PL1927275T3 - Szablon drukarski stosowany w procesie SMT i sposób jego powlekania - Google Patents

Szablon drukarski stosowany w procesie SMT i sposób jego powlekania

Info

Publication number
PL1927275T3
PL1927275T3 PL06793003T PL06793003T PL1927275T3 PL 1927275 T3 PL1927275 T3 PL 1927275T3 PL 06793003 T PL06793003 T PL 06793003T PL 06793003 T PL06793003 T PL 06793003T PL 1927275 T3 PL1927275 T3 PL 1927275T3
Authority
PL
Poland
Prior art keywords
coating
printing
clearances
template
printing template
Prior art date
Application number
PL06793003T
Other languages
English (en)
Inventor
Heinrich Zeininger
Rudolf Zrenner
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of PL1927275T3 publication Critical patent/PL1927275T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1216—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by screen printing or stencil printing
    • H05K3/1225—Screens or stencils; Holders therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/24—Stencils; Stencil materials; Carriers therefor
    • B41N1/247—Meshes, gauzes, woven or similar screen materials; Preparation thereof, e.g. by plasma treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/12—Preparation of material for subsequent imaging, e.g. corona treatment, simultaneous coating, pre-treatments
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24322—Composite web or sheet

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Textile Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Chemically Coating (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
PL06793003T 2005-09-22 2006-08-25 Szablon drukarski stosowany w procesie SMT i sposób jego powlekania PL1927275T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102005045350A DE102005045350B4 (de) 2005-09-22 2005-09-22 Druckschablone eines SMT-Prozesses
PCT/EP2006/065666 WO2007033882A1 (de) 2005-09-22 2006-08-25 Druckschablone eines smt-prozesses und verfahren zu ihrer beschichtung
EP06793003A EP1927275B1 (de) 2005-09-22 2006-08-25 Druckschablone eines smt-prozesses und verfahren zu ihrer beschichtung

Publications (1)

Publication Number Publication Date
PL1927275T3 true PL1927275T3 (pl) 2011-04-29

Family

ID=37402594

Family Applications (1)

Application Number Title Priority Date Filing Date
PL06793003T PL1927275T3 (pl) 2005-09-22 2006-08-25 Szablon drukarski stosowany w procesie SMT i sposób jego powlekania

Country Status (9)

Country Link
US (1) US20110045238A1 (pl)
EP (1) EP1927275B1 (pl)
JP (1) JP2009508721A (pl)
CN (1) CN101268724B (pl)
AT (1) ATE483353T1 (pl)
DE (3) DE102005045350B4 (pl)
DK (1) DK1927275T3 (pl)
PL (1) PL1927275T3 (pl)
WO (1) WO2007033882A1 (pl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007010936A1 (de) 2007-03-07 2008-09-11 Biotronik Crm Patent Ag Siebdruckvorrichtung und Verfahren zur Herstellung derselben
DE102009024877A1 (de) * 2009-06-09 2010-12-23 Nb Technologies Gmbh Siebdruckform
DE102011083733A1 (de) 2011-09-29 2013-04-04 Siemens Aktiengesellschaft Siebdruckschablone und Verfahren zum Beschichten von Siebdruckschablonen
CN103096639B (zh) * 2011-11-02 2016-04-27 恩斯迈电子(深圳)有限公司 印刷模板及其制造方法及印刷锡膏的方法
CN102615932B (zh) * 2012-04-06 2013-12-11 深圳光韵达光电科技股份有限公司 一种金属印刷模板及其制造方法以及其使用的涂层溶液
CN102963146B (zh) * 2012-09-29 2015-12-02 深圳光韵达光电科技股份有限公司 一种smt激光模板及其制作方法
CN103442510A (zh) * 2013-07-17 2013-12-11 卢世闵 一种smt的印刷钢板及生产工艺
EP2937890B1 (en) * 2014-04-22 2020-06-03 Europlasma nv Plasma coating apparatus with a plasma diffuser and method preventing discolouration of a substrate
MX2018002858A (es) * 2018-03-07 2019-09-09 Interlatin S De R L De C V Plantilla que mejora el estarcido de soldadura en pasta, y su método de fabricación.
CN111361272A (zh) * 2020-04-14 2020-07-03 湖北奥霖卡光电科技有限公司 一种高疏水性新型网印模板及其制备方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2421607A (en) * 1942-04-03 1947-06-03 Harwood B Fowler Method of making metallic printing screens
US4803110A (en) * 1986-09-15 1989-02-07 International Business Machines Corporation Coated mask for photolithographic construction of electric circuits
JPH0272997A (ja) * 1988-09-07 1990-03-13 Fujitsu Ltd 印刷版
US5707740A (en) * 1990-04-03 1998-01-13 Ppg Industries, Inc. Water repellent surface treatment with acid activation
DE4122743C1 (pl) * 1991-07-10 1992-11-26 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
JPH05116475A (ja) * 1991-10-29 1993-05-14 Kimoto & Co Ltd 表面改質孔版およびその表面改質方法
JPH05220922A (ja) * 1992-02-18 1993-08-31 Matsushita Electric Ind Co Ltd メタルマスク及びその製造方法
JPH06228755A (ja) * 1993-02-03 1994-08-16 Nippon Sheet Glass Co Ltd 基板上に撥水性被膜を形成する方法
JP3070411B2 (ja) * 1994-10-07 2000-07-31 トヨタ自動車株式会社 鉄系部材に撥水性被覆膜を形成する方法
DE4438281C1 (de) * 1994-10-26 1996-04-18 Koenen Gmbh Siebdruck-Sieb und Verfahren zu seiner Herstellung
WO1997043656A2 (en) * 1996-05-17 1997-11-20 Formfactor, Inc. Wafer-level burn-in and test
US6669781B2 (en) * 1997-09-23 2003-12-30 Micron Technology, Inc. Method and apparatus for improving stencil/screen print quality
JP3933777B2 (ja) * 1997-12-03 2007-06-20 株式会社Ｋｒｉ 基材の表面改質方法
US6089151A (en) * 1998-02-24 2000-07-18 Micron Technology, Inc. Method and stencil for extruding material on a substrate
TW527492B (en) * 1998-10-14 2003-04-11 Tomoegawa Paper Co Ltd Anti-reflection material and polarized film using the same
US6564935B1 (en) * 1999-11-04 2003-05-20 Nippon Sheet Glass Co., Ltd. Coating solution, method and kit for preparing the same, and method for water-repellent treatment using the same
JP3508673B2 (ja) * 2000-01-25 2004-03-22 トヨタ自動車株式会社 自己潤滑性コーティング及びその形成方法
JP2001240469A (ja) * 2000-02-28 2001-09-04 Matsushita Electric Ind Co Ltd 誘電体粒子の製造方法および誘電体膜の製造方法
JP4509295B2 (ja) * 2000-04-26 2010-07-21 リコーマイクロエレクトロニクス株式会社 印刷用マスク及びその製造方法
JP2002046298A (ja) * 2000-08-03 2002-02-12 Riso Kagaku Corp サーマルヘッド、その表面処理方法及び表面処理剤
DE10063519A1 (de) * 2000-12-20 2002-07-04 Nano X Gmbh Lösungsmittelarme Sol-Gel-Systeme
JP3825971B2 (ja) * 2000-12-25 2006-09-27 株式会社ボンマーク 印刷用メタルマスク
DE10105329A1 (de) * 2001-02-05 2002-08-29 Hans Und Antonie Priwitzer Ing Druckschablone
NL1019781C2 (nl) * 2002-01-18 2003-07-21 Tno Deklaag alsmede werkwijzen en inrichtingen voor de vervaardiging daarvan.
DE10231698A1 (de) * 2002-03-26 2003-10-23 Fraunhofer Ges Forschung Verfahren zur Verbesserung des Transfers von Zusatzmaterial mittels einer Schablone auf einen Träger sowie zugehörige Schablone
DE10217202A1 (de) * 2002-04-18 2003-11-06 Bayer Ag Anti-Haft-Beschichtungen für Reaktoren
US6988652B2 (en) * 2002-05-17 2006-01-24 Fry's Metals, Inc. Solder printing using a stencil having a reverse-tapered aperture
US7093746B2 (en) * 2002-05-17 2006-08-22 Fry's Metals, Inc. Coated stencil with reduced surface tension
ITNO20020009A1 (it) * 2002-07-12 2004-01-12 Novara Technology Srl "processo sol-gel per la preparazione di film vetrosi con elevate proprieta' di adesione e soluzioni colloidali stabili adatte alla loro rea
RU2396210C2 (ru) * 2003-07-22 2010-08-10 Х.К.Штарк Инк. ПОРОШОК MoO2, СПОСОБЫ ИЗГОТОВЛЕНИЯ ПЛАСТИНЫ ИЗ ПОРОШКА MoO2 (ИХ ВАРИАНТЫ), ЭЛЕМЕНТ И СПОСОБ ИЗГОТОВЛЕНИЯ ТОНКОЙ ПЛЕНКИ ИЗ НЕЕ, СПОСОБ РАСПЫЛЕНИЯ С ПРИМЕНЕНИЕМ УКАЗАННОЙ ПЛАСТИНЫ
JP4134327B2 (ja) * 2003-11-19 2008-08-20 株式会社プロセス・ラボ・ミクロン メタルマスク及びその製造方法

Also Published As

Publication number Publication date
CN101268724A (zh) 2008-09-17
DE102005045350A1 (de) 2007-04-05
DE102005063510B4 (de) 2010-06-02
DE502006007976D1 (de) 2010-11-11
JP2009508721A (ja) 2009-03-05
EP1927275A1 (de) 2008-06-04
US20110045238A1 (en) 2011-02-24
EP1927275B1 (de) 2010-09-29
WO2007033882A1 (de) 2007-03-29
ATE483353T1 (de) 2010-10-15
DE102005045350B4 (de) 2009-07-16
CN101268724B (zh) 2010-12-15
DK1927275T3 (da) 2011-01-10

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