PL1949409T3 - Sposób i urządzenie do wybłyszczania w próżni przez napylanie magnetronowe taśmy metalowej - Google Patents

Sposób i urządzenie do wybłyszczania w próżni przez napylanie magnetronowe taśmy metalowej

Info

Publication number
PL1949409T3
PL1949409T3 PL06831028T PL06831028T PL1949409T3 PL 1949409 T3 PL1949409 T3 PL 1949409T3 PL 06831028 T PL06831028 T PL 06831028T PL 06831028 T PL06831028 T PL 06831028T PL 1949409 T3 PL1949409 T3 PL 1949409T3
Authority
PL
Poland
Prior art keywords
vacuum
strip
installation
metal strip
plasma
Prior art date
Application number
PL06831028T
Other languages
English (en)
Inventor
Hugues Cornil
Benoît DEWEER
Claude Maboge
Original Assignee
Arcelormittal France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36169165&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL1949409(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Arcelormittal France filed Critical Arcelormittal France
Publication of PL1949409T3 publication Critical patent/PL1949409T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Cleaning In General (AREA)
PL06831028T 2005-11-07 2006-10-26 Sposób i urządzenie do wybłyszczania w próżni przez napylanie magnetronowe taśmy metalowej PL1949409T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP05292355A EP1783815A1 (fr) 2005-11-07 2005-11-07 Procédé et installation d'avivage sous vide par pulvérisation magnétron d'une bande métallique
PCT/FR2006/002415 WO2007051917A1 (fr) 2005-11-07 2006-10-26 Procede et installation d’avivage sous vide par pulverisation magnetron d’une bande metallique
EP06831028A EP1949409B1 (fr) 2005-11-07 2006-10-26 Procede et installation d'avivage sous vide par pulverisation magnetron d'une bande metallique

Publications (1)

Publication Number Publication Date
PL1949409T3 true PL1949409T3 (pl) 2012-05-31

Family

ID=36169165

Family Applications (1)

Application Number Title Priority Date Filing Date
PL06831028T PL1949409T3 (pl) 2005-11-07 2006-10-26 Sposób i urządzenie do wybłyszczania w próżni przez napylanie magnetronowe taśmy metalowej

Country Status (14)

Country Link
EP (2) EP1783815A1 (pl)
JP (1) JP4824091B2 (pl)
CN (1) CN101346796B (pl)
AT (1) ATE537551T1 (pl)
BR (1) BRPI0618307B1 (pl)
CA (1) CA2628589C (pl)
CY (1) CY1112830T1 (pl)
DK (1) DK1949409T3 (pl)
ES (1) ES2379490T3 (pl)
PL (1) PL1949409T3 (pl)
PT (1) PT1949409E (pl)
RU (1) RU2369937C1 (pl)
SI (1) SI1949409T1 (pl)
WO (1) WO2007051917A1 (pl)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63136525A (ja) * 1986-11-27 1988-06-08 Tokuda Seisakusho Ltd ドライエツチング装置
JPH0768620B2 (ja) * 1991-09-30 1995-07-26 中外炉工業株式会社 金属ストリップの表面清浄化装置
JPH06179966A (ja) * 1992-12-11 1994-06-28 Ishikawajima Harima Heavy Ind Co Ltd 薄膜生成装置
BE1011098A3 (fr) * 1997-04-10 1999-04-06 Cockerill Rech & Dev Procede et dispositif de decapage.
DE69723699T2 (de) * 1997-10-08 2004-06-17 Recherche et Développement du Groupe Cockerill Sambre, en abrégé: RD-CS Verfahren zum Reinigen eines Substrats und Vorrichtung zur Durchführung des Verfahrens
TW531466B (en) * 2002-07-04 2003-05-11 Mosel Vitelic Inc Mechanical polishing apparatus and method of cleaning a lower electrode of a plasma etcher
US6802100B2 (en) * 2002-09-30 2004-10-12 United Technologies Corporation Anode cleaning tool
ATE323787T1 (de) * 2002-12-18 2006-05-15 Cardinal Cg Co Plasmaunterstützte filmabscheidung

Also Published As

Publication number Publication date
SI1949409T1 (sl) 2012-06-29
EP1949409A1 (fr) 2008-07-30
WO2007051917A1 (fr) 2007-05-10
CY1112830T1 (el) 2016-02-10
CN101346796B (zh) 2010-07-21
CA2628589A1 (fr) 2007-05-10
CA2628589C (fr) 2014-07-22
JP4824091B2 (ja) 2011-11-24
EP1783815A1 (fr) 2007-05-09
PT1949409E (pt) 2012-03-23
DK1949409T3 (da) 2012-04-02
RU2369937C1 (ru) 2009-10-10
EP1949409B1 (fr) 2011-12-14
CN101346796A (zh) 2009-01-14
ATE537551T1 (de) 2011-12-15
BRPI0618307B1 (pt) 2019-01-22
BRPI0618307A2 (pt) 2011-08-23
JP2009515040A (ja) 2009-04-09
ES2379490T3 (es) 2012-04-26

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