PT90021B - Processo para a preparacao de derivados de benzofenona - Google Patents
Processo para a preparacao de derivados de benzofenona Download PDFInfo
- Publication number
- PT90021B PT90021B PT90021A PT9002189A PT90021B PT 90021 B PT90021 B PT 90021B PT 90021 A PT90021 A PT 90021A PT 9002189 A PT9002189 A PT 9002189A PT 90021 B PT90021 B PT 90021B
- Authority
- PT
- Portugal
- Prior art keywords
- group
- atom
- compound
- alkyl
- hydrogen atom
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 16
- 238000002360 preparation method Methods 0.000 title claims description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 38
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 18
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 10
- 125000005843 halogen group Chemical group 0.000 claims abstract description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 10
- 125000005110 aryl thio group Chemical group 0.000 claims abstract description 6
- 125000004414 alkyl thio group Chemical group 0.000 claims abstract description 5
- 150000001450 anions Chemical class 0.000 claims abstract description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 4
- 239000001257 hydrogen Substances 0.000 claims abstract description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims description 30
- ONIKNECPXCLUHT-UHFFFAOYSA-N 2-chlorobenzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1Cl ONIKNECPXCLUHT-UHFFFAOYSA-N 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- -1 halide ion Chemical class 0.000 claims description 8
- 239000002966 varnish Substances 0.000 claims description 8
- 239000003999 initiator Substances 0.000 claims description 7
- 125000004429 atom Chemical group 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 2
- 210000002268 wool Anatomy 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 15
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 24
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 20
- 238000000576 coating method Methods 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 238000001914 filtration Methods 0.000 description 10
- 238000005406 washing Methods 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 7
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000008033 biological extinction Effects 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N EtOH Substances CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 239000006071 cream Substances 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 150000008366 benzophenones Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000009965 odorless effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000012258 stirred mixture Substances 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- VBQMOUFTQANISV-UHFFFAOYSA-N (2-butylphenyl)-phenylmethanone Chemical compound CCCCC1=CC=CC=C1C(=O)C1=CC=CC=C1 VBQMOUFTQANISV-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- 125000001999 4-Methoxybenzoyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1OC([H])([H])[H])C(*)=O 0.000 description 1
- 125000000242 4-chlorobenzoyl group Chemical group ClC1=CC=C(C(=O)*)C=C1 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZGKWMKMYBBLDMM-UHFFFAOYSA-N COC1(C(=O)C2=CC=CC=C2)CC=CC=C1 Chemical compound COC1(C(=O)C2=CC=CC=C2)CC=CC=C1 ZGKWMKMYBBLDMM-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SZJQXQICJDHRJE-UHFFFAOYSA-N [3-(bromomethyl)phenyl]-phenylmethanone Chemical compound BrCC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1 SZJQXQICJDHRJE-UHFFFAOYSA-N 0.000 description 1
- QNKIDIXROYHQKU-UHFFFAOYSA-N [4-(bromomethyl)phenyl]-(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(CBr)C=C1 QNKIDIXROYHQKU-UHFFFAOYSA-N 0.000 description 1
- RYULULVJWLRDQH-UHFFFAOYSA-N [4-(bromomethyl)phenyl]-phenylmethanone Chemical compound C1=CC(CBr)=CC=C1C(=O)C1=CC=CC=C1 RYULULVJWLRDQH-UHFFFAOYSA-N 0.000 description 1
- PXFOBPPTJQWHRN-UHFFFAOYSA-N [4-(chloromethyl)phenyl]-phenylmethanone Chemical compound C1=CC(CCl)=CC=C1C(=O)C1=CC=CC=C1 PXFOBPPTJQWHRN-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical class C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000013361 beverage Nutrition 0.000 description 1
- 229940006460 bromide ion Drugs 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000011111 cardboard Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011491 glass wool Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005948 methanesulfonyloxy group Chemical group 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/385—Saturated compounds containing a keto group being part of a ring
- C07C49/457—Saturated compounds containing a keto group being part of a ring containing halogen
- C07C49/467—Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
- C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
- C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
- C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB888806527A GB8806527D0 (en) | 1988-03-18 | 1988-03-18 | Benzophenone derivatives |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| PT90021A PT90021A (pt) | 1989-11-10 |
| PT90021B true PT90021B (pt) | 1994-06-30 |
Family
ID=10633700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PT90021A PT90021B (pt) | 1988-03-18 | 1989-03-16 | Processo para a preparacao de derivados de benzofenona |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US4948819A (h) |
| EP (1) | EP0333291B1 (h) |
| JP (1) | JP2736678B2 (h) |
| KR (1) | KR890014431A (h) |
| CN (1) | CN1035822A (h) |
| AT (1) | ATE109763T1 (h) |
| AU (1) | AU609268B2 (h) |
| BR (1) | BR8901202A (h) |
| DE (1) | DE68917341T2 (h) |
| DK (1) | DK129189A (h) |
| GB (1) | GB8806527D0 (h) |
| HU (1) | HU202811B (h) |
| IL (1) | IL89635A0 (h) |
| IN (1) | IN174634B (h) |
| NZ (1) | NZ228363A (h) |
| PT (1) | PT90021B (h) |
| ZA (1) | ZA891995B (h) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5512329A (en) * | 1982-09-29 | 1996-04-30 | Bsi Corporation | Substrate surface preparation |
| US4977511A (en) * | 1985-11-20 | 1990-12-11 | The Mead Corporation | Photosensitive materials containing ionic dye compound as initiators |
| US5484822A (en) * | 1991-06-24 | 1996-01-16 | Polaroid Corporation | Process and composition for cladding optic fibers |
| FR2715157B1 (fr) * | 1994-01-20 | 1996-03-01 | Atochem Elf Sa | Latex acryliques susceptibles de former des films photoréticulables. |
| US5998496A (en) * | 1995-10-31 | 1999-12-07 | Spectra Group Limited, Inc. | Photosensitive intramolecular electron transfer compounds |
| US5714360A (en) * | 1995-11-03 | 1998-02-03 | Bsi Corporation | Photoactivatable water soluble cross-linking agents containing an onium group |
| WO1997024376A1 (en) * | 1995-12-29 | 1997-07-10 | Minnesota Mining And Manufacturing Company | Use of pendant photoreactive moieties on polymer precursors to prepare hydrophilic pressure sensitive adhesives |
| US6086796A (en) * | 1997-07-02 | 2000-07-11 | Diamonex, Incorporated | Diamond-like carbon over-coats for optical recording media devices and method thereof |
| US7863485B2 (en) * | 2004-12-10 | 2011-01-04 | Omnitech Environmental, Llc | Additive and vehicle for inks, paints, coatings and adhesives |
| DE102009001966A1 (de) | 2009-03-30 | 2010-10-07 | Evonik Röhm Gmbh | Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers |
| CN102206293B (zh) * | 2010-03-29 | 2013-09-18 | 比亚迪股份有限公司 | 一种光引发剂,一种光固化涂料和模内装饰方法 |
| US10040893B2 (en) | 2012-05-16 | 2018-08-07 | Coloplast A/S | Polymeric photoinitiators and photoinitiator monomers |
| AP2015008512A0 (en) | 2012-12-11 | 2015-06-30 | Nano Safe Coatings Inc A Florida Corp 3 P14000024914 | UV cured benzophenone terminated quaternary ammonium antimicrobials for surfaces |
| CN103926794B (zh) * | 2014-04-29 | 2017-11-14 | 常州强力电子新材料股份有限公司 | 一种含有二苯甲酮衍生物光引发剂的光固化组合物 |
| US10301399B2 (en) * | 2015-01-05 | 2019-05-28 | Igm Malta Limited | LED-curable low migration photoinitiators |
| CN108430967B (zh) | 2015-08-27 | 2024-12-13 | 纳米安全涂层公司(佛罗里达公司3P14000024914) | 含磺胺的抗微生物剂和含磺胺的抗微生物剂的基质处理组合物的制备 |
| KR102243196B1 (ko) | 2016-02-19 | 2021-04-22 | 애버리 데니슨 코포레이션 | 접착제를 제조하는 2단계 방법 및 관련 조성물 |
| US10640595B2 (en) | 2016-10-25 | 2020-05-05 | Avery Dennison Corporation | Controlled architecture polymerization with photoinitiator groups in backbone |
| CN111491967B (zh) | 2017-12-19 | 2023-05-02 | 艾利丹尼森公司 | 侧基官能团的聚合后官能化 |
| CN119242187B (zh) * | 2024-08-30 | 2025-08-08 | 盛鼎高新材料有限公司 | 一种安全玻璃用离子型中间膜及其制备方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4011259A (en) * | 1969-10-20 | 1977-03-08 | The Kendall Company | Monomeric emulsion stabilizers |
| JPS5495691A (en) * | 1978-01-13 | 1979-07-28 | Toyo Ink Mfg Co Ltd | Photocurable resin composition |
| DE2831263A1 (de) * | 1978-07-15 | 1980-01-31 | Basf Ag | Benzoinderivate mit quartaerer ammoniumgruppe |
| US4310687A (en) * | 1980-07-10 | 1982-01-12 | Gaf Corporation | Copolymerizable ultraviolet light absorber monomers which are acrylate esters of 2-hydroxy, alkoxy, methylol benzophenones |
| DE3331474A1 (de) * | 1983-09-01 | 1985-03-21 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen |
| US4859727A (en) * | 1986-08-22 | 1989-08-22 | Mitsubishi Rayon Company Ltd. | Antistatic thermoplastic resin composition |
| GB8703606D0 (en) * | 1987-02-17 | 1987-03-25 | Ward Blenkinsop & Co Ltd | Benzophenone derivatives |
-
1988
- 1988-03-18 GB GB888806527A patent/GB8806527D0/en active Pending
-
1989
- 1989-02-27 US US07/315,599 patent/US4948819A/en not_active Expired - Fee Related
- 1989-03-14 AT AT89200652T patent/ATE109763T1/de not_active IP Right Cessation
- 1989-03-14 DE DE68917341T patent/DE68917341T2/de not_active Expired - Fee Related
- 1989-03-14 EP EP89200652A patent/EP0333291B1/en not_active Expired - Lifetime
- 1989-03-15 KR KR1019890003218A patent/KR890014431A/ko not_active Withdrawn
- 1989-03-15 CN CN89101369A patent/CN1035822A/zh active Pending
- 1989-03-16 IL IL89635A patent/IL89635A0/xx unknown
- 1989-03-16 BR BR898901202A patent/BR8901202A/pt unknown
- 1989-03-16 PT PT90021A patent/PT90021B/pt not_active IP Right Cessation
- 1989-03-16 JP JP1062373A patent/JP2736678B2/ja not_active Expired - Lifetime
- 1989-03-16 ZA ZA891995A patent/ZA891995B/xx unknown
- 1989-03-16 DK DK129189A patent/DK129189A/da not_active Application Discontinuation
- 1989-03-16 NZ NZ228363A patent/NZ228363A/xx unknown
- 1989-03-16 IN IN250DE1989 patent/IN174634B/en unknown
- 1989-03-16 HU HU891241A patent/HU202811B/hu not_active IP Right Cessation
- 1989-03-16 AU AU31358/89A patent/AU609268B2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| DE68917341T2 (de) | 1995-01-05 |
| NZ228363A (en) | 1991-01-29 |
| DK129189D0 (da) | 1989-03-16 |
| ATE109763T1 (de) | 1994-08-15 |
| IN174634B (h) | 1995-01-28 |
| GB8806527D0 (en) | 1988-04-20 |
| EP0333291B1 (en) | 1994-08-10 |
| JP2736678B2 (ja) | 1998-04-02 |
| CN1035822A (zh) | 1989-09-27 |
| AU609268B2 (en) | 1991-04-26 |
| DK129189A (da) | 1989-09-19 |
| BR8901202A (pt) | 1989-10-31 |
| HUT50094A (en) | 1989-12-28 |
| US4948819A (en) | 1990-08-14 |
| HU202811B (en) | 1991-04-29 |
| EP0333291A2 (en) | 1989-09-20 |
| KR890014431A (ko) | 1989-10-23 |
| IL89635A0 (en) | 1989-09-28 |
| DE68917341D1 (de) | 1994-09-15 |
| PT90021A (pt) | 1989-11-10 |
| ZA891995B (en) | 1989-10-25 |
| AU3135889A (en) | 1989-09-21 |
| JPH024745A (ja) | 1990-01-09 |
| EP0333291A3 (en) | 1990-11-28 |
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