NO20080729L - Silisium sprutevirvelsjikt - Google Patents

Silisium sprutevirvelsjikt

Info

Publication number
NO20080729L
NO20080729L NO20080729A NO20080729A NO20080729L NO 20080729 L NO20080729 L NO 20080729L NO 20080729 A NO20080729 A NO 20080729A NO 20080729 A NO20080729 A NO 20080729A NO 20080729 L NO20080729 L NO 20080729L
Authority
NO
Norway
Prior art keywords
silicon
fluid layer
injection fluid
silicon injection
reactors
Prior art date
Application number
NO20080729A
Other languages
English (en)
Inventor
Paul Edward Ege
Jeffrey A Hansen
Levi C Allen
Original Assignee
Rec Silicon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rec Silicon Inc filed Critical Rec Silicon Inc
Publication of NO20080729L publication Critical patent/NO20080729L/no

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818Feeding of the fluidising gas
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818Feeding of the fluidising gas
    • B01J8/1827Feeding of the fluidising gas the fluidising gas being a reactant
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1845Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised
    • B01J8/1854Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised followed by a downward movement inside the reactor to form a loop
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1845Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised
    • B01J8/1863Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised followed by a downward movement outside the reactor and subsequently re-entering it
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/245Spouted-bed technique
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/26Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique with two or more fluidised beds, e.g. reactor and regeneration installations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00389Controlling the temperature using electric heating or cooling elements
    • B01J2208/00407Controlling the temperature using electric heating or cooling elements outside the reactor bed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00389Controlling the temperature using electric heating or cooling elements
    • B01J2208/00415Controlling the temperature using electric heating or cooling elements electric resistance heaters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00002Chemical plants
    • B01J2219/00027Process aspects
    • B01J2219/00038Processes in parallel
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00074Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00119Heat exchange inside a feeding nozzle or nozzle reactor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/18Details relating to the spatial orientation of the reactor
    • B01J2219/185Details relating to the spatial orientation of the reactor vertical
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/19Details relating to the geometry of the reactor
    • B01J2219/192Details relating to the geometry of the reactor polygonal
    • B01J2219/1923Details relating to the geometry of the reactor polygonal square or square-derived

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)

Abstract

Polysilisium dannes ved pyrolytisk dekomponering av en silisiumførende gass og avsetning av silisium på fluidiserte silisiumpartikler. Reaktorer (10) med sjikt fluidisert med flere neddykkede stråler og reaktorer som har sekundære åpninger (20) beskrives.
NO20080729A 2005-07-19 2008-02-08 Silisium sprutevirvelsjikt NO20080729L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70096405P 2005-07-19 2005-07-19
PCT/US2006/028112 WO2007012027A2 (en) 2005-07-19 2006-07-19 Silicon spout-fluidized bed

Publications (1)

Publication Number Publication Date
NO20080729L true NO20080729L (no) 2008-04-17

Family

ID=37529310

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20080729A NO20080729L (no) 2005-07-19 2008-02-08 Silisium sprutevirvelsjikt

Country Status (10)

Country Link
US (1) US20080220166A1 (no)
EP (1) EP1924349B1 (no)
JP (1) JP5086256B2 (no)
KR (1) KR101363911B1 (no)
CN (1) CN101316651B (no)
AT (1) ATE456395T1 (no)
DE (1) DE602006012064D1 (no)
NO (1) NO20080729L (no)
TW (1) TWI465600B (no)
WO (1) WO2007012027A2 (no)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5435188B2 (ja) * 2006-11-14 2014-03-05 三菱マテリアル株式会社 多結晶シリコンの製造方法および多結晶シリコン製造設備
EP2303448B1 (en) * 2008-06-30 2012-10-31 MEMC Electronic Materials, Inc. Fluidized bed reactor systems and methods for reducing the deposition of silicon on reactor walls
FR2937053B1 (fr) 2008-10-09 2010-12-17 Commissariat Energie Atomique Dispositif pour la synthese de nanoparticules par depot chimique en phase vapeur en lit fluidise
US8168123B2 (en) * 2009-02-26 2012-05-01 Siliken Chemicals, S.L. Fluidized bed reactor for production of high purity silicon
US8235305B2 (en) 2009-04-20 2012-08-07 Ae Polysilicon Corporation Methods and system for cooling a reaction effluent gas
EP2421659A1 (en) 2009-04-20 2012-02-29 Ae Polysilicon Corporation A reactor with silicide-coated metal surfaces
CN102713001B (zh) * 2009-11-18 2014-03-05 瑞科硅公司 流化床反应器
JP2013515673A (ja) 2009-12-29 2013-05-09 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド 分配器の周縁開口部に導かれた四塩化ケイ素を用いてリアクター壁上のケイ素付着物を低減する方法
KR20130049184A (ko) * 2010-03-19 2013-05-13 지티에이티 코포레이션 다결정 실리콘 증착 시스템 및 방법
KR101329030B1 (ko) * 2010-10-01 2013-11-13 주식회사 실리콘밸류 유동층 반응기
CN102205222A (zh) * 2011-03-25 2011-10-05 浙江合盛硅业有限公司 制取多晶硅的流化床反应装置
KR101329035B1 (ko) 2011-04-20 2013-11-13 주식회사 실리콘밸류 유동층 반응기
KR101329032B1 (ko) 2011-04-20 2013-11-14 주식회사 실리콘밸류 다결정 실리콘 제조장치 및 이를 이용한 다결정 실리콘의 제조방법
TW201304864A (zh) * 2011-06-10 2013-02-01 Rec Silicon Inc 高純度矽塗佈顆粒之製造
FR2977259B1 (fr) * 2011-06-28 2013-08-02 Commissariat Energie Atomique Dispositif a profil specifique de reacteur de type lit a jet pour depot par cvd
US8875728B2 (en) 2012-07-12 2014-11-04 Siliken Chemicals, S.L. Cooled gas distribution plate, thermal bridge breaking system, and related methods
KR102098605B1 (ko) 2012-08-29 2020-04-08 헴로크 세미컨덕터 오퍼레이션즈 엘엘씨 테이퍼 유동층 반응기 및 그의 사용 공정
US9587993B2 (en) 2012-11-06 2017-03-07 Rec Silicon Inc Probe assembly for a fluid bed reactor
US9212421B2 (en) 2013-07-10 2015-12-15 Rec Silicon Inc Method and apparatus to reduce contamination of particles in a fluidized bed reactor
US20140312030A1 (en) * 2013-04-23 2014-10-23 Paul D. Steneck Microwave heat treatment apparatus and method
DE102013208274A1 (de) 2013-05-06 2014-11-20 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium
US9238211B1 (en) 2014-08-15 2016-01-19 Rec Silicon Inc Segmented silicon carbide liner
US9446367B2 (en) 2014-08-15 2016-09-20 Rec Silicon Inc Joint design for segmented silicon carbide liner in a fluidized bed reactor
US9662628B2 (en) 2014-08-15 2017-05-30 Rec Silicon Inc Non-contaminating bonding material for segmented silicon carbide liner in a fluidized bed reactor
EP3278872B1 (en) * 2015-04-01 2021-07-07 Hanwha Chemical Corporation Method for preparing granular polysilicon using a fluidised-bed reactor system
CN105568254B (zh) * 2016-02-24 2018-10-30 清华大学 一种用于流化床化学气相沉积反应器的气体入口设备
KR102096577B1 (ko) * 2016-12-29 2020-04-02 한화솔루션 주식회사 폴리실리콘 제조 장치
EP3672910B1 (de) * 2017-08-23 2021-07-21 Wacker Chemie AG Wirbelschichtreaktor zur herstellung von polykristallinem siliciumgranulat
RU183578U1 (ru) * 2017-12-06 2018-09-26 федеральное государственное бюджетное образовательное учреждение высшего образования "Иркутский национальный исследовательский технический университет" (ФГБОУ ВО "ИРНИТУ") Электрическая печь для обжига сыпучих материалов

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3977896A (en) * 1972-03-09 1976-08-31 General Atomic Company Process for depositing pyrolytic carbon coatings
US4207360A (en) * 1975-10-31 1980-06-10 Texas Instruments Incorporated Silicon seed production process
DE2626446C3 (de) * 1976-06-12 1978-12-14 Hobeg Hochtemperaturreaktor-Brennelement Gmbh, 6450 Hanau Verfahren zur Beschichtung von Teilchen für die Herstellung von Brenn- und/oder Absorberelementen für Kernreaktoren und Vorrichtung dazu
US4221182A (en) * 1976-10-06 1980-09-09 General Atomic Company Fluidized bed gas coating apparatus
US4080927A (en) * 1976-10-06 1978-03-28 General Atomic Company Fluidized bed-gas coater apparatus
US4116160A (en) * 1976-10-26 1978-09-26 General Atomic Company Fluidized bed, gas coating apparatus
JPS6051601B2 (ja) * 1978-06-19 1985-11-14 バブコツク日立株式会社 流動層炉起動バ−ナ装置
DE2846160A1 (de) * 1978-10-24 1980-05-08 Kernforschungsanlage Juelich Wirbelschichtreaktor mit offenem reaktionsgaszutritt und verfahren zur laminar-durchflussteigerung
JPS57135708A (en) * 1981-02-12 1982-08-21 Shin Etsu Chem Co Ltd Manufacturing of high purity silicon granule
JPS57145021A (en) * 1981-02-27 1982-09-07 Shin Etsu Chem Co Ltd Preparation of silicon granule
US4424199A (en) * 1981-12-11 1984-01-03 Union Carbide Corporation Fluid jet seed particle generator for silane pyrolysis reactor
US4416913A (en) * 1982-09-28 1983-11-22 Motorola, Inc. Ascending differential silicon harvesting means and method
US4546012A (en) * 1984-04-26 1985-10-08 Carbomedics, Inc. Level control for a fluidized bed
JPS6316040A (ja) * 1986-03-28 1988-01-23 Kawasaki Heavy Ind Ltd 粉粒体の熱処理方法
JPS6465010A (en) * 1987-09-04 1989-03-10 Osaka Titanium Device for producing high-purity granular metallic silicon
US5326547A (en) * 1988-10-11 1994-07-05 Albemarle Corporation Process for preparing polysilicon with diminished hydrogen content by using a two-step heating process
US5284676A (en) * 1990-08-17 1994-02-08 Carbon Implants, Inc. Pyrolytic deposition in a fluidized bed
US5175942A (en) * 1991-07-19 1993-01-05 Gte Products Corporation Method for fluidized bed discharge
GB2271518B (en) * 1992-10-16 1996-09-25 Korea Res Inst Chem Tech Heating of fluidized bed reactor by microwave
US5328713A (en) * 1993-03-16 1994-07-12 Carbon Implants, Inc. Precise regulation of fluidized bed weight in pyrolytically coating substrates
US5798137A (en) * 1995-06-07 1998-08-25 Advanced Silicon Materials, Inc. Method for silicon deposition
JPH119985A (ja) * 1997-06-19 1999-01-19 Ube Ind Ltd 流動層粉体被覆装置及び被覆肥料の製造方法
DE19735378A1 (de) * 1997-08-14 1999-02-18 Wacker Chemie Gmbh Verfahren zur Herstellung von hochreinem Siliciumgranulat
US6410087B1 (en) * 1999-11-01 2002-06-25 Medical Carbon Research Institute, Llc Deposition of pyrocarbon
CN1364203A (zh) * 2000-02-18 2002-08-14 G.T.装备技术公司 多晶硅化学气相沉积方法和装置
US6733826B2 (en) * 2000-12-18 2004-05-11 Osram Sylvania Inc. Method and apparatus for coating electroluminescent phosphors
DE10124848A1 (de) * 2001-05-22 2002-11-28 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularem Silizium in einer Wirbelschicht
WO2004013044A1 (en) * 2002-07-22 2004-02-12 Lord Stephen M Methods for heating a fluidized bed silicon manufacture apparatus
EP2455944B1 (en) * 2004-04-21 2015-06-10 Nuclear Fuel Industries, Ltd. Apparatus for manufacturing coated fuel particles for high-temperature gas-cooled reactor
DE102005042753A1 (de) * 2005-09-08 2007-03-15 Wacker Chemie Ag Verfahren und Vorrichtung zur Herstellung von granulatförmigem polykristallinem Silicium in einem Wirbelschichtreaktor

Also Published As

Publication number Publication date
EP1924349B1 (en) 2010-01-27
WO2007012027A2 (en) 2007-01-25
EP1924349A2 (en) 2008-05-28
WO2007012027A3 (en) 2008-06-05
CN101316651A (zh) 2008-12-03
JP5086256B2 (ja) 2012-11-28
JP2009502704A (ja) 2009-01-29
CN101316651B (zh) 2011-03-02
TWI465600B (zh) 2014-12-21
ATE456395T1 (de) 2010-02-15
US20080220166A1 (en) 2008-09-11
KR101363911B1 (ko) 2014-02-21
KR20080039911A (ko) 2008-05-07
DE602006012064D1 (de) 2010-03-18
TW200710263A (en) 2007-03-16

Similar Documents

Publication Publication Date Title
NO20080729L (no) Silisium sprutevirvelsjikt
TW200630504A (en) Chemical vapor deposition reactor having multiple inlets
WO2010095901A3 (en) Method for forming thin film using radicals generated by plasma
WO2010003093A3 (en) Apparatuses for atomic layer deposition
TW200729303A (en) Method for manufacturing semiconductor device
WO2005010227A3 (en) Chemical vapor deposition reactor
RU2012132435A (ru) Способы уменьшения осаждения кремния на стенках реактора с использованием тетрахлорида кремния на периферии
TW200802552A (en) Method of manufacturing epitaxial silicon wafer and apparatus thereof
MY158036A (en) Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition
TW200715375A (en) Low-temperature catalyzed formation of segmented nanowire of dielectric material
WO2007076195A3 (en) Small volume symmetric flow single wafer ald apparatus
MY156940A (en) System and methods for distributing gas in a chemical vapor deposition reactor
WO2012112584A3 (en) Atomic layer deposition using radicals of gas mixture
TW200802604A (en) Sequential deposition process for forming si-containing films
TW200519239A (en) Control of carbon nanotube diameter using CVD or PECVD growth
TW200701579A (en) Method for manufacturing p type nitride semiconductor and semiconductor device manufactured by such method
AR053662A1 (es) Compuestos de pirazol inhibidores de la actividad quinasa cdk y gsk
DE502007006026D1 (de) Wiederverwertung von hochsiedenden verbindungen innerhalb eines chlorsilanverbundes
TW200743678A (en) Process for producing silicon oxide films from organoaminosilane precursors
WO2010098875A3 (en) Ald systems and methods
WO2008073926A3 (en) Formation of epitaxial layers containing silicon
TW200802547A (en) Selective deposition
WO2011116273A3 (en) System and method for polycrystalline silicon deposition
DE60326979D1 (de) Atomschichtenabscheidungsverfahren und vorrichtung
TW200616085A (en) Method and apparatus for forming silicon nitride film

Legal Events

Date Code Title Description
FC2A Withdrawal, rejection or dismissal of laid open patent application