr not_active Withdrawn
- 2005-07-07 WO PCT/FR2005/001761 patent/WO2006013289A1/fr not_active Ceased
- 2005-07-07 CA CA002572485A patent/CA2572485A1/fr not_active Abandoned
- 2005-07-07 US US11/631,839 patent/US20080134759A1/en not_active Abandoned
-
2007
- 2007-01-02 IL IL180496A patent/IL180496A0/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4020830A (en) * | 1975-03-12 | 1977-05-03 | The University Of Utah | Selective chemical sensitive FET transducers |
| US4020830B1 (https=) * | 1975-03-12 | 1984-09-04 | ||
| US4514263A (en) * | 1982-01-12 | 1985-04-30 | University Of Utah | Apparatus and method for measuring the concentration of components in fluids |
| DE19849932A1 (de) * | 1998-10-29 | 2000-05-11 | Siemens Ag | Gasdetektion nach dem Prinzip einer Messung von Austrittsarbeiten |
| RU2188411C1 (ru) * | 2001-06-13 | 2002-08-27 | Тамбовский государственный технический университет | Способ измерения активности ионов в растворах и устройство для его осуществления |
Non-Patent Citations (2)
| Title |
|---|
| FLEISCHER M et all. "Low-power gas sensors based on work-function measurement in low-cost hybrid flip-chip technology" SENSORS AND ACTUATORS B, ELSEVIER SEQUOIA S.A, LAUSANNE, CH, vol.80, no.3, 1 December 2001 (2001-12-01), p. 169-173. * |
| LORENZ Н et all. "NEW SUSPENDED GATE FET TECHNOLOGY FOR PHYSICAL DEPOSITION OF CHEMICALLY SENSITIVE LAYERS'' SENSORS AND ACTUATORS A, ELSEVIER SEQUOIA S.A., LAUSANNE, CH, vol. A23, no.1/3, April 1990, p. 1023-1026. H. MAHFOZ-KOTB ЕТ AL.: "High performance poly silicon air-gap thin film transistor on low temperature substrates", PROCEEDINGS OF SPIE, SMART SENSORS, ACTUATORS, AND MEMS, no. 5116, April 2003, p. 168-175. * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2675667C1 (ru) * | 2017-12-18 | 2018-12-21 | Общество с ограниченной ответственностью "Технологии Печатной Электроники" (ООО "ПРИНТЭЛТЕХ") | Способ селективного определения концентрации газообразных меркаптосодержащих и/или аминосодержащих соединений при помощи газового сенсора на основе органического полевого транзистора и устройство для селективного определения концентрации газообразных меркаптосодержащих и/или аминосодержащих соединений |
| US11226305B2 (en) | 2017-12-18 | 2022-01-18 | Printeltech Llc | Method for selectively determining the concentration of gaseous mercaptan-containing and/or amino-containing compounds |
Also Published As
| Publication number | Publication date |
|---|---|
| RU2007101659A (ru) | 2008-08-20 |
| EP1774307A1 (fr) | 2007-04-18 |
| IL180496A0 (en) | 2007-06-03 |
| FR2872914A1 (fr) | 2006-01-13 |
| JP2008506099A (ja) | 2008-02-28 |
| CA2572485A1 (fr) | 2006-02-09 |
| US20080134759A1 (en) | 2008-06-12 |
| WO2006013289A1 (fr) | 2006-02-09 |
| FR2872914B1 (fr) | 2006-10-13 |
| CN101048656A (zh) | 2007-10-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | The patent is invalid due to non-payment of fees |
Effective date: 20120708 |