NL9400920A - Ontwikkelaarsamenstelling voor positiefwerkende lithografische drukplaten en werkwijze voor het ontwikkelen van positiefwerkende lithografische drukplaten. - Google Patents

Ontwikkelaarsamenstelling voor positiefwerkende lithografische drukplaten en werkwijze voor het ontwikkelen van positiefwerkende lithografische drukplaten. Download PDF

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Publication number
NL9400920A
NL9400920A NL9400920A NL9400920A NL9400920A NL 9400920 A NL9400920 A NL 9400920A NL 9400920 A NL9400920 A NL 9400920A NL 9400920 A NL9400920 A NL 9400920A NL 9400920 A NL9400920 A NL 9400920A
Authority
NL
Netherlands
Prior art keywords
positive
lithographic printing
printing plates
acting
developer composition
Prior art date
Application number
NL9400920A
Other languages
English (en)
Dutch (nl)
Inventor
Jan Daems
Original Assignee
Davatech Europ V O F
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Davatech Europ V O F filed Critical Davatech Europ V O F
Priority to NL9400920A priority Critical patent/NL9400920A/nl
Priority to NL1000505A priority patent/NL1000505C2/xx
Priority to DE1995120741 priority patent/DE19520741C2/de
Publication of NL9400920A publication Critical patent/NL9400920A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL9400920A 1994-06-07 1994-06-07 Ontwikkelaarsamenstelling voor positiefwerkende lithografische drukplaten en werkwijze voor het ontwikkelen van positiefwerkende lithografische drukplaten. NL9400920A (nl)

Priority Applications (3)

Application Number Priority Date Filing Date Title
NL9400920A NL9400920A (nl) 1994-06-07 1994-06-07 Ontwikkelaarsamenstelling voor positiefwerkende lithografische drukplaten en werkwijze voor het ontwikkelen van positiefwerkende lithografische drukplaten.
NL1000505A NL1000505C2 (en) 1994-06-07 1995-06-07 Developer for positive lithographic printing plates
DE1995120741 DE19520741C2 (de) 1994-06-07 1995-06-07 Entwickler zur Verwendung im Offset-Druckverfahren

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL9400920 1994-06-07
NL9400920A NL9400920A (nl) 1994-06-07 1994-06-07 Ontwikkelaarsamenstelling voor positiefwerkende lithografische drukplaten en werkwijze voor het ontwikkelen van positiefwerkende lithografische drukplaten.

Publications (1)

Publication Number Publication Date
NL9400920A true NL9400920A (nl) 1996-01-02

Family

ID=19864276

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9400920A NL9400920A (nl) 1994-06-07 1994-06-07 Ontwikkelaarsamenstelling voor positiefwerkende lithografische drukplaten en werkwijze voor het ontwikkelen van positiefwerkende lithografische drukplaten.

Country Status (2)

Country Link
DE (1) DE19520741C2 (de)
NL (1) NL9400920A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5897985A (en) * 1996-10-11 1999-04-27 Kodak Polychrome Graphics, Llc Potassium silicate developing composition and method of use to process lithographic printing plates
US5766826A (en) * 1996-10-11 1998-06-16 Eastman Kodak Company Alkaline developing composition and method of use to process lithographic printing plates
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1591988A (en) * 1977-12-29 1981-07-01 Vickers Ltd Lithographic printing
US4828965A (en) * 1988-01-06 1989-05-09 Olin Hunt Specialty Products Inc. Aqueous developing solution and its use in developing positive-working photoresist composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4374920A (en) * 1981-07-27 1983-02-22 American Hoechst Corporation Positive developer containing non-ionic surfactants
DE4027299A1 (de) * 1990-08-29 1992-03-05 Hoechst Ag Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten
JP3086354B2 (ja) * 1993-03-30 2000-09-11 富士写真フイルム株式会社 感光性平版印刷版用の現像液および現像補充液

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1591988A (en) * 1977-12-29 1981-07-01 Vickers Ltd Lithographic printing
US4828965A (en) * 1988-01-06 1989-05-09 Olin Hunt Specialty Products Inc. Aqueous developing solution and its use in developing positive-working photoresist composition

Also Published As

Publication number Publication date
DE19520741C2 (de) 2003-01-30
DE19520741A1 (de) 1996-02-01

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