RU2016131081A3 - - Google Patents

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Publication number
RU2016131081A3
RU2016131081A3 RU2016131081A RU2016131081A RU2016131081A3 RU 2016131081 A3 RU2016131081 A3 RU 2016131081A3 RU 2016131081 A RU2016131081 A RU 2016131081A RU 2016131081 A RU2016131081 A RU 2016131081A RU 2016131081 A3 RU2016131081 A3 RU 2016131081A3
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RU
Russia
Application number
RU2016131081A
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RU2689391C2 (ru
RU2016131081A (ru
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of RU2016131081A publication Critical patent/RU2016131081A/ru
Publication of RU2016131081A3 publication Critical patent/RU2016131081A3/ru
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Publication of RU2689391C2 publication Critical patent/RU2689391C2/ru

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H01J1/28—Dispenser-type cathodes, e.g. L-cathode
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/027—Construction of the gun or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/029—Schematic arrangements for beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/48—Electron guns
    • H01J2229/4803—Electrodes
    • H01J2229/481—Focusing electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Solid Thermionic Cathode (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
RU2016131081A 2013-12-30 2014-12-22 Катодное устройство, электронная пушка и установка литографии, содержащая такую электронную пушку RU2689391C2 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361921546P 2013-12-30 2013-12-30
US61/921,546 2013-12-30
PCT/EP2014/078993 WO2015101537A1 (en) 2013-12-30 2014-12-22 Cathode arrangement, electron gun, and lithography system comprising such electron gun

Publications (3)

Publication Number Publication Date
RU2016131081A RU2016131081A (ru) 2018-02-06
RU2016131081A3 true RU2016131081A3 (ru) 2018-06-20
RU2689391C2 RU2689391C2 (ru) 2019-05-28

Family

ID=52146507

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2016131081A RU2689391C2 (ru) 2013-12-30 2014-12-22 Катодное устройство, электронная пушка и установка литографии, содержащая такую электронную пушку

Country Status (9)

Country Link
US (3) US9466453B2 (ru)
EP (2) EP3090438B1 (ru)
JP (4) JP6208371B2 (ru)
KR (2) KR102359077B1 (ru)
CN (3) CN108666188B (ru)
NL (2) NL2014029B1 (ru)
RU (1) RU2689391C2 (ru)
TW (2) TWI608511B (ru)
WO (2) WO2015101537A1 (ru)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102359077B1 (ko) * 2013-12-30 2022-02-07 에이에스엠엘 네델란즈 비.브이. 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템
US10529529B2 (en) * 2016-04-20 2020-01-07 Moxtek, Inc. Electron-beam spot optimization
US10366859B2 (en) * 2016-08-24 2019-07-30 Varian Medical Systems, Inc. Electromagnetic interference containment for accelerator systems
UA113827C2 (xx) 2016-09-07 2017-03-10 Аксіальна електронна гармата
US10535499B2 (en) * 2017-11-03 2020-01-14 Varian Semiconductor Equipment Associates, Inc. Varied component density for thermal isolation
JP6396618B1 (ja) * 2018-04-03 2018-09-26 グローテクノロジー株式会社 グロー放電システム及びこれを用いたグロー放電質量分析装置
CN111048373B (zh) * 2018-10-12 2021-04-27 中国电子科技集团公司第三十八研究所 一种电子源再生方法
KR102640728B1 (ko) * 2019-04-18 2024-02-27 주식회사 히타치하이테크 전자원 및 하전 입자선 장치
EP4035194A1 (en) * 2019-09-23 2022-08-03 Freemelt Ab Electron gun cathode technology
JP2022081185A (ja) * 2020-11-19 2022-05-31 株式会社ニューフレアテクノロジー 電子放出源の動作制御方法、電子ビーム描画方法、及び電子ビーム描画装置
CN114284121B (zh) * 2021-12-24 2023-09-19 中国科学院空天信息创新研究院 用于行波管的电子枪及其制备方法

Family Cites Families (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1201138A (en) 1915-05-12 1916-10-10 Wagner Mfg Company Griddle.
US2983842A (en) * 1959-06-23 1961-05-09 Zenith Radio Corp Electrode system
US3040205A (en) * 1960-05-31 1962-06-19 Harold R Walker Electrostatic vidicon
US3175115A (en) 1960-08-25 1965-03-23 Sylvania Electric Prod Cathode assembly
US3154711A (en) * 1961-06-19 1964-10-27 Gen Electric Electron beam focusing by means of contact differences of potential
US3157308A (en) 1961-09-05 1964-11-17 Clark Mfg Co J L Canister type container and method of making the same
US3159408A (en) 1961-10-05 1964-12-01 Grace W R & Co Chuck
US3154171A (en) * 1962-04-02 1964-10-27 Vicon Instr Company Noise suppressing filter for microphone
US3227906A (en) 1962-05-02 1966-01-04 Eitel Mccullough Inc Cathode support and heat shielding structure for electron gun
DE1514490A1 (de) 1965-06-30 1969-06-26 Siemens Ag Elektronenstrahlerzeugungssystem fuer elektrische Entladungsgefaesse
NL6513665A (ru) * 1965-10-22 1967-04-24
US3462629A (en) * 1966-05-09 1969-08-19 Stromberg Carlson Corp Self-aligning electron gun construction
US3500110A (en) * 1967-08-23 1970-03-10 Raytheon Co Noncurrent intercepting electron beam control element
US3573533A (en) 1968-11-12 1971-04-06 Hughes Aircraft Co Gun-supporting cylinder centered in art neck by springs connected internally of cylinder
US3594885A (en) 1969-06-16 1971-07-27 Varian Associates Method for fabricating a dimpled concave dispenser cathode incorporating a grid
USRE30082E (en) 1972-08-30 1979-08-21 Picker Corporation X-ray tube having focusing cup with non-emitting coating
JPS5242591B2 (ru) * 1972-12-08 1977-10-25
JPS5533719A (en) * 1978-08-31 1980-03-10 Toshiba Corp Electron gun
US4254357A (en) * 1979-09-14 1981-03-03 The United States Of America As Represented By The Secretary Of The Navy Multi-arrayed micro-patch emitter with integral control grid
US4354357A (en) * 1979-11-05 1982-10-19 Hofstetter Robert W Conveyor system with cooling means
US4379979A (en) 1981-02-06 1983-04-12 The United States Of America As Represented By The Secretary Of The Navy Controlled porosity sheet for thermionic dispenser cathode and method of manufacture
JPS5842141A (ja) * 1981-09-08 1983-03-11 Nec Corp ピアス形電子銃
JPS5851438A (ja) * 1981-09-22 1983-03-26 Nippon Telegr & Teleph Corp <Ntt> 電子線源
DE3407434A1 (de) 1984-02-29 1985-08-29 Siemens AG, 1000 Berlin und 8000 München Strahlerzeugersystem fuer elektronenroehren, insbesondere wanderfeldroehren
US4524308A (en) 1984-06-01 1985-06-18 Sony Corporation Circuits for accomplishing electron beam convergence in color cathode ray tubes
JPH01176641A (ja) * 1987-12-29 1989-07-13 Matsushita Electron Corp 電子銃
US4994709A (en) * 1989-03-22 1991-02-19 Varian Associates, Inc. Method for making a cathader with integral shadow grid
US4954745A (en) * 1989-03-22 1990-09-04 Tektronix, Inc. Cathode structure
US5218263A (en) * 1990-09-06 1993-06-08 Ceradyne, Inc. High thermal efficiency dispenser-cathode and method of manufacture therefor
US5293410A (en) 1991-11-27 1994-03-08 Schlumberger Technology Corporation Neutron generator
AU6449994A (en) 1993-04-30 1994-11-21 Board Of Regents, The University Of Texas System Megavoltage scanning imager and method for its use
JP3341367B2 (ja) * 1993-06-25 2002-11-05 ソニー株式会社 電子銃カソード構造体
JP3264775B2 (ja) * 1994-06-29 2002-03-11 電気化学工業株式会社 熱電界放射電子銃
JP2787899B2 (ja) * 1995-03-20 1998-08-20 日本電気株式会社 冷陰極およびこれを用いた電子銃とマイクロ波管
US5623183A (en) * 1995-03-22 1997-04-22 Litton Systems, Inc. Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode
EP0766405A1 (en) 1995-09-29 1997-04-02 STMicroelectronics S.r.l. Successive approximation register without redundancy
US5814939A (en) * 1996-02-12 1998-09-29 Chu; Kwo R. Mechanically tunable magnetron injection gun (MIG)
JPH10255679A (ja) * 1997-03-12 1998-09-25 Sony Corp 電子銃カソード構造体
US6196889B1 (en) * 1998-12-11 2001-03-06 United Technologies Corporation Method and apparatus for use an electron gun employing a thermionic source of electrons
US6455990B1 (en) * 1998-12-11 2002-09-24 United Technologies Corporation Apparatus for an electron gun employing a thermionic electron source
US6229876B1 (en) * 1999-07-29 2001-05-08 Kevex X-Ray, Inc. X-ray tube
AU1926501A (en) * 1999-11-23 2001-06-04 Ion Diagnostics, Inc. Electron optics for multi-beam electron beam lithography tool
FR2833750A1 (fr) * 2001-12-19 2003-06-20 Thomson Licensing Sa Canon a electrons pour tube a vide
DE10218913B4 (de) * 2002-04-27 2005-05-04 Bruker Daltonik Gmbh Vorrichtung und Verfahren zur Bewegung einer Elektronenquelle in einem Magnetfeld
JP3996442B2 (ja) * 2002-05-27 2007-10-24 Ｎｅｃマイクロ波管株式会社 電子銃
US7233101B2 (en) * 2002-12-31 2007-06-19 Samsung Electronics Co., Ltd. Substrate-supported array having steerable nanowires elements use in electron emitting devices
TWI300308B (en) 2002-10-25 2008-08-21 Mapper Lithography Ip Bv Lithography system
EP3671804A1 (en) * 2002-10-30 2020-06-24 ASML Netherlands B.V. Electron beam exposure system
US6891321B2 (en) * 2002-11-12 2005-05-10 Ge Medical Systems Global Technology Company, Llc Oil-free electron source having cathode and anode members adjustable with five degrees of freedom
US6952466B2 (en) * 2002-11-12 2005-10-04 Ge Medical Systems Global Technology Company, Llc Oil-free electron source for an EBT scanner
ATE552607T1 (de) * 2003-02-14 2012-04-15 Mapper Lithography Ip Bv Vorratskathode
US7129502B2 (en) 2003-03-10 2006-10-31 Mapper Lithography Ip B.V. Apparatus for generating a plurality of beamlets
ATE524822T1 (de) 2003-05-28 2011-09-15 Mapper Lithography Ip Bv Belichtungsverfahren für strahlen aus geladenen teilchen
JP4298399B2 (ja) * 2003-06-26 2009-07-15 キヤノン株式会社 電子線装置及び該電子線装置を用いた電子線描画装置
ATE381728T1 (de) 2003-07-30 2008-01-15 Mapper Lithography Ip Bv Modulator-schaltkreise
JP4349964B2 (ja) * 2003-09-10 2009-10-21 株式会社日立ハイテクノロジーズ 小型電子銃
JP2006012663A (ja) * 2004-06-28 2006-01-12 Hitachi Displays Ltd 陰極線管
JP4134000B2 (ja) * 2004-10-28 2008-08-13 Ｎｅｃマイクロ波管株式会社 電子銃
JP2006221983A (ja) * 2005-02-10 2006-08-24 Nuflare Technology Inc 荷電粒子発生装置と荷電粒子発生装置用エミッタ温度決定方法
US7709815B2 (en) 2005-09-16 2010-05-04 Mapper Lithography Ip B.V. Lithography system and projection method
US8159118B2 (en) 2005-11-02 2012-04-17 United Technologies Corporation Electron gun
WO2007055154A1 (ja) * 2005-11-08 2007-05-18 Advantest Corporation 電子銃、電子ビーム露光装置及び露光方法
RU2321096C1 (ru) * 2006-08-21 2008-03-27 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") Катодный узел для электронной пушки с протяженным электронным потоком
US20090108192A1 (en) 2007-10-25 2009-04-30 Schulumberger Technology Corporation Tritium-Tritium Neutron Generator Logging Tool
JP2009187767A (ja) * 2008-02-06 2009-08-20 Sumitomo Electric Ind Ltd 電子源構造体及び電子源構造体駆動装置
JP2009205904A (ja) * 2008-02-27 2009-09-10 Hitachi High-Technologies Corp 冷陰極型電界放出電子銃及びそれを用いた電子線装置
WO2009110179A1 (ja) * 2008-03-04 2009-09-11 パナソニック株式会社 マトリックス型冷陰極電子源装置
DE112009003724B4 (de) * 2008-12-16 2017-07-13 Hitachi High-Technologies Corporation Verwendung eines Elektronenstrahlgeräts
US9653261B2 (en) * 2012-05-14 2017-05-16 Mapper Lithography Ip B.V. Charged particle lithography system and beam generator
KR102359077B1 (ko) * 2013-12-30 2022-02-07 에이에스엠엘 네델란즈 비.브이. 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템
JP6352529B2 (ja) 2015-04-03 2018-07-04 株式会社日立ハイテクノロジーズ 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置

Also Published As

Publication number Publication date
EP3090438A1 (en) 2016-11-09
TW201532096A (zh) 2015-08-16
US20160314935A1 (en) 2016-10-27
RU2689391C2 (ru) 2019-05-28
EP3090439A1 (en) 2016-11-09
JP2017501553A (ja) 2017-01-12
JP6462805B2 (ja) 2019-01-30
TW201528312A (zh) 2015-07-16
NL2014030A (en) 2015-07-01
WO2015101538A4 (en) 2015-08-27
CN108666188A (zh) 2018-10-16
US20150187541A1 (en) 2015-07-02
JP6929910B2 (ja) 2021-09-01
WO2015101537A4 (en) 2015-08-27
JP2020009777A (ja) 2020-01-16
TWI661457B (zh) 2019-06-01
JP2018032861A (ja) 2018-03-01
JP6590811B2 (ja) 2019-10-16
US10622188B2 (en) 2020-04-14
CN105874554A (zh) 2016-08-17
EP3090438B1 (en) 2020-03-25
NL2014030B1 (en) 2016-01-08
JP6208371B2 (ja) 2017-10-04
TWI608511B (zh) 2017-12-11
WO2015101538A1 (en) 2015-07-09
NL2014029A (en) 2015-07-01
EP3090439B1 (en) 2020-06-24
CN105874555A (zh) 2016-08-17
CN105874555B (zh) 2018-06-15
WO2015101537A1 (en) 2015-07-09
US9455112B2 (en) 2016-09-27
KR20160104712A (ko) 2016-09-05
RU2016131081A (ru) 2018-02-06
CN108666188B (zh) 2020-06-12
NL2014029B1 (en) 2016-01-08
KR102359077B1 (ko) 2022-02-07
CN105874554B (zh) 2018-05-08
US9466453B2 (en) 2016-10-11
KR102427119B1 (ko) 2022-07-29
KR20160104711A (ko) 2016-09-05
US20150187533A1 (en) 2015-07-02
JP2017502469A (ja) 2017-01-19

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