PL2358483T3 - Sposób obróbki wstępnej dla instalacji powlekających - Google Patents

Sposób obróbki wstępnej dla instalacji powlekających

Info

Publication number
PL2358483T3
PL2358483T3 PL09756655T PL09756655T PL2358483T3 PL 2358483 T3 PL2358483 T3 PL 2358483T3 PL 09756655 T PL09756655 T PL 09756655T PL 09756655 T PL09756655 T PL 09756655T PL 2358483 T3 PL2358483 T3 PL 2358483T3
Authority
PL
Poland
Prior art keywords
coating systems
pretreatment method
pretreatment
coating
systems
Prior art date
Application number
PL09756655T
Other languages
English (en)
Polish (pl)
Inventor
Arno Moosbrugger
Mario Walch
Siegfried Krassnitzer
Stephan Kasemann
Jürgen Gwehenberger
Original Assignee
Oerlikon Surface Solutions Ag Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=41567208&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL2358483(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Oerlikon Surface Solutions Ag Truebbach filed Critical Oerlikon Surface Solutions Ag Truebbach
Publication of PL2358483T3 publication Critical patent/PL2358483T3/pl

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • B05D1/322—Removable films used as masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
PL09756655T 2008-11-20 2009-11-11 Sposób obróbki wstępnej dla instalacji powlekających PL2358483T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11646108P 2008-11-20 2008-11-20
EP09756655.8A EP2358483B1 (de) 2008-11-20 2009-11-11 Vorbehandlungsverfahren für beschichtungsanlagen
PCT/CH2009/000355 WO2010057323A1 (de) 2008-11-20 2009-11-11 Reinigungsverfahren für beschichtungsanlagen

Publications (1)

Publication Number Publication Date
PL2358483T3 true PL2358483T3 (pl) 2015-09-30

Family

ID=41567208

Family Applications (1)

Application Number Title Priority Date Filing Date
PL09756655T PL2358483T3 (pl) 2008-11-20 2009-11-11 Sposób obróbki wstępnej dla instalacji powlekających

Country Status (13)

Country Link
US (1) US8765214B2 (ja)
EP (1) EP2358483B1 (ja)
JP (1) JP5736317B2 (ja)
KR (1) KR101736508B1 (ja)
CN (1) CN102223956B (ja)
BR (1) BRPI0920910B1 (ja)
CA (1) CA2744032C (ja)
ES (1) ES2541586T3 (ja)
HU (1) HUE026933T2 (ja)
MX (1) MX2011005203A (ja)
PL (1) PL2358483T3 (ja)
RU (1) RU2510664C2 (ja)
WO (1) WO2010057323A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010005762A1 (de) * 2010-01-25 2011-07-28 Oerlikon Trading Ag, Trübbach Reinigungsverfahren für Beschichtungsanlagen
DE102012000288A1 (de) * 2011-11-18 2013-05-23 Thomas Mayer Bestandteil einer Oberflächenbeschichtungsanlage
JP5743010B1 (ja) * 2014-06-20 2015-07-01 富士ゼロックス株式会社 画像形成装置、塗布装置、塗布剤、及び搬送装置
US20180237906A1 (en) * 2015-08-22 2018-08-23 Novena Tec Inc. Process chamber shielding system and method

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2991188A (en) * 1958-05-21 1961-07-04 Dow Chemical Co Spray coating method and coated spray booth
US4548967A (en) * 1984-04-19 1985-10-22 Nalco Chemical Company Masking agent for paint spray booths
JPS60227868A (ja) * 1984-04-27 1985-11-13 Honda Motor Co Ltd 樹脂成形品の部分塗装方法
US4895630A (en) * 1985-08-28 1990-01-23 W. H. Brady Co. Rapidly removable undercoating for vacuum deposition of patterned layers onto substrates
US4748049A (en) * 1986-03-27 1988-05-31 Chemfil Corporation Clear paint booth coating composition and method
JPH01162546A (ja) * 1987-12-16 1989-06-27 Sumitomo Metal Ind Ltd ベルトキャスターのコーティング剤塗布方法
SU1722610A1 (ru) * 1989-01-19 1992-03-30 В.Г.Вохм нин Способ получени покрыти
JPH06170735A (ja) * 1992-12-03 1994-06-21 Shin Etsu Chem Co Ltd 多結晶ダイヤモンド砥石の製造方法
JPH0751865A (ja) * 1993-08-16 1995-02-28 Toyota Motor Corp 抵抗溶接電極用保護シート及びその製造方法並びにその使用方法
EP0648861A1 (en) * 1993-10-15 1995-04-19 Applied Materials, Inc. Semiconductor processing apparatus
JP3362552B2 (ja) * 1995-03-10 2003-01-07 東京エレクトロン株式会社 成膜処理装置
KR100213110B1 (ko) * 1997-06-12 1999-08-02 윤종용 박막형 발열 히터 및 그 제조방법
JPH1136061A (ja) * 1997-07-17 1999-02-09 Mitsubishi Materials Corp 物理蒸着装置のマスキング治具
RU2182914C2 (ru) * 2000-08-14 2002-05-27 Южно-Российский государственный технический университет (Новочеркасский политехнический институт) Композиция для получения антикоррозионных, антиадгезионных, антипригарных покрытий на металлических поверхностях способом диффузиофореза
US6790242B2 (en) * 2000-12-29 2004-09-14 Lam Research Corporation Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof
DE10326815A1 (de) * 2003-06-13 2004-12-30 Institut für Neue Materialien Gemeinnützige GmbH Antiadhäsive Hochtemperaturschichten
US7491508B2 (en) 2003-06-20 2009-02-17 The Trustees Of The University Of Pennsylvania Methods of generating chimeric adenoviruses and uses for such chimeric adenoviruses
DE20316044U1 (de) * 2003-10-18 2005-03-17 Daub Joachim Kunststoffbeschichtung zur Verwendung als Korrosionsschutz und als Trennmittel
US20050221020A1 (en) * 2004-03-30 2005-10-06 Tokyo Electron Limited Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric film
EP1772529A1 (de) * 2005-10-07 2007-04-11 Siemens Aktiengesellschaft Trockene Zusammensetzung, Verwendung derer, Schichtsystem und Verfahren zur Beschichtung
EP1954604A1 (en) 2005-12-01 2008-08-13 Cardinal CG Company Transport rollers

Also Published As

Publication number Publication date
KR101736508B1 (ko) 2017-05-16
EP2358483B1 (de) 2015-04-08
CA2744032C (en) 2018-07-31
JP2012509164A (ja) 2012-04-19
ES2541586T3 (es) 2015-07-22
US20110281026A1 (en) 2011-11-17
KR20110095259A (ko) 2011-08-24
JP5736317B2 (ja) 2015-06-17
BRPI0920910A2 (pt) 2017-07-11
CN102223956A (zh) 2011-10-19
BRPI0920910B1 (pt) 2019-09-17
CN102223956B (zh) 2015-05-06
WO2010057323A1 (de) 2010-05-27
US8765214B2 (en) 2014-07-01
EP2358483A1 (de) 2011-08-24
HUE026933T2 (en) 2016-07-28
RU2510664C2 (ru) 2014-04-10
MX2011005203A (es) 2011-06-01
RU2011124886A (ru) 2012-12-27
CA2744032A1 (en) 2010-05-27

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