PT90021B - Processo para a preparacao de derivados de benzofenona - Google Patents

Processo para a preparacao de derivados de benzofenona Download PDF

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Publication number
PT90021B
PT90021B PT90021A PT9002189A PT90021B PT 90021 B PT90021 B PT 90021B PT 90021 A PT90021 A PT 90021A PT 9002189 A PT9002189 A PT 9002189A PT 90021 B PT90021 B PT 90021B
Authority
PT
Portugal
Prior art keywords
group
atom
compound
alkyl
hydrogen atom
Prior art date
Application number
PT90021A
Other languages
English (en)
Portuguese (pt)
Other versions
PT90021A (pt
Inventor
Peter Nicholl Green
Original Assignee
Ward Blenkinsop & Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ward Blenkinsop & Co Ltd filed Critical Ward Blenkinsop & Co Ltd
Publication of PT90021A publication Critical patent/PT90021A/pt
Publication of PT90021B publication Critical patent/PT90021B/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/385Saturated compounds containing a keto group being part of a ring
    • C07C49/457Saturated compounds containing a keto group being part of a ring containing halogen
    • C07C49/467Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/34Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/02Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C225/14Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
    • C07C225/16Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group
    • Y10S522/905Benzophenone group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
PT90021A 1988-03-18 1989-03-16 Processo para a preparacao de derivados de benzofenona PT90021B (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB888806527A GB8806527D0 (en) 1988-03-18 1988-03-18 Benzophenone derivatives

Publications (2)

Publication Number Publication Date
PT90021A PT90021A (pt) 1989-11-10
PT90021B true PT90021B (pt) 1994-06-30

Family

ID=10633700

Family Applications (1)

Application Number Title Priority Date Filing Date
PT90021A PT90021B (pt) 1988-03-18 1989-03-16 Processo para a preparacao de derivados de benzofenona

Country Status (17)

Country Link
US (1) US4948819A (OSRAM)
EP (1) EP0333291B1 (OSRAM)
JP (1) JP2736678B2 (OSRAM)
KR (1) KR890014431A (OSRAM)
CN (1) CN1035822A (OSRAM)
AT (1) ATE109763T1 (OSRAM)
AU (1) AU609268B2 (OSRAM)
BR (1) BR8901202A (OSRAM)
DE (1) DE68917341T2 (OSRAM)
DK (1) DK129189A (OSRAM)
GB (1) GB8806527D0 (OSRAM)
HU (1) HU202811B (OSRAM)
IL (1) IL89635A0 (OSRAM)
IN (1) IN174634B (OSRAM)
NZ (1) NZ228363A (OSRAM)
PT (1) PT90021B (OSRAM)
ZA (1) ZA891995B (OSRAM)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512329A (en) * 1982-09-29 1996-04-30 Bsi Corporation Substrate surface preparation
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
US5484822A (en) * 1991-06-24 1996-01-16 Polaroid Corporation Process and composition for cladding optic fibers
FR2715157B1 (fr) * 1994-01-20 1996-03-01 Atochem Elf Sa Latex acryliques susceptibles de former des films photoréticulables.
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
US5714360A (en) * 1995-11-03 1998-02-03 Bsi Corporation Photoactivatable water soluble cross-linking agents containing an onium group
JP2000503053A (ja) * 1995-12-29 2000-03-14 ミネソタ マイニング アンド マニュファクチャリング カンパニー ポリマー先駆物質の光反応性側鎖部分を使用して親水性感圧接着剤配合物を製造する方法
US6086796A (en) * 1997-07-02 2000-07-11 Diamonex, Incorporated Diamond-like carbon over-coats for optical recording media devices and method thereof
US7863485B2 (en) * 2004-12-10 2011-01-04 Omnitech Environmental, Llc Additive and vehicle for inks, paints, coatings and adhesives
DE102009001966A1 (de) 2009-03-30 2010-10-07 Evonik Röhm Gmbh Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers
CN102206293B (zh) * 2010-03-29 2013-09-18 比亚迪股份有限公司 一种光引发剂,一种光固化涂料和模内装饰方法
WO2014089680A1 (en) 2012-12-11 2014-06-19 Nano Safe Coatings Incorporated (A Florida Corporation 3 P14000024914) Uv cured benzophenone terminated quaternary ammonium antimicrobials for surfaces
WO2013170857A1 (en) 2012-05-16 2013-11-21 Coloplast A/S Novel polymeric photoinitiators and photoinitiator monomers
CN103926794B (zh) * 2014-04-29 2017-11-14 常州强力电子新材料股份有限公司 一种含有二苯甲酮衍生物光引发剂的光固化组合物
JP6576454B2 (ja) * 2015-01-05 2019-09-18 アイ ジー エム マルタ リミテッド Led硬化性低移行性光開始剤
BR112018003786B1 (pt) 2015-08-27 2022-05-17 Nano Safe Coatings Incorporated (A Florida Corporation 3 P 14000024914) Preparação de antimicrobianos contendo sulfonamida e composições de tratamento de substrato de antimicrobianos contendo sulfonamida
CN109312194B (zh) 2016-02-19 2021-11-23 艾利丹尼森公司 用于加工粘合剂和相关组合物的两阶段方法
WO2018081268A1 (en) 2016-10-25 2018-05-03 Avery Dennison Corporation Block polymers with photoinitiator groups in backbone and their use in adhesive compositions
CN111491967B (zh) 2017-12-19 2023-05-02 艾利丹尼森公司 侧基官能团的聚合后官能化
CN119242187B (zh) * 2024-08-30 2025-08-08 盛鼎高新材料有限公司 一种安全玻璃用离子型中间膜及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4011259A (en) * 1969-10-20 1977-03-08 The Kendall Company Monomeric emulsion stabilizers
JPS5495691A (en) * 1978-01-13 1979-07-28 Toyo Ink Mfg Co Ltd Photocurable resin composition
DE2831263A1 (de) * 1978-07-15 1980-01-31 Basf Ag Benzoinderivate mit quartaerer ammoniumgruppe
US4310687A (en) * 1980-07-10 1982-01-12 Gaf Corporation Copolymerizable ultraviolet light absorber monomers which are acrylate esters of 2-hydroxy, alkoxy, methylol benzophenones
DE3331474A1 (de) * 1983-09-01 1985-03-21 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare mischungen mit speziellen diaminobenzophenon-verbindungen
US4859727A (en) * 1986-08-22 1989-08-22 Mitsubishi Rayon Company Ltd. Antistatic thermoplastic resin composition
GB8703606D0 (en) * 1987-02-17 1987-03-25 Ward Blenkinsop & Co Ltd Benzophenone derivatives

Also Published As

Publication number Publication date
HU202811B (en) 1991-04-29
BR8901202A (pt) 1989-10-31
DK129189D0 (da) 1989-03-16
DE68917341T2 (de) 1995-01-05
EP0333291A2 (en) 1989-09-20
JP2736678B2 (ja) 1998-04-02
JPH024745A (ja) 1990-01-09
CN1035822A (zh) 1989-09-27
PT90021A (pt) 1989-11-10
EP0333291A3 (en) 1990-11-28
ZA891995B (en) 1989-10-25
HUT50094A (en) 1989-12-28
IL89635A0 (en) 1989-09-28
AU609268B2 (en) 1991-04-26
AU3135889A (en) 1989-09-21
US4948819A (en) 1990-08-14
DK129189A (da) 1989-09-19
KR890014431A (ko) 1989-10-23
IN174634B (OSRAM) 1995-01-28
EP0333291B1 (en) 1994-08-10
NZ228363A (en) 1991-01-29
DE68917341D1 (de) 1994-09-15
ATE109763T1 (de) 1994-08-15
GB8806527D0 (en) 1988-04-20

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FG3A Patent granted, date of granting

Effective date: 19931209

MM3A Annulment or lapse

Free format text: LAPSE DUE TO NON-PAYMENT OF FEES

Effective date: 19950630