RU2018140411A - Способ и состав для пропитки пористых материалов - Google Patents
Способ и состав для пропитки пористых материалов Download PDFInfo
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- RU2018140411A RU2018140411A RU2018140411A RU2018140411A RU2018140411A RU 2018140411 A RU2018140411 A RU 2018140411A RU 2018140411 A RU2018140411 A RU 2018140411A RU 2018140411 A RU2018140411 A RU 2018140411A RU 2018140411 A RU2018140411 A RU 2018140411A
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- 239000011148 porous material Substances 0.000 title claims 6
- 238000000034 method Methods 0.000 title claims 5
- 239000000463 material Substances 0.000 claims 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 3
- 239000002318 adhesion promoter Substances 0.000 claims 3
- 239000003999 initiator Substances 0.000 claims 3
- 239000000178 monomer Substances 0.000 claims 3
- 150000001282 organosilanes Chemical class 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- 239000004094 surface-active agent Substances 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000005470 impregnation Methods 0.000 claims 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 claims 2
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 claims 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 claims 1
- LYGZOGDWCOYSGJ-UHFFFAOYSA-N 2-hydroxy-1-[4-[4-(2-hydroxy-2-methylpropanoyl)phenoxy]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1OC1=CC=C(C(=O)C(C)(C)O)C=C1 LYGZOGDWCOYSGJ-UHFFFAOYSA-N 0.000 claims 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 claims 1
- SAPGBCWOQLHKKZ-UHFFFAOYSA-N 6-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical group CC(=C)C(=O)OCCCCCCOC(=O)C(C)=C SAPGBCWOQLHKKZ-UHFFFAOYSA-N 0.000 claims 1
- 239000004342 Benzoyl peroxide Substances 0.000 claims 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical group C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 claims 1
- 235000019400 benzoyl peroxide Nutrition 0.000 claims 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 claims 1
- 125000004386 diacrylate group Chemical group 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 238000007654 immersion Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 238000009489 vacuum treatment Methods 0.000 claims 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/20—Graphite
- C01B32/21—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/14—Peroxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
- C08K5/5419—Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/22—Expanded, porous or hollow particles
- C08K7/24—Expanded, porous or hollow particles inorganic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/08—Ingredients agglomerated by treatment with a binding agent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2500/00—Characteristics or properties of obtained polyolefins; Use thereof
- C08F2500/17—Viscosity
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/14—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Geology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Manufacturing & Machinery (AREA)
- Graft Or Block Polymers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polymerization Catalysts (AREA)
Claims (29)
1. Состав для пропитки пористого спеченного материала, отличающийся тем, что указанный состав содержит
40–90 вес. % акрилового мономера,
0,1–10 вес. % радикального термического инициатора,
0,1–10 вес. % радикального фотоинициатора,
до 30 вес. % органосиланового усилителя адгезии и
до 5 вес. % поверхностно-активного вещества на основе кремния.
2. Состав по п. 1, отличающийся тем, что пористый спеченный материал представляет собой графит.
3. Состав по любому из предыдущих пунктов, отличающийся тем, что акриловый мономер выбран из 1,6-гександиолдиметакрилата, 1,4-бутандиолдиметакрилата 95% (Sigma-Aldrich), триакрилата глицеринпропоксилата (1PO/OH) (Sigma-Aldrich), диакрилата неопентилгликоля (Sigma-Aldrich) и тетраакрилата ди(триметилолпропан) (Sigma-Aldrich).
4. Состав по любому из предыдущих пунктов, отличающийся тем, что радикальный термический инициатор выбран из бензоилпероксида, трет-бутилгидропероксида (Sigma-Aldrich), дикумилпероксида (Sigma-Aldrich), лауроилпероксида (Sigma-Aldrich) и трет-бутилпероксида (Sigma-Aldrich).
5. Состав по любому из предыдущих пунктов, отличающийся тем, что радикальный фотоинициатор выбран из Esacure 1001, Esacure KTO-46 (Lamberti Spa), Esacure One (Lamberti Spa), Esacure ITX (Lamberti Spa) и Esacure KIP 160 (Lamberti Spa).
6. Состав по любому из предыдущих пунктов, отличающийся тем, что вязкость состава находится в диапазоне 1–50 сП.
7. Состав по любому из предыдущих пунктов, отличающийся тем, что пористость спеченного материала находится в диапазоне 2–8 об. %, предпочтительно составляет приблизительно 5 об. %.
8. Состав по любому из предыдущих пунктов, отличающийся тем, что содержание органосиланового усилителя адгезии составляет 5–25 вес. %.
9. Состав по любому из предыдущих пунктов, отличающийся тем, что содержание поверхностно-активного вещества на основе кремния составляет 0,05–1 вес. %.
10. Способ пропитки пористого спеченного материала, отличающийся тем, что он включает следующие этапы:
- погружения пористого материала в жидкий состав, содержащий
акриловый мономер,
радикальный термический инициатор,
радикальный фотоинициатор,
органосилановый усилитель адгезии и
поверхностно-активное вещество на основе кремния;
- вакуумной обработки погруженного пористого материала;
- удаления избыточной жидкости из поверхности пористого материала;
- подвергания пористого материала воздействию светового излучения; и
- тепловой обработки пористого материала.
11. Способ по п. 10, отличающийся тем, что вакуумную обработку проводят при давлении 5–10 мбар в течение от 10 минут до 3 часов.
12. Способ по п. 10 или 11, отличающийся тем, что воздействие светом выполняют при длинах волн 200–400 нм, предпочтительно в инертной атмосфере.
13. Способ по любому из пп. 10-12, отличающийся тем, что тепловую обработку проводят при температурах 80–200°С в течение от 1 до 60 мин.
14. Применение состава по любому из пп. 1-9 для пропитки модуля печати.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16170329 | 2016-05-19 | ||
| EP16170329.3 | 2016-05-19 | ||
| PCT/EP2017/062111 WO2017198819A1 (en) | 2016-05-19 | 2017-05-19 | Method and formulation for impregnation of porous materials |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| RU2018140411A true RU2018140411A (ru) | 2020-06-19 |
| RU2018140411A3 RU2018140411A3 (ru) | 2020-10-13 |
| RU2761816C2 RU2761816C2 (ru) | 2021-12-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2018140411A RU2761816C2 (ru) | 2016-05-19 | 2017-05-19 | Способ и состав для пропитки пористых материалов |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11098172B2 (ru) |
| EP (1) | EP3458524B1 (ru) |
| JP (1) | JP7003364B2 (ru) |
| KR (1) | KR102340764B1 (ru) |
| CN (1) | CN109153862B (ru) |
| CA (1) | CA3024157C (ru) |
| RU (1) | RU2761816C2 (ru) |
| WO (1) | WO2017198819A1 (ru) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI814839B (zh) | 2018-07-30 | 2023-09-11 | 瑞士商西克帕控股有限公司 | 多晶片模組(mcm)組合件和列印條 |
| TWI789529B (zh) | 2018-07-30 | 2023-01-11 | 瑞士商西克帕控股有限公司 | 多晶片模組(mcm)組件 |
| CN111777718A (zh) * | 2020-06-11 | 2020-10-16 | 南京艾布纳密封技术股份有限公司 | 一种烧结或压铸成型多孔材料用有机浸渗剂 |
| JPWO2022210869A1 (ru) * | 2021-03-31 | 2022-10-06 | ||
| CN117964399B (zh) * | 2024-04-01 | 2024-06-07 | 山东红点新材料有限公司 | 一种等静压石墨制品的浸渍方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| SU211078A1 (ru) | 1966-09-05 | 1968-02-08 | К. А. Корнев, О. К. Кошевой, К. К. Хоменкова, Л. И. Човник, А. Н. Черышев , Н. Пазеико | Способ получения стеклопластика |
| SU1742279A1 (ru) | 1989-04-26 | 1992-06-23 | Центр научно-технического творчества молодежи "Внедрение" | Способ получени пористого полимера |
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| WO2002078114A1 (fr) * | 2001-03-27 | 2002-10-03 | Sharp Kabushiki Kaisha | Batterie lithium polymere et procede de production correspondant |
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| US20100151242A1 (en) | 2008-12-10 | 2010-06-17 | E.I. Du Pont De Nemours And Company | Impregnating compositions |
| WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| JP5480578B2 (ja) * | 2009-09-30 | 2014-04-23 | 積水化学工業株式会社 | プロトン伝導性材料、プロトン伝導性電解質膜、プロトン伝導性電解質層付プロトン伝導性電解質膜、膜−電極接合体及び固体高分子形燃料電池 |
| US9156059B2 (en) * | 2011-05-16 | 2015-10-13 | New Hampshire Ball Bearings, Inc. | Self-lubricating surface coating composition |
| US20140151607A1 (en) | 2012-11-30 | 2014-06-05 | Nthdegree Technologies Worldwide Inc. | Ultraviolet-Curable Conductive Ink and Dielectric Ink Compositions Having a Common Binding Medium, with Manufactures and Fabrication Methods |
| KR101549468B1 (ko) | 2013-11-29 | 2015-09-03 | 한국과학기술연구원 | 경화 황칠화학조성물, 이의 제조방법 및 황칠도막의 제조방법 |
-
2017
- 2017-05-19 WO PCT/EP2017/062111 patent/WO2017198819A1/en active Search and Examination
- 2017-05-19 US US16/302,576 patent/US11098172B2/en active Active
- 2017-05-19 CA CA3024157A patent/CA3024157C/en active Active
- 2017-05-19 JP JP2018556400A patent/JP7003364B2/ja active Active
- 2017-05-19 RU RU2018140411A patent/RU2761816C2/ru active
- 2017-05-19 EP EP17724366.4A patent/EP3458524B1/en active Active
- 2017-05-19 KR KR1020187034058A patent/KR102340764B1/ko active IP Right Grant
- 2017-05-19 CN CN201780030697.9A patent/CN109153862B/zh active Active
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| Publication number | Publication date |
|---|---|
| KR102340764B1 (ko) | 2021-12-21 |
| JP2019523309A (ja) | 2019-08-22 |
| EP3458524A1 (en) | 2019-03-27 |
| RU2761816C2 (ru) | 2021-12-13 |
| KR20190009757A (ko) | 2019-01-29 |
| CN109153862B (zh) | 2021-05-11 |
| JP7003364B2 (ja) | 2022-01-20 |
| EP3458524B1 (en) | 2020-08-05 |
| US20190300667A1 (en) | 2019-10-03 |
| CA3024157C (en) | 2024-05-21 |
| RU2018140411A3 (ru) | 2020-10-13 |
| CA3024157A1 (en) | 2017-11-23 |
| WO2017198819A1 (en) | 2017-11-23 |
| US11098172B2 (en) | 2021-08-24 |
| CN109153862A (zh) | 2019-01-04 |
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