NL9100202A - Lithografische inrichting met een hangende objecttafel. - Google Patents
Lithografische inrichting met een hangende objecttafel. Download PDFInfo
- Publication number
- NL9100202A NL9100202A NL9100202A NL9100202A NL9100202A NL 9100202 A NL9100202 A NL 9100202A NL 9100202 A NL9100202 A NL 9100202A NL 9100202 A NL9100202 A NL 9100202A NL 9100202 A NL9100202 A NL 9100202A
- Authority
- NL
- Netherlands
- Prior art keywords
- unit
- pivot arm
- frame
- support member
- carrier
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/022—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using dampers and springs in combination
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
- F16F15/0232—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means with at least one gas spring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Aviation & Aerospace Engineering (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL9100202A NL9100202A (nl) | 1991-02-05 | 1991-02-05 | Lithografische inrichting met een hangende objecttafel. |
US07/804,577 US5150153A (en) | 1991-02-05 | 1991-12-10 | Lithographic device with a suspended object table |
EP92200253A EP0498496B1 (en) | 1991-02-05 | 1992-01-29 | Lithographic device with a suspended object table |
DE69219631T DE69219631T2 (de) | 1991-02-05 | 1992-01-29 | Lithographische Vorrichtung mit einem aufgehängten Objekttisch |
KR1019920001518A KR100210324B1 (ko) | 1991-02-05 | 1992-01-31 | 대물 테이블을 현수시킨 석판 인쇄 장치 |
JP02014792A JP3254233B2 (ja) | 1991-02-05 | 1992-02-05 | リソグラフ装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL9100202 | 1991-02-05 | ||
NL9100202A NL9100202A (nl) | 1991-02-05 | 1991-02-05 | Lithografische inrichting met een hangende objecttafel. |
Publications (1)
Publication Number | Publication Date |
---|---|
NL9100202A true NL9100202A (nl) | 1992-09-01 |
Family
ID=19858831
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL9100202A NL9100202A (nl) | 1991-02-05 | 1991-02-05 | Lithografische inrichting met een hangende objecttafel. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5150153A (ja) |
EP (1) | EP0498496B1 (ja) |
JP (1) | JP3254233B2 (ja) |
KR (1) | KR100210324B1 (ja) |
DE (1) | DE69219631T2 (ja) |
NL (1) | NL9100202A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107327665A (zh) * | 2017-08-17 | 2017-11-07 | 刘兵 | 一种机电设备减震装置 |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6989647B1 (en) | 1994-04-01 | 2006-01-24 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US7365513B1 (en) | 1994-04-01 | 2008-04-29 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US5874820A (en) | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
US5528118A (en) | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
US6721034B1 (en) | 1994-06-16 | 2004-04-13 | Nikon Corporation | Stage unit, drive table, and scanning exposure apparatus using the same |
US5850280A (en) | 1994-06-16 | 1998-12-15 | Nikon Corporation | Stage unit, drive table, and scanning exposure and apparatus using same |
JP3484684B2 (ja) * | 1994-11-01 | 2004-01-06 | 株式会社ニコン | ステージ装置及び走査型露光装置 |
US6246204B1 (en) * | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US5623853A (en) * | 1994-10-19 | 1997-04-29 | Nikon Precision Inc. | Precision motion stage with single guide beam and follower stage |
US6008500A (en) * | 1995-04-04 | 1999-12-28 | Nikon Corporation | Exposure apparatus having dynamically isolated reaction frame |
JP3506158B2 (ja) | 1995-04-14 | 2004-03-15 | 株式会社ニコン | 露光装置及び走査型露光装置、並びに走査露光方法 |
TW316874B (ja) * | 1995-05-30 | 1997-10-01 | Philips Electronics Nv | |
EP0772800B1 (en) * | 1995-05-30 | 2000-05-10 | Asm Lithography B.V. | Lithographic device with a three-dimensionally positionable mask holder |
TW318255B (ja) * | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
US5760564A (en) * | 1995-06-27 | 1998-06-02 | Nikon Precision Inc. | Dual guide beam stage mechanism with yaw control |
JP3659529B2 (ja) * | 1996-06-06 | 2005-06-15 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
US5815246A (en) * | 1996-12-24 | 1998-09-29 | U.S. Philips Corporation | Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device |
WO1998028665A1 (en) * | 1996-12-24 | 1998-07-02 | Koninklijke Philips Electronics N.V. | Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
JPH10209035A (ja) * | 1997-01-23 | 1998-08-07 | Nikon Corp | 露光装置 |
WO1998040791A1 (en) | 1997-03-10 | 1998-09-17 | Koninklijke Philips Electronics N.V. | Positioning device having two object holders |
JP3576176B2 (ja) * | 1997-07-22 | 2004-10-13 | アーエスエム リソグラフィ ベスローテン フェンノートシャップ | ガス軸受を有する支持装置 |
DE60032568T2 (de) * | 1999-12-01 | 2007-10-04 | Asml Netherlands B.V. | Positionierungsapparat und damit versehener lithographischer Apparat |
TW546551B (en) * | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
TW509823B (en) | 2000-04-17 | 2002-11-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US6774981B1 (en) | 2000-09-08 | 2004-08-10 | Nikon Corporation | Modular exposure apparatus with removable optical device and improved isolation of the optical device |
JP2002289515A (ja) * | 2000-12-28 | 2002-10-04 | Nikon Corp | 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法 |
US6646719B2 (en) * | 2001-01-31 | 2003-11-11 | Nikon Corporation | Support assembly for an exposure apparatus |
JP5109661B2 (ja) * | 2005-10-05 | 2012-12-26 | 株式会社ニコン | 露光装置及び露光方法 |
KR100745371B1 (ko) * | 2006-10-23 | 2007-08-02 | 삼성전자주식회사 | 자기부상형 웨이퍼 스테이지 |
NL2004752A (en) * | 2009-06-19 | 2010-12-20 | Asml Netherlands Bv | Coil, positioning device, actuator, and lithographic apparatus. |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2388300A1 (fr) * | 1977-04-20 | 1978-11-17 | Thomson Csf | Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant |
US4431304A (en) * | 1981-11-25 | 1984-02-14 | Mayer Herbert E | Apparatus for the projection copying of mask patterns on a workpiece |
US4937618A (en) * | 1984-10-18 | 1990-06-26 | Canon Kabushiki Kaisha | Alignment and exposure apparatus and method for manufacture of integrated circuits |
US4676630A (en) * | 1985-04-25 | 1987-06-30 | Canon Kabushiki Kaisha | Exposure apparatus |
US4676649A (en) * | 1985-11-27 | 1987-06-30 | Compact Spindle Bearing Corp. | Multi-axis gas bearing stage assembly |
JPS62200726A (ja) * | 1986-02-28 | 1987-09-04 | Canon Inc | 露光装置 |
JPH0658410B2 (ja) * | 1986-05-23 | 1994-08-03 | 株式会社ニコン | ステ−ジ装置 |
NL8601547A (nl) * | 1986-06-16 | 1988-01-18 | Philips Nv | Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting. |
JPH0812843B2 (ja) * | 1989-03-15 | 1996-02-07 | 日本精工株式会社 | 光学結像装置及び方法 |
-
1991
- 1991-02-05 NL NL9100202A patent/NL9100202A/nl not_active Application Discontinuation
- 1991-12-10 US US07/804,577 patent/US5150153A/en not_active Expired - Lifetime
-
1992
- 1992-01-29 DE DE69219631T patent/DE69219631T2/de not_active Expired - Fee Related
- 1992-01-29 EP EP92200253A patent/EP0498496B1/en not_active Expired - Lifetime
- 1992-01-31 KR KR1019920001518A patent/KR100210324B1/ko not_active IP Right Cessation
- 1992-02-05 JP JP02014792A patent/JP3254233B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107327665A (zh) * | 2017-08-17 | 2017-11-07 | 刘兵 | 一种机电设备减震装置 |
Also Published As
Publication number | Publication date |
---|---|
DE69219631D1 (de) | 1997-06-19 |
JPH04319956A (ja) | 1992-11-10 |
US5150153A (en) | 1992-09-22 |
KR100210324B1 (ko) | 1999-07-15 |
KR920016897A (ko) | 1992-09-25 |
JP3254233B2 (ja) | 2002-02-04 |
EP0498496B1 (en) | 1997-05-14 |
EP0498496A1 (en) | 1992-08-12 |
DE69219631T2 (de) | 1997-11-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A1B | A search report has been drawn up | ||
BV | The patent application has lapsed |