NL8802920A - Laagdiktemeter. - Google Patents
Laagdiktemeter. Download PDFInfo
- Publication number
- NL8802920A NL8802920A NL8802920A NL8802920A NL8802920A NL 8802920 A NL8802920 A NL 8802920A NL 8802920 A NL8802920 A NL 8802920A NL 8802920 A NL8802920 A NL 8802920A NL 8802920 A NL8802920 A NL 8802920A
- Authority
- NL
- Netherlands
- Prior art keywords
- coating thickness
- thickness gauge
- layer
- beams
- splitting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
- G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Magnetic Heads (AREA)
- Insulated Conductors (AREA)
- Organic Insulating Materials (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8802920A NL8802920A (nl) | 1988-11-28 | 1988-11-28 | Laagdiktemeter. |
DE89202969T DE68911659T2 (de) | 1988-11-28 | 1989-11-23 | Verfahren zur Dünnschichtdickenmessung. |
AT89202969T ATE99046T1 (de) | 1988-11-28 | 1989-11-23 | Verfahren zur duennschichtdickenmessung. |
EP89202969A EP0371550B1 (en) | 1988-11-28 | 1989-11-23 | Measure for measuring thin film thickness |
ES89202969T ES2047108T3 (es) | 1988-11-28 | 1989-11-23 | Metodo para medir el espesor de peliculas delgadas. |
CA002003983A CA2003983C (en) | 1988-11-28 | 1989-11-27 | Coating thickness gauge |
MX018502A MX172398B (es) | 1988-11-28 | 1989-11-27 | Calibrador para medir el espesor de un recubrimiento |
US07/441,641 US5170049A (en) | 1988-11-28 | 1989-11-27 | Coating thickness gauge using linearly polarized light |
TR89/0974A TR26149A (tr) | 1988-11-28 | 1989-11-28 | KAPLAMA KALINLIGI ÖLCüSü |
JP1306757A JPH0678892B2 (ja) | 1988-11-28 | 1989-11-28 | 被膜厚さ測定器 |
AU45636/89A AU629265B2 (en) | 1988-11-28 | 1989-11-28 | Coating thickness gauge |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8802920A NL8802920A (nl) | 1988-11-28 | 1988-11-28 | Laagdiktemeter. |
NL8802920 | 1988-11-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL8802920A true NL8802920A (nl) | 1990-06-18 |
Family
ID=19853294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8802920A NL8802920A (nl) | 1988-11-28 | 1988-11-28 | Laagdiktemeter. |
Country Status (11)
Country | Link |
---|---|
US (1) | US5170049A (ja) |
EP (1) | EP0371550B1 (ja) |
JP (1) | JPH0678892B2 (ja) |
AT (1) | ATE99046T1 (ja) |
AU (1) | AU629265B2 (ja) |
CA (1) | CA2003983C (ja) |
DE (1) | DE68911659T2 (ja) |
ES (1) | ES2047108T3 (ja) |
MX (1) | MX172398B (ja) |
NL (1) | NL8802920A (ja) |
TR (1) | TR26149A (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5243185A (en) * | 1992-07-31 | 1993-09-07 | Loral Aerospace Corp. | Apparatus and method for ice detection |
ES2076083B1 (es) * | 1993-06-04 | 1996-06-01 | Fuesca Sl | Aparato y metodo de medida y control de la densidad de reticulacion de los tratamientos en caliente y frio del vidrio aligerado. |
US5650610A (en) * | 1995-03-15 | 1997-07-22 | National Research Council Of Canada | Apparatus and method for remote detection of ice or other birefringent material on a surface |
US5557399A (en) * | 1995-03-22 | 1996-09-17 | Zygo Corporation | Optical gap measuring apparatus and method |
CN1131741A (zh) * | 1995-03-22 | 1996-09-25 | 载歌公司 | 光学间隙测量装置和方法 |
US5953125A (en) * | 1995-09-01 | 1999-09-14 | Zygo Corporation | Optical gap measuring apparatus and method |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
JP3893868B2 (ja) * | 2000-10-11 | 2007-03-14 | 東京エレクトロン株式会社 | 電界効果トランジスタの製造方法、並びに、半導体デバイスの製造方法及びその装置 |
US6908774B2 (en) * | 2002-08-12 | 2005-06-21 | S.O. I. Tec Silicon On Insulator Technologies S.A. | Method and apparatus for adjusting the thickness of a thin layer of semiconductor material |
EP1619465A1 (en) * | 2004-07-19 | 2006-01-25 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Optical monitoring apparatus and method of monitoring optical coatings |
US7515253B2 (en) * | 2005-01-12 | 2009-04-07 | Kla-Tencor Technologies Corporation | System for measuring a sample with a layer containing a periodic diffracting structure |
US7370525B1 (en) | 2006-10-31 | 2008-05-13 | Swan International Sensors Pty. Ltd. | Inflight ice detection system |
AT504136B1 (de) * | 2006-12-29 | 2008-03-15 | Univ Linz | Verfahren zur bestimmung der dicke einer metallisierungsschicht auf einer polymerfolie |
CN100470193C (zh) * | 2007-06-08 | 2009-03-18 | 中国科学院上海光学精密机械研究所 | 石英波片厚度的测量装置和测量方法 |
US20090002686A1 (en) * | 2007-06-29 | 2009-01-01 | The Material Works, Ltd. | Sheet Metal Oxide Detector |
DE102008021199A1 (de) | 2008-04-28 | 2009-10-29 | Focke & Co.(Gmbh & Co. Kg) | Verfahren und Vorrichtung zum Prüfen von mit Folie umwickelten Zigarettenpackungen |
JP2012032239A (ja) * | 2010-07-29 | 2012-02-16 | Horiba Ltd | 試料検査装置及び試料検査方法 |
CA2908964C (en) * | 2013-03-15 | 2018-11-20 | Sensory Analytics | Method and system for real-time in-process measurement of coating thickness |
JP6355066B2 (ja) * | 2013-08-29 | 2018-07-11 | 株式会社リコー | センサ装置及び画像形成装置 |
CN111373221A (zh) * | 2017-11-24 | 2020-07-03 | Abb瑞士股份有限公司 | 用于通过辐射来表征诸如漆膜之类的涂料的系统和方法以及利用这样的系统的涂漆设施 |
CN113155040B (zh) * | 2021-03-04 | 2023-02-28 | 上海精测半导体技术有限公司 | 一种探测反射光束角度变化的装置、方法及膜厚测量装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3426201A (en) * | 1965-10-12 | 1969-02-04 | Texas Instruments Inc | Method and apparatus for measuring the thickness of films by means of elliptical polarization of reflected infrared radiation |
US3906844A (en) * | 1974-05-28 | 1975-09-23 | Int Envelope Limited | Method and apparatus for producing envelopes having a closure flap |
US3908508A (en) * | 1974-09-23 | 1975-09-30 | Modulus Corp | Strain indicator |
JPS51129279A (en) * | 1975-05-02 | 1976-11-10 | Nippon Kogaku Kk <Nikon> | Polarizing analyzer |
EP0075689A1 (en) * | 1981-09-28 | 1983-04-06 | International Business Machines Corporation | Optical instruments for viewing a sample surface |
US4585348A (en) * | 1981-09-28 | 1986-04-29 | International Business Machines Corporation | Ultra-fast photometric instrument |
US4850711A (en) * | 1986-06-13 | 1989-07-25 | Nippon Kokan Kabushiki Kaisha | Film thickness-measuring apparatus using linearly polarized light |
-
1988
- 1988-11-28 NL NL8802920A patent/NL8802920A/nl not_active Application Discontinuation
-
1989
- 1989-11-23 ES ES89202969T patent/ES2047108T3/es not_active Expired - Lifetime
- 1989-11-23 EP EP89202969A patent/EP0371550B1/en not_active Expired - Lifetime
- 1989-11-23 DE DE89202969T patent/DE68911659T2/de not_active Expired - Fee Related
- 1989-11-23 AT AT89202969T patent/ATE99046T1/de not_active IP Right Cessation
- 1989-11-27 CA CA002003983A patent/CA2003983C/en not_active Expired - Fee Related
- 1989-11-27 US US07/441,641 patent/US5170049A/en not_active Expired - Fee Related
- 1989-11-27 MX MX018502A patent/MX172398B/es unknown
- 1989-11-28 JP JP1306757A patent/JPH0678892B2/ja not_active Expired - Lifetime
- 1989-11-28 AU AU45636/89A patent/AU629265B2/en not_active Ceased
- 1989-11-28 TR TR89/0974A patent/TR26149A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
AU4563689A (en) | 1990-05-31 |
EP0371550A1 (en) | 1990-06-06 |
DE68911659D1 (de) | 1994-02-03 |
JPH02263105A (ja) | 1990-10-25 |
US5170049A (en) | 1992-12-08 |
TR26149A (tr) | 1994-01-14 |
ATE99046T1 (de) | 1994-01-15 |
AU629265B2 (en) | 1992-10-01 |
ES2047108T3 (es) | 1994-02-16 |
CA2003983C (en) | 1993-12-14 |
EP0371550B1 (en) | 1993-12-22 |
MX172398B (es) | 1993-12-15 |
JPH0678892B2 (ja) | 1994-10-05 |
DE68911659T2 (de) | 1994-05-05 |
CA2003983A1 (en) | 1990-05-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NL8802920A (nl) | Laagdiktemeter. | |
US4332476A (en) | Method and apparatus for studying surface properties | |
US4872758A (en) | Film thickness-measuring apparatus | |
CA1229499A (en) | Ellipsometric method and apparatus | |
US4850711A (en) | Film thickness-measuring apparatus using linearly polarized light | |
US6836330B2 (en) | Optical beamsplitter for a polarization insensitive wavelength detector and a polarization sensor | |
US4320967A (en) | Apparatus for measuring a radiation affecting parameter of a film or coating | |
US5526117A (en) | Method for the determination of characteristic values of transparent layers with the aid of ellipsometry | |
US7184145B2 (en) | Achromatic spectroscopic ellipsometer with high spatial resolution | |
EP0075689A1 (en) | Optical instruments for viewing a sample surface | |
JPH0431522B2 (ja) | ||
JP2915294B2 (ja) | 金属材料表面の塗油量測定方法および装置 | |
NL9202303A (nl) | Zeeman-ellipsometer. | |
US6870617B2 (en) | Accurate small-spot spectrometry systems and methods | |
JPH07260684A (ja) | 高精度反射率測定方法及び測定器 | |
JPH07111327B2 (ja) | 偏光解析装置 | |
US9322778B2 (en) | Optical sensing apparatus and a method for detecting characteristics of a sample | |
JPH11101739A (ja) | エリプソメトリ装置 | |
CN116182738A (zh) | 基于分波段多光谱的薄膜表界面轮廓同步测量方法及装置 | |
JPS6041732B2 (ja) | 偏光解析装置 | |
JPH01262404A (ja) | 分光干渉縞法測定装置 | |
CN116804588A (zh) | 一种光栅衍射效率测量装置 | |
Gross et al. | Testing the Quality of Coatings | |
KR20050024343A (ko) | 고 공간해상도를 가지는 아크로메틱 분광 타원분석기 | |
JPS59210306A (ja) | 膜厚測定方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A1B | A search report has been drawn up | ||
BV | The patent application has lapsed |