NO20075026L - Fremgangsmate for fremstilling av silisium med hoy renhet - Google Patents
Fremgangsmate for fremstilling av silisium med hoy renhetInfo
- Publication number
- NO20075026L NO20075026L NO20075026A NO20075026A NO20075026L NO 20075026 L NO20075026 L NO 20075026L NO 20075026 A NO20075026 A NO 20075026A NO 20075026 A NO20075026 A NO 20075026A NO 20075026 L NO20075026 L NO 20075026L
- Authority
- NO
- Norway
- Prior art keywords
- high purity
- silicon
- producing high
- purity silicon
- oxidizing agent
- Prior art date
Links
- 229910052710 silicon Inorganic materials 0.000 title abstract 5
- 239000010703 silicon Substances 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 3
- 239000007800 oxidant agent Substances 0.000 abstract 2
- 238000007254 oxidation reaction Methods 0.000 abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Silicon Compounds (AREA)
Abstract
Det beskrives en fremgangsmåte for fremstilling av en stor mengde rimelig silisium med høy renhet som kan benyttes i solarbatterier og solceller. Det beskrives en metode fior fiemstilling av høyren silisium ved å ^eme bor fia silisium ved oksidasjon inkludert å begynne en oksidasjonsreaksjon mellom et oksidasjonsmiddel og smeltet silisium, og avkjøle minst en del av det oksiderende middel under reaksjonen.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005062557A JP4741860B2 (ja) | 2005-03-07 | 2005-03-07 | 高純度のシリコンの製造方法 |
PCT/JP2006/304194 WO2006095663A2 (en) | 2005-03-07 | 2006-02-28 | Method for producing high purity silicon |
Publications (1)
Publication Number | Publication Date |
---|---|
NO20075026L true NO20075026L (no) | 2007-10-04 |
Family
ID=36500910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20075026A NO20075026L (no) | 2005-03-07 | 2007-10-04 | Fremgangsmate for fremstilling av silisium med hoy renhet |
Country Status (8)
Country | Link |
---|---|
US (1) | US20080274031A1 (no) |
EP (1) | EP1910225A2 (no) |
JP (1) | JP4741860B2 (no) |
KR (1) | KR20080003797A (no) |
CN (1) | CN101137578A (no) |
BR (1) | BRPI0609259A2 (no) |
NO (1) | NO20075026L (no) |
WO (1) | WO2006095663A2 (no) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5277654B2 (ja) * | 2008-02-15 | 2013-08-28 | 住友化学株式会社 | ホウ素添加シリコンの製造方法 |
JP5131860B2 (ja) * | 2009-06-01 | 2013-01-30 | シャープ株式会社 | シリコンシートおよび太陽電池 |
WO2011009017A2 (en) * | 2009-07-17 | 2011-01-20 | Boston Silicon Materials Llc | Process for the formation of silicon metal sheets |
CN101792143B (zh) * | 2010-03-24 | 2011-12-21 | 姜学昭 | 提纯硅的方法 |
CN101941700B (zh) * | 2010-09-15 | 2014-04-30 | 北京应天阳光太阳能技术有限公司 | 一种从工业硅中去除硼杂质的方法 |
CN102153090B (zh) * | 2011-05-19 | 2012-12-12 | 厦门大学 | 一种冶金法n型多晶硅片硼吸杂方法 |
DE102012109248A1 (de) * | 2012-09-28 | 2014-04-03 | Fluxana GmbH & Co. KG | Herstellung von Analyseproben |
US10455680B2 (en) * | 2016-02-29 | 2019-10-22 | Asml Netherlands B.V. | Method and apparatus for purifying target material for EUV light source |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1100218B (it) * | 1978-11-09 | 1985-09-28 | Montedison Spa | Procedimento per la purificazione di silicio |
DE2933164A1 (de) * | 1979-08-16 | 1981-02-26 | Consortium Elektrochem Ind | Verfahren zum reinigen von rohsilicium |
JP2538044B2 (ja) * | 1989-04-07 | 1996-09-25 | 川崎製鉄株式会社 | 金属シリコン脱炭用ランスおよび脱炭方法 |
JP3205352B2 (ja) * | 1990-05-30 | 2001-09-04 | 川崎製鉄株式会社 | シリコン精製方法及び装置 |
JP3000109B2 (ja) * | 1990-09-20 | 2000-01-17 | 株式会社住友シチックス尼崎 | 高純度シリコン鋳塊の製造方法 |
JPH09202611A (ja) * | 1996-01-25 | 1997-08-05 | Kawasaki Steel Corp | 金属シリコン中のボロン除去方法 |
US5820842A (en) * | 1996-09-10 | 1998-10-13 | Elkem Metals Company L.P. | Silicon refining process |
JPH10324515A (ja) * | 1997-03-24 | 1998-12-08 | Kawasaki Steel Corp | 太陽電池用シリコンの製造方法 |
JPH1149510A (ja) * | 1997-07-31 | 1999-02-23 | Daido Steel Co Ltd | 金属Siの精製方法及びその装置 |
US5972107A (en) * | 1997-08-28 | 1999-10-26 | Crystal Systems, Inc. | Method for purifying silicon |
US6368403B1 (en) * | 1997-08-28 | 2002-04-09 | Crystal Systems, Inc. | Method and apparatus for purifying silicon |
JP2000302432A (ja) * | 1999-04-19 | 2000-10-31 | Shin Etsu Chem Co Ltd | 高純度金属シリコンの精製方法 |
JP4365480B2 (ja) * | 1999-06-07 | 2009-11-18 | 昭和電工株式会社 | 高純度シリコンの製造方法 |
JP4264166B2 (ja) * | 1999-08-20 | 2009-05-13 | 昭和電工株式会社 | ケイ素の精製方法 |
JP2003012317A (ja) * | 2001-06-27 | 2003-01-15 | Daido Steel Co Ltd | シリコンの精製方法 |
AU2003208106A1 (en) * | 2002-02-04 | 2003-09-02 | Sharp Kabushiki Kaisha | Silicon purifying method, slag for purifying silicon, and purified silicon |
JP2003238138A (ja) * | 2002-02-20 | 2003-08-27 | Sharp Corp | シリコンの精製方法およびシリコンの精製装置 |
JP2003277040A (ja) * | 2002-03-19 | 2003-10-02 | Sharp Corp | シリコンの精製方法および該方法により精製したシリコンを用いて製造する太陽電池 |
JP4766837B2 (ja) * | 2004-03-03 | 2011-09-07 | 新日鉄マテリアルズ株式会社 | シリコンからのホウ素除去方法 |
JP4966560B2 (ja) * | 2005-03-07 | 2012-07-04 | 新日鉄マテリアルズ株式会社 | 高純度シリコンの製造方法 |
JP4880236B2 (ja) * | 2005-03-07 | 2012-02-22 | 新日鉄マテリアルズ株式会社 | 高純度シリコンの製造方法 |
JP4856973B2 (ja) * | 2005-03-07 | 2012-01-18 | 新日鉄マテリアルズ株式会社 | 高純度シリコンの製造方法 |
-
2005
- 2005-03-07 JP JP2005062557A patent/JP4741860B2/ja not_active Expired - Fee Related
-
2006
- 2006-02-28 CN CNA2006800074437A patent/CN101137578A/zh active Pending
- 2006-02-28 US US11/885,801 patent/US20080274031A1/en not_active Abandoned
- 2006-02-28 EP EP06715253A patent/EP1910225A2/en not_active Withdrawn
- 2006-02-28 KR KR1020077022727A patent/KR20080003797A/ko not_active Application Discontinuation
- 2006-02-28 WO PCT/JP2006/304194 patent/WO2006095663A2/en active Application Filing
- 2006-02-28 BR BRPI0609259-4A patent/BRPI0609259A2/pt not_active IP Right Cessation
-
2007
- 2007-10-04 NO NO20075026A patent/NO20075026L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2006095663A3 (en) | 2007-02-08 |
JP4741860B2 (ja) | 2011-08-10 |
BRPI0609259A2 (pt) | 2010-03-09 |
KR20080003797A (ko) | 2008-01-08 |
EP1910225A2 (en) | 2008-04-16 |
US20080274031A1 (en) | 2008-11-06 |
JP2006240963A (ja) | 2006-09-14 |
CN101137578A (zh) | 2008-03-05 |
WO2006095663A2 (en) | 2006-09-14 |
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Legal Events
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FC2A | Withdrawal, rejection or dismissal of laid open patent application |